Pattern writing apparatus and pattern writing method
    1.
    发明申请
    Pattern writing apparatus and pattern writing method 有权
    图案书写装置和图案书写方法

    公开(公告)号:US20050002002A1

    公开(公告)日:2005-01-06

    申请号:US10898197

    申请日:2004-07-26

    摘要: A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which spatially modulates reflected light. Light from the micromirrors of the DMD are directed to irradiation regions (61) on the substrate, respectively. The irradiation regions (61) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions (61) is tilted relative to the main scanning direction, and a center-to-center distance (L1) along the sub-scanning direction between two adjacent irradiation regions (61) arranged in the main scanning direction is made equal to a pitch (P1) of writing cells (620) on the substrate with respect to the sub-scanning direction. ON/OFF control of light irradiation of each irradiation region is performed each time the irradiation regions 61 move a distance equal to twice a pitch (P2).

    摘要翻译: 用于在感光材料上写入图案的图案写入装置包括具有DMD的头部,该DMD具有空间调制反射光的微镜组。 来自DMD的微镜的光分别被引导到基板上的照射区域(61)。 照射区域(61)通过衬底相对于头部的运动而移动到衬底上。 DMD设置在头部内,使得照射区域(61)的布置方向相对于主扫描方向倾斜,并且沿着副扫描方向在两个相邻照射之间的中心到中心距离(L1) 使沿主扫描方向排列的区域(61)相对于副扫描方向等于基板上的写入单元(620)的间距(P1)。 每次照射区域61移动相当于间距(P2)的两倍的距离时,进行各照射区域的光照射的ON / OFF控制。

    Pattern writing apparatus and pattern writing method
    2.
    发明授权
    Pattern writing apparatus and pattern writing method 有权
    图案书写装置和图案书写方法

    公开(公告)号:US06903798B2

    公开(公告)日:2005-06-07

    申请号:US10898197

    申请日:2004-07-26

    摘要: A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which spatially modulates reflected light. Light from the micromirrors of the DMD are directed to irradiation regions (61) on the substrate, respectively. The irradiation regions (61) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions (61) is tilted relative to the main scanning direction, and a center-to-center distance (L1) along the sub-scanning direction between two adjacent irradiation regions (61) arranged in the main scanning direction is made equal to a pitch (P1) of writing cells (620) on the substrate with respect to the sub-scanning direction. ON/OFF control of light irradiation of each irradiation region is performed each time the irradiation regions 61 move a distance equal to twice a pitch (P2).

    摘要翻译: 用于在感光材料上写入图案的图案写入装置包括具有DMD的头部,该DMD具有空间调制反射光的微镜组。 来自DMD的微镜的光分别被引导到基板上的照射区域(61)。 照射区域(61)通过衬底相对于头部的运动而移动到衬底上。 DMD设置在头部内,使得照射区域(61)的布置方向相对于主扫描方向倾斜,并且沿着副扫描方向的中心到中心距离(L 1)在两个相邻 使沿主扫描方向排列的照射区域(61)相对于副扫描方向等于基板上的写入单元(620)的间距(P 1)。 每次照射区域61移动等于距离的两倍(P 2)的距离时,进行每个照射区域的光照射的ON / OFF控制。

    Pattern writing apparatus and pattern writing method
    3.
    发明授权
    Pattern writing apparatus and pattern writing method 有权
    图案书写装置和图案书写方法

    公开(公告)号:US06859223B2

    公开(公告)日:2005-02-22

    申请号:US10430302

    申请日:2003-05-07

    CPC分类号: B41J2/465

    摘要: An image recording apparatus (1) has a stage unit (2) for holding a substrate (9), an irradiation unit (4) having a plurality of irradiation parts (40) and a mechanism for relatively moving the stage unit (2) and the irradiation unit (4). An irradiation part (40) is provided with a DMD having a group of micromirrors for modulating a reflected light beam and a micro moving mechanism for moving the DMD relatively to the irradiation unit (4) in the X direction, thereby microscopically moving an irradiation position of the irradiation part (40) in the X direction. The irradiation part (40) is further provided with a zoom lens, thereby magnifying and reducing an image of the DMD on the substrate (9). By controlling a plurality of irradiation parts (40) parallelly and independently, the image recording apparatus (1) can write a fine pattern at high speed.

    摘要翻译: 图像记录装置(1)具有用于保持基板(9)的台单元(2),具有多个照射部(40)的照射单元(4)和用于使台单元(2)相对移动的机构, 照射单元(4)。 照射部分(40)设置有具有用于调制反射光束的一组微镜的DMD和用于相对于照射单元(4)在X方向上移动DMD的微移动机构,从而显微地移动照射位置 的照射部(40)。 照射部分(40)还设置有变焦透镜,从而放大和缩小基板(9)上的DMD的图像。 通过平行且独立地控制多个照射部分(40),图像记录装置(1)可以高速地写入精细图案。

    Laser drawing apparatus and laser drawing method
    4.
    发明授权
    Laser drawing apparatus and laser drawing method 失效
    激光拉丝装置和激光拉丝法

    公开(公告)号:US06753896B2

    公开(公告)日:2004-06-22

    申请号:US10300151

    申请日:2002-11-20

    IPC分类号: B41J2435

    摘要: A laser drawing apparatus according to the invention calibrates the accuracy of a first light quantity monitor in detecting the quantities of laser beams, based on results of detection by a second light quantity monitor of the quantities of laser beams emitted from an imaging optical system to a drawing stage, when a characteristic deterioration of or adhesion of foreign matter to optical components of the first light quantity monitor has resulted in variations in the optical characteristic of the first light quantity monitor, and variations in the detection by the first light quantity monitor of the quantities of the laser beams. The quantities of the laser beams emitted to a printed circuit board (image-receiving object) is thereby adjusted to a proper value, to maintain high-quality, high-definition drawings requiring a high degree of light quantity precision.

    摘要翻译: 根据本发明的激光绘制装置,基于第二光量监视器对从成像光学系统发射的激光束的量的检测结果,校正第一光量监视器在检测激光束的量时的精度 当第一光量监视器的异物对光学部件的特性劣化或附着导致第一光量监视器的光学特性的变化以及第一光量监视器的检测的变化时, 数量的激光束。 因此,将发射到印刷电路板(图像接收对象)的激光束的量调整到适当的值,以保持需要高度光量精度的高质量高分辨率图形。

    Conversion device for laser interferometic measuring apparatus
    6.
    发明授权
    Conversion device for laser interferometic measuring apparatus 失效
    用于激光干涉仪测量装置的转换装置

    公开(公告)号:US5184313A

    公开(公告)日:1993-02-02

    申请号:US531040

    申请日:1990-05-31

    IPC分类号: G01B9/02 G01D3/02 G01D3/036

    摘要: An A-phase pulse (S.sub.A) and a B-phase pulse (S.sub.B) are transmitted from a laser interferometic measuring device to a conversion device (5). When the distance-to-be-measured (l) is increasing, a conversion coefficient (D.sub.R) is added to or subtracted from an initial value in an arithmetic calculator (53) at the rising edge and the trailing edge of the pulses (S.sub.A, S.sub.B). The conversion coefficient has a digital value of M-digits and represents a reference distance .lambda./N, where .lambda. is the wavelength of a laser beam (LB.sub.1, LB.sub.2) employed in the laser measuring machine and M and N are positive integers. A predetermined unit distance in the metric system corresponds to a unit number in the (M+1)-th digit. A distance pulse signal (S.sub.L) is generated in response to a carry signal and a borrow signal from the arithmetic calculator, and is used in expressing a change of the distance in the metric system.

    Piercing apparatus for lining material
    7.
    发明授权
    Piercing apparatus for lining material 失效
    用于衬里材料的穿孔装置

    公开(公告)号:US5957024A

    公开(公告)日:1999-09-28

    申请号:US529323

    申请日:1995-09-18

    申请人: Akira Kuwabara

    发明人: Akira Kuwabara

    IPC分类号: B26F1/14 B26F1/02

    摘要: A piercing apparatus for forming partially overlapped small holes in upper and lower layers of lining material includes upper and lower piercing stands having piercing members affixed thereto respectively. The upper and lower piercing members have engaging cut-out portions corresponding to a shape of the overlap desired between the holes. When holes are formed for a first layer of lining material, the material is positioned between upper and lower stands mounting the piecing members and the lower piercing member is driven up to cut-out the shape of the opening for the first layer except for the overlap area. Then as the lower piercing member is driven up further, the leading edge of its cut-out portion engages the trailing edge of the corresponding cut-out portion of the upper piercing member. At this time the shape of the overlap portion is cut from the first layer of lining material. When the openings for the second layer of lining material are to be formed, the above operation is reversed and the opening may be shaped and positioned with a single apparatus.

    摘要翻译: 用于在衬里材料的上层和下层中形成部分重叠的小孔的穿孔装置包括分别固定在其上的穿孔构件的上下穿孔架。 上下穿刺构件具有对应于孔之间期望的重叠形状的接合切口部分。 当为第一层衬里材料形成孔时,将材料定位在安装接头构件的上部和下部支架之间,并且下部穿孔构件被驱动以切除除了重叠之外的第一层的开口的形状 区。 然后当下穿刺构件被进一步驱动时,其切口部分的前缘接合上穿刺构件的相应切口部分的后缘。 此时,从第一衬里材料层切下重叠部分的形状。 当要形成用于第二层衬里材料层的开口时,上述操作被反转,并且开口可以用单个装置成形和定位。

    Reversible-lid arrangement
    8.
    发明授权
    Reversible-lid arrangement 失效
    可逆盖布置

    公开(公告)号:US5257846A

    公开(公告)日:1993-11-02

    申请号:US935275

    申请日:1992-08-26

    IPC分类号: B60R5/04 B62D43/10 B62D43/00

    摘要: A reversible-lid arrangement for a motor vehicle includes a floor panel having an opening, a lid member, and a pair of oppositely-arranged guide rails. The lid member is so sized as to close the opening, and has first and second side surfaces which are opposed to each other. The lid member has first and second projections which are formed on the first side surface and spaced away from each other with a certain predetermined distance therebetween, and third and fourth projections which are formed on the second side surface and spaced away from each other with the predetermined distance therebetween. The guide rails are so sized and spaced away from each other as to fit therein the first, second, third and fourth projections of the lid member. Each guide rail has first and second notches each of which is so sized as to allow one of the first, second, third and fourth projections to pass therethrough, and so positioned as to expose the one of the first, second, third and fourth projections when the opening of the floor panel is fully closed by the lid member. Thus, the lid member can be easily and quickly turned upside down without requiring much space.

    摘要翻译: 用于机动车辆的可逆盖装置包括具有开口的底板,盖构件和一对相对布置的导轨。 盖构件的尺寸被设计成闭合开口,并且具有彼此相对的第一和第二侧表面。 盖构件具有第一和第二突起,第一和第二突起形成在第一侧表面上并以彼此间隔一定的预定距离彼此间隔开;以及第三和第四突起,其形成在第二侧表面上并且彼此间隔开 预定距离。 导轨的尺寸和尺寸相互隔开,以配合盖件的第一,第二,第三和第四突起。 每个导轨具有第一和第二凹口,每个凹槽的尺寸被设计成允许第一,第二,第三和第四突起中的一个穿过其中,并且定位成暴露第一,第二,第三和第四突起中的一个 当地板面板的开口被盖构件完全关闭时。 因此,盖构件可以容易且快速地颠倒而不需要太多的空间。

    Door installation arrangement for vehicle
    9.
    发明授权
    Door installation arrangement for vehicle 失效
    车载门安装

    公开(公告)号:US5244247A

    公开(公告)日:1993-09-14

    申请号:US925186

    申请日:1992-08-06

    申请人: Akira Kuwabara

    发明人: Akira Kuwabara

    摘要: A door installation arrangement adapted to widely open a door of an automotive vehicle. The door installation arrangement is comprised of a double hinge member which has a first end section hingedly connected to a door body side, and a second end section hingedly connected to a vehicle body side. A hinge trim is disposed separate from the double hinge member to decoratively cover the double hinge member. The hinge trim is hingedly connected at its front end within the vehicle body side through a sub-double hinge member and at its rear end with a door trim through a hinge member.

    摘要翻译: 一种适于广泛打开机动车门的门安装装置。 门安装装置包括双铰链构件,该双铰链构件具有铰链地连接到门主体侧的第一端部和铰接地连接到车身侧的第二端部。 铰链修剪件与双铰链构件分离设置以装饰地覆盖双铰链构件。 铰链修剪件通过副双铰链构件在其车体侧的前端处铰接连接,并且其后端处通过铰链构件具有门装饰。

    Optical beam scanning system
    10.
    发明授权
    Optical beam scanning system 失效
    光束扫描系统

    公开(公告)号:US5225924A

    公开(公告)日:1993-07-06

    申请号:US500971

    申请日:1990-03-29

    IPC分类号: G06K15/12

    摘要: An optical beam scanning system for scanning photosensitive material (1) comprises a laser (201), a beam splitter (204) for producing multibeams (LB.sub.a, LB.sub.b), AOM's (207a, 207b), a multibeam adjuster (300) for turning the multibeams to intersect each other at a prescribed point (P.sub.C), a horizontal expander (211), an AOD (213), a vertical expander (214), a deflection direction adjuster (400) for rotating a deflection direction of the multibeams, and a variable focusing mechanism (500) comprising a plurality of object lenses (501-504). A pixel pitch and a spot diameter on the photosensitive material can be changed separately from each other by exchanging the object lenses and by adjusting an angle of intersection of multibeams (B.sub.a, B.sub.b) by means of the multibeam adjuster. Cylindrical lenses of the horizontal and vertical expanders are so positioned that they compensate a cylindrical lensing effect of the AOD.