摘要:
A method of evaluating a refractive index homogeneity of an optical member for photolithography, the method comprising: a measurement step of transmitting light having a predetermined wavelength &lgr; through the optical member so as to measure a wavefront aberration; a Zernike fitting step of expanding thus measured wavefront aberration into a polynomial of a Zernike cylindrical function system; a first separating step of separating individual components of the polynomial into a rotationally symmetric element, an odd-symmetric element, and an even-symmetric element; and a second separating step of separating individual components of the polynomial into a plurality of parts according to a degree thereof.
摘要:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
摘要:
Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
摘要:
The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193 nm) excimer laser, is used. The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.
摘要:
A silica glass member manufacturing method of the present invention includes the steps of making a silicon compound react in oxyhydrogen flame using a burner having a multi-tubular structure to obtain fine silica glass particles, depositing the fine silica glass particles on a support rotating and placed to oppose the burner to obtain a silica glass ingot with a temperature distribution in at least one plane perpendicular to a rotational axis of the silica glass ingot, the temperature distribution being symmetrical with respect to the rotational axis and having a maximal value between a center and a peripheral portion of the plane, and obtaining a distribution of signed birefringence values on the basis of birefringence values and directions of phase advance axes measured at a plurality of points in the plane perpendicular to the rotational axis of the silica glass ingot and cutting, from the silica glass ingot, a silica glass member whose signed birefringence values monotonously increase from the center to the peripheral portion of the plane.
摘要:
A liquid material supplying apparatus comprises:vessels 150, 250, each having gas inlet pipe 151, 251, discharge pipe 153, 253, and interconnection pipe 155, 255 capable of making the gas inlet pipe 151, 251 communicate with the discharge pipe 153, 253, the vessels containing a liquid material;a permanent line P comprising gas line connection pipes 113, 213 detachably connected to the gas inlet pipes 151, 251, gas supply pipe 111 connected to the gas line connection pipes 113, 213 and to pressure gas supply 70, material line connection pipes 123, 223 detachably connected to the discharge pipes 153, 253, material supply pipe 127 connected to the material line connection pipes 123, 223 and to vaporizer 91, and by-pass pipes 129, 229 capable of making the gas supply pipe 111 communicate with the material line connection pipe 123, 223; anda vent line 30 comprising exhaust pipes 131, 231 connected to the gas line connection pipes 113, 213 or to the material line connection pipes 123, 223, and a vacuum pump 135 connected to the exhaust pipes 131, 231.
摘要:
Disclosed herein is a method for extracting a biosubstance from a root of a hair, including the step of using as the hair a hair that has pulling force of at least a predetermined reference value to pull out the hair.
摘要:
Disclosed herein is a mountable unit for biological signal measurement, including: three electrodes; and a support body configured to support the three electrodes at positions corresponding to a positional relationship among a predetermined position on a forehead on one side of a face bounded by a midline, a temple position on the one side of the face, and a predetermined position on a zygomatic body on the one side of the face.
摘要:
To detect an infinitesimal substance with a high sensitivity without amplifying the infinitesimal substance. A nucleic acid strand for detection P having at least a fluorescent substance F which can serve as a donor of resonance excitation energy (fluorescence resonance energy), a quencher substance Q which is located at a position enabling it to receive the resonance excitation energy, and a nucleic acid strand region N which is located between the quencher substance Q and the fluorescent substance F and has an enzyme cleavage site X to be cleaved by an endonuclease; and a detection technique using the nucleic acid strand for detection P.
摘要:
An object is to provide an image display device which exercises a function of adjusting a biological clock without changing a visibility of an image. An image display device (A) for displaying an image by radiating a light from a light source (1) to a display portion (2) includes: the light source (1) having a radiation emitter for emitting a light having a wavelength band of 445 to 480 nm; and control means (3) for controlling an intensity of the light having the wavelength band; in which a display portion includes an area (21) on which a predetermined image is displayed; and an area (22) on which an image for which the intensity of the light having the wavelength band is controlled by the control means (3) separately, independently of each other.