公开(公告)号：US20120249990A1

公开(公告)日：2012-10-04

申请号：US13416830

申请日：2012-03-09

申请人： Kazuhiro NISHIMURA ,  Yasushi NAKAMURA ,  Yasuo KAWAMATSU ,  Ryuichi CHIKAMORI

发明人： Kazuhiro NISHIMURA ,  Yasushi NAKAMURA ,  Yasuo KAWAMATSU ,  Ryuichi CHIKAMORI

IPC分类号： G03B27/58

CPC分类号： B05B13/02 ,  B05B15/60 ,  G03F7/707 ,  G03F7/70733 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67769 ,  H01L21/67781

摘要： A substrate processing apparatus includes an indexer block, a first processing block, a second processing block, and an interface block. The indexer block includes a pair of carrier platforms and a transport section. A carrier storing a plurality of substrates in multiple stages is placed in each of the carrier platforms. The transport section includes transport mechanisms. The transport mechanisms concurrently transport the substrates.

摘要翻译： 基板处理装置包括索引器块，第一处理块，第二处理块和接口块。 索引器块包括一对载体平台和传送部分。 在多个载体平台中放置多个存储多个基板的载体。 运输部分包括运输机构。 运输机构同时运输基材。

公开(公告)号：US20130258299A1

公开(公告)日：2013-10-03

申请号：US13845211

申请日：2013-03-18

申请人： Kazuhiro NISHIMURA ,  Akihiko MORITA ,  Yukihiko INAGAKI

发明人： Kazuhiro NISHIMURA ,  Akihiko MORITA ,  Yukihiko INAGAKI

IPC分类号： G03F7/20

CPC分类号： G03F7/2012 ,  G03F7/0035 ,  G03F7/38

摘要： In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.

摘要翻译： 在整个区域曝光单元中，平台部分和局部传送机构沿一个方向布置。 本地传送机构设有本地传送手。 其上形成有预定图案的抗蚀剂膜的基板由本地转印手保持。 发光装置安装在本地传送机构的上部。 带状光从发光装置向下方射出。 本地传送机构的操作使得本地传送手相对于发光装置移动。 此时，发光装置照射与条状光水平移动的基板的一个面。 抗蚀剂膜被光改性。

公开(公告)号：US20130312658A1

公开(公告)日：2013-11-28

申请号：US13892440

申请日：2013-05-13

申请人： Masahito KASHIYAMA ,  Kazuhiro NISHIMURA

发明人： Masahito KASHIYAMA ,  Kazuhiro NISHIMURA

IPC分类号： B05C13/00

CPC分类号： B05C13/00 ,  H01L21/67167 ,  H01L21/67178 ,  H01L21/67751

摘要： A platform section has an upper platform chamber and a lower platform chamber. Platform units are provided in the upper platform chamber and the lower platform chamber, respectively. A plurality of local arms corresponding to coating processing chambers are provided in the upper platform chamber and the lower platform chamber, respectively. Further, in the upper platform chamber and the lower platform chamber, a plurality of local arms respectively corresponding to a plurality of thermal processing units, a plurality of local arms respectively corresponding to a plurality of adhesion reinforcement processing units and a plurality of local arms respectively corresponding to a plurality of cooling units are provided.

摘要翻译： 平台部分具有上平台室和下平台室。 平台单元分别设置在上平台室和下平台室中。 分别在上平台室和下平台室中分别设置与涂布处理室对应的多个局部臂。 此外，在上平台室和下平台室中，分别对应于多个热处理单元的多个局部臂，分别对应于多个粘附加强处理单元和多个局部臂的多个局部臂 对应于多个冷却单元。