公开(公告)号：US4816638A

公开(公告)日：1989-03-28

申请号：US110253

申请日：1987-10-20

申请人： Katsumi Ukai ,  Tsutomu Tsukada ,  Kouji Ikeda ,  Toshio Adachi

发明人： Katsumi Ukai ,  Tsutomu Tsukada ,  Kouji Ikeda ,  Toshio Adachi

IPC分类号： H01L21/302 ,  H01J37/18 ,  H01L21/3065 ,  H01L21/677 ,  B23K9/00

CPC分类号： H01L21/67751 ,  H01J37/185

摘要： A vacuum processing apparatus comprising a load-lock chamber, a vacuum transferring chamber and a processing chamber respectively having evacuating systems for evacuating the respective chambers. The load-lock chamber has a first isolation valve for isolating and opening communication of the load-lock chamber with the atmosphere and a second isolating valve for isolating and opening communication of the load-lock chamber with the vacuum transferring chamber. The processing chamber comprises a vessel detachably located at an arranging aperture formed in a wall of the vacuum transferring chamber and closing the arranging aperture in an air-tight manner from the outside of the apparatus. A substrate arranging portion is arranged in the vacuum transferring chamber so as to be move toward and away from the vessel to form an air-tight chamber space in the vessel isolated from the vacuum transferring chamber when the substrate arranging portion has moved to the vessel. The vacuum transferring chamber comprises therein a substrate transferring mechanism for transferring the substrates along transferring passages in the vacuum transferring chamber. The substrate arranging portion comprises a substrate lifter for moving the substrate between the transferring passages and the substrate arranging portion.

摘要翻译： 一种真空处理装置，包括负载锁定室，真空传送室和处理室，分别具有用于抽空各个室的抽空系统。 负载锁定室具有用于隔离和打开负载锁定室与大气的连通的第一隔离阀和用于隔离和打开负载锁定室与真空传送室的连通的第二隔离阀。 处理室包括可拆卸地定位在形成在真空传送室的壁中的布置孔处的容器，并且从设备的外部以气密的方式封闭布置孔。 衬底布置部分布置在真空传送室中，以便朝向和远离容器移动，以在衬底布置部分移动到容器时与真空传送室隔离的容器中形成气密室空间。 真空传送室包括用于沿着真空传送室中的传送通道传送基板的基板传送机构。 基板布置部分包括用于在输送通道和基板布置部分之间移动基板的基板升降器。

公开(公告)号：US4950956A

公开(公告)日：1990-08-21

申请号：US96862

申请日：1987-09-15

申请人： Tatsuo Asamaki ,  Kiyoshi Hoshino ,  Katsumi Ukai ,  Yoichi Ino ,  Toshio Adachi ,  Tsutomu Tsukada

发明人： Tatsuo Asamaki ,  Kiyoshi Hoshino ,  Katsumi Ukai ,  Yoichi Ino ,  Toshio Adachi ,  Tsutomu Tsukada

IPC分类号： C23C8/36 ,  C23C14/35 ,  C23C14/36 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01J37/34 ,  H05H1/24

CPC分类号： H01J37/32623 ,  H01J37/32082 ,  H01J37/3266 ,  H01J37/3402 ,  H01J2237/3321

摘要： A plasma processing apparatus comprises a vacuum vessel, an anode and a cathode arranged in the vacuum vessel, and a discharge producing power source for intermittently producing main discharge between the anode and the cathode to process a substrate arranged in the proximity of the anode and the cathode. The discharge producing power source comprises a magnetic field setting device including magnetic coils arranged closely to the vacuum vessel and having pole pieces and alternate current power sources for the magnetic coils. The plasma processing apparatus is able to remarkably increase processing speeds and considerably reduce the temperature rise and damage therefrom of substrates to be processed. Moreover, the magnetic field setting device is arranged in a small size to make the plasma processing apparatus compact and small-sized.

摘要翻译： 等离子体处理装置包括设置在真空容器中的真空容器，阳极和阴极以及用于间歇地在阳极和阴极之间产生主放电的放电产生电源，以处理布置在阳极附近的衬底和 阴极。 放电产生电源包括磁场设定装置，其包括紧密配置在真空容器上的磁性线圈，并具有用于磁性线圈的极片和交流电源。 等离子体处理装置能够显着地增加处理速度，并显着地降低温度升高并损坏要处理的基板。 此外，磁场设定装置被布置成小尺寸以使等离子体处理装置小型化。

公开(公告)号：US4482419A

公开(公告)日：1984-11-13

申请号：US576143

申请日：1984-02-02

申请人： Tsutomu Tsukada ,  Etsuo Wani ,  Katsumi Ukai ,  Teruo Saitoh

发明人： Tsutomu Tsukada ,  Etsuo Wani ,  Katsumi Ukai ,  Teruo Saitoh

IPC分类号： H01J37/16 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/306 ,  B44C1/22 ,  C03C15/00 ,  C23F1/00

CPC分类号： H01J37/3244 ,  H01J37/16 ,  H01L21/302

摘要： In a dry etching apparatus comprising a plurality of etching chambers each of which comprises a first and a second electrode member opposite to each other, an object is successively etched in each etching chamber, with the object supported on either the first or the second electrode member, under different distributions of etching rate. When the object is placed on the first electrode member in each etching chamber and a gas is introduced through an aperture formed on the second electrode member, each distribution of etching rate can be varied by changing a position of the aperture. A side wall member may be extended from a periphery of the second electrode member towards the first electrode member in each etching chamber to confine plasma within a space defined by the first and the second electrode members and the side wall member. The side wall member is varied in length and/or diameter from an etching chamber to another to realize the different distributions of etching rate. Alternatively, a ring member may be arranged in a space between the first and the second electrode members in each etching chamber. The different distributions are established by changing a distance between the first and the second electrode members from an etching chamber to another. Electric power for the first and the second electrode members may be varied in each etching chamber.

摘要翻译： 在包括多个蚀刻室的干蚀刻装置中，每个蚀刻室包括彼此相对的第一和第二电极构件，在每个蚀刻室中依次蚀刻物体，物体被支撑在第一或第二电极构件 ，在不同的蚀刻速率分布下。 当将物体放置在每个蚀刻室中的第一电极构件上并且通过形成在第二电极构件上的孔引入气体时，可以通过改变孔的位置来改变蚀刻速率的每个分布。 侧壁构件可以在每个蚀刻室中从第二电极构件的周边延伸到第一电极构件，以将等离子体限制在由第一和第二电极构件和侧壁构件限定的空间内。 侧壁构件的长度和/或直径从蚀刻室变化到另一个，以实现不同的蚀刻速率分布。 或者，环状构件可以布置在每个蚀刻室中的第一和第二电极构件之间的空间中。 通过将第一和第二电极构件之间的距离从蚀刻室改变到另一个来建立不同的分布。 在每个蚀刻室中可以改变第一和第二电极构件的电力。

公开(公告)号：US4405989A

公开(公告)日：1983-09-20

申请号：US246368

申请日：1981-03-23

申请人： Tsutomu Tsukada ,  Katsumi Ukai

发明人： Tsutomu Tsukada ,  Katsumi Ukai

IPC分类号： C23C14/54 ,  C23F4/00 ,  G01N21/62 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/306 ,  G06F15/46 ,  H03K5/18

CPC分类号： H01J37/32935 ,  C23C14/544 ,  C23F4/00 ,  G01N21/62

摘要： In order to monitor the status, such as a decreasing or an increasing thickness, of a layer in response to a single light beam produced from a chamber in which the layer is processed, as by etching or sputtering, by the use of plasma, a monitoring device splits, according to spectral regions, the beam into two components of intensities variable with time and calculates a difference between the intensities, a power of the difference, and a ratio between the intensities. The status is monitored by selecting the difference, power, and ratio. The spectral regions may be 3962 and 3050 A for an aluminum layer being etched and 3248 and 8115 A for a copper layer sputter-formed in argon. Preferably, the difference and the power are monitored a predetermined interval of time after start of etch. The ratio is used in combination with a plasma sputtering device.

摘要翻译： 为了响应于从其中处理层的室产生的单个光束，通过使用等离子体，通过蚀刻或溅射来监测层的递减或增加的厚度的状态，例如， 监测装置根据光谱区域将光束分成强度随时间变化的两个分量，并计算强度之间的差异，差异的功率与强度之间的比值。 通过选择差异，功率和比率来监视状态。 对于被蚀刻的铝层，光谱区可以是3962和3050A，对于在氩气中溅射形成的铜层，光谱区可以是3248和8115A。 优选地，在蚀刻开始之后预定的时间间隔监测差异和功率。 该比率与等离子体溅射装置组合使用。

公开(公告)号：US4376692A

公开(公告)日：1983-03-15

申请号：US215805

申请日：1980-12-12

申请人： Tsutomu Tsukada ,  Katsumi Ukai

发明人： Tsutomu Tsukada ,  Katsumi Ukai

IPC分类号： H01L21/302 ,  C23F4/00 ,  H01L21/3065 ,  H01L21/673 ,  C23F1/00 ,  C23C15/00

CPC分类号： C23F4/00

摘要： In a dry etching device comprising a first electrode supplied with an electrical voltage and a second electrode grounded, a dielectric plate is placed on the second electrode and includes means for positioning a specimen to be etched. The specimen is brought into electrical contact with the second electrode by the positioning means and is, therefore, substantially grounded during etching. The positioning means may be a through hole for receiving the specimen therein. Alternatively, the positioning member may be a conductive spring passing through the dielectric plate. A plurality of positioning members may be arranged in the dielectric plate.

摘要翻译： 在包括提供有电压的第一电极和接地的第二电极的干蚀刻装置中，电介质板放置在第二电极上，并且包括用于定位要蚀刻的试样的装置。 样品通过定位装置与第二电极电接触，因此在蚀刻期间基本接地。 定位装置可以是用于在其中接收标本的通孔。 或者，定位构件可以是穿过电介质板的导电弹簧。 多个定位构件可以布置在电介质板中。

公开(公告)号：US20070212622A1

公开(公告)日：2007-09-13

申请号：US11575182

申请日：2005-10-07

申请人： Junzo Yamano ,  Katsumi Ukai

发明人： Junzo Yamano ,  Katsumi Ukai

IPC分类号： G03F1/00

CPC分类号： C07D231/22 ,  C07D231/20 ,  C08K5/0091 ,  C08K11/00 ,  C09B57/007 ,  G02B5/223

摘要： The present invention provides a filter for electronic display devices comprising a metal complex of squarylium compound represented by General Formula (I): (wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like, R3 and R4 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s) and the like, and M represents a metal atom having coordination function, n represents an integer of 1 to 4).

摘要翻译： 本发明提供了一种用于电子显示装置的滤光器，其包括由通式（I）表示的方酸化合物的金属络合物：其中R 1和R 2可以相同 或不同的，各自表示氢原子，任选具有取代基的烷基等，R 3和R 4可以相同或不同，并且各自表示 氢原子，任选具有取代基的烷基，任选具有取代基的芳烷基等，M表示具有配位官能团的金属原子，n表示1〜4的整数）。

公开(公告)号：US20090074373A1

公开(公告)日：2009-03-19

申请号：US11719100

申请日：2005-11-18

申请人： Junzo Yamano ,  Katsumi Ukai ,  Motoharu Kinugasa

发明人： Junzo Yamano ,  Katsumi Ukai ,  Motoharu Kinugasa

IPC分类号： G02B6/00 ,  C07D417/14 ,  C07D403/02 ,  C07D417/02

CPC分类号： G02B5/20 ,  C07D401/08 ,  C07D403/08 ,  C07D417/08 ,  C09B23/0066 ,  C09B57/007

摘要： The present invention provides optical filters comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s) or the like, R3 represents a hydrogen atom or an alkyl group optionally having substituent(s), and Y represents a group represented by General Formula (A): (wherein R4 represents a hydrogen atom, an alkyl group optionally having substituent(s) or the like, R5 represents a hydrogen atom, a halogen atom or the like, and R6, R7, R8 and R9 may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group optionally having substituent(s) or the like)] and the like.

摘要翻译： 本发明提供了包含由通式（I）表示的方酸化合物的光学滤光器：[其中R 1和R 2可以相同或不同，各自表示氢原子，任选具有取代基的烷基等，R 3 表示氢原子或任选具有取代基的烷基，Y表示通式（A）表示的基团：（其中，R 4表示氢原子，可以具有取代基的烷基等），R 5 表示氢原子，卤素原子等，R 6，R 7，R 8和R 9可以相同或不同，表示氢原子，卤素原子，任选具有取代基的烷基等） ]等。

公开(公告)号：US07521562B2

公开(公告)日：2009-04-21

申请号：US11570355

申请日：2005-07-27

申请人： Ikuo Shimizu ,  Junzo Yamano ,  Motoharu Kinugasa ,  Katsumi Ukai

发明人： Ikuo Shimizu ,  Junzo Yamano ,  Motoharu Kinugasa ,  Katsumi Ukai

IPC分类号： C07D401/00

CPC分类号： C07D413/12 ,  C07D231/20 ,  C07D413/08 ,  C09B57/007

摘要： The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s); X represents a group represented by following Formula (A): (wherein R3 and R4 may be the same or different and represents a hydrogen atom, an alkyl group optionally having substituent(s), an alkoxy group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s), wherein R3 and R4 may be combined together with the adjacent nitrogen atom thereto form a heterocyclic group optionally having substituent(s))].

摘要翻译： 本发明提供一种用于电子显示装置的滤光器，其包括由通式（I）表示的方酸化合物：其中R 1和R 2可以相同或不同，各自表示氢原子，任选具有取代基的烷基， ，任选具有取代基的芳烷基，任选具有取代基的芳基或任选具有取代基的杂环基; X表示由下式（A）表示的基团：（其中R 3和R 4可以相同或不同，表示氢原子，任选具有取代基的烷基，任选具有取代基的烷氧基， 任选具有取代基的芳烷基，任选具有取代基的芳基或任选具有取代基的杂环基，其中R 3和R 4可以与相邻的氮原子一起形成杂环基，任选具有 取代基）]。

公开(公告)号：US20070260059A1

公开(公告)日：2007-11-08

申请号：US11570355

申请日：2005-07-27

申请人： Ikuo Shimizu ,  Junzo Yamano ,  Motoharu Kinugasa ,  Katsumi Ukai

发明人： Ikuo Shimizu ,  Junzo Yamano ,  Motoharu Kinugasa ,  Katsumi Ukai

IPC分类号： C07D231/02 ,  C07D263/02 ,  C07D413/02

CPC分类号： C07D413/12 ,  C07D231/20 ,  C07D413/08 ,  C09B57/007

摘要： The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein R1 and R2 may be the same or different and each represents a hydrogen atom, an alkyl group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s); X represents a group represented by following Formula (A): (wherein R3 and R4 may be the same or different and represents a hydrogen atom, an alkyl group optionally having substituent(s), an alkoxy group optionally having substituent(s), an aralkyl group optionally having substituent(s), an aryl group optionally having substituent(s), or a heterocyclic group optionally having substituent(s), wherein R3 and R4 may be combined together with the adjacent nitrogen atom thereto form a heterocyclic group optionally having substituent(s))].

摘要翻译： 本发明提供了一种用于电子显示装置的滤光器，包括由通式（I）表示的方酸化合物：其中R 1和R 2可以相同或不同 并且各自表示氢原子，任选具有取代基的烷基，任选具有取代基的芳烷基，任选具有取代基的芳基或任选具有取代基的杂环基; X表示由下式（A）表示的基团：（其中R 3和R 4可以相同或不同，表示氢原子，任选具有 取代基，任选具有取代基的烷氧基，任选具有取代基的芳烷基，任选具有取代基的芳基或任选具有取代基的杂环基，其中R ^{3和R 4可以与相邻的氮原子一起形成任选具有取代基的杂环基）]。}

公开(公告)号：US20070105988A1

公开(公告)日：2007-05-10

申请号：US10579820

申请日：2004-12-17

申请人： Ikuo Shimizu ,  Motoharu Kinugasa ,  Katsumi Ukai

发明人： Ikuo Shimizu ,  Motoharu Kinugasa ,  Katsumi Ukai

IPC分类号： C08K5/34 ,  C07D403/02 ,  G02B5/22

CPC分类号： G02B5/20 ,  C07D403/08 ,  C09B56/00 ,  C09B57/007

摘要： The present invention provides a filter for electronic display devices, comprising a squarylium compound represented by General Formula (I): [wherein X represents a group represented by following Formula (A): (wherein R1, R2, R3, and R4 may be the same or different and each represents a hydrogen atom, a halogen atom and the like; and R5 and R6 may be the same or different and each represent a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like; and Y represents a group represented by following Formula (C): (wherein R9 represents a halogen atom, an alkyl group optionally having substituent(s) and the like; and R10 represents a hydrogen atom, an alkyl group optionally having substituent(s) and the like) and the like, and “n” represents an integer of 0 to 5].

摘要翻译： 本发明提供了一种电子显示装置用滤波器，其包括通式（I）表示的方酸化合物：[式中，X表示由下式（A）表示的基团：（其中R 1，R 2，R R 3，R 3和R 4可以相同或不同，各自表示氢原子，卤素原子等;和 R 5和R 6可以相同或不同，各自表示氢原子，任选具有取代基的烷基等）等; Y表示由下式（C）表示的基团：其中R 9表示卤素原子，任选具有取代基的烷基等; R 10， SUP>表示氢原子，任选具有取代基的烷基等）等，“n”表示0〜5的整数。