公开(公告)号：US20060126045A1

公开(公告)日：2006-06-15

申请号：US11350937

申请日：2006-02-10

申请人： Kazuya Ono ,  Yuichi Shibazaki

发明人： Kazuya Ono ,  Yuichi Shibazaki

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70833

摘要： An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.

公开(公告)号：US20100134771A1

公开(公告)日：2010-06-03

申请号：US12656361

申请日：2010-01-27

申请人： Kazuya Ono ,  Yuichi Shibazaki

发明人： Kazuya Ono ,  Yuichi Shibazaki

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70833

摘要： A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid. The projection system includes a first part and a second part that are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part. Each part includes an optical element of the projection system and the first and second parts are not attached to and movable with the substrate.

摘要翻译： 光刻投影设备包括布置成调节辐射束的照明系统，被配置为保持图案形成装置的支撑结构，所述图案形成装置能够赋予辐射束图案，衬底台构造成保持衬底，突出部 系统，其布置成将图案化的辐射束投影到基板的目标部分上，以及液体供应系统，其构造成至少部分地用液体填充投影系统和基板之间的空间。 投影系统包括第一部分和第二部分，其是彼此基本隔离的两个分开的物理部分，使得第二部分中的振动基本上被阻止转移到第一部分。 每个部分包括投影系统的光学元件，并且第一和第二部分不附着到基板上并与基板一起移动。

公开(公告)号：US07619715B2

公开(公告)日：2009-11-17

申请号：US11322125

申请日：2005-12-30

申请人： Kazuya Ono ,  Yuichi Shibazaki

发明人： Kazuya Ono ,  Yuichi Shibazaki

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70341 ,  G03F7/70833

摘要： An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.

摘要翻译： 曝光装置是曝光装置，其通过在投影光学系统和基板之间填充液体而曝光基板，并且经由投影光学系统和液体将图案图像投影到基板上，其中投影光学系统具有第一组 包括与液体接触的光学构件和与第一组不同的第二组; 第一组由第一个支持成员支持; 并且第二组与第一组分离，并且由与第一支撑构件不同的第二支撑构件支撑。

公开(公告)号：US08120751B2

公开(公告)日：2012-02-21

申请号：US12585498

申请日：2009-09-16

申请人： Kazuya Ono ,  Yuichi Shibazaki

发明人： Kazuya Ono ,  Yuichi Shibazaki

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70833

摘要： An exposure apparatus fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate. The projection optical system has a first group including an optical member that comes into contact with the liquid, and a second group that differs from the first group. The first group is supported by a first support member via a vibration isolating apparatus.

摘要翻译： 曝光装置用液体填充投影光学系统和基板之间的空间，并将图案图案投影到基板上以露出基板。 投影光学系统具有包括与液体接触的光学部件的第一组和与第一组不同的第二组。 第一组通过隔振装置由第一支撑构件支撑。

公开(公告)号：US20100007865A1

公开(公告)日：2010-01-14

申请号：US12585498

申请日：2009-09-16

申请人： Kazuya Ono ,  Yuichi Shibazaki

发明人： Kazuya Ono ,  Yuichi Shibazaki

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70833

摘要： An exposure apparatus fills a space between a projection optical system and a substrate with a liquid and projects a pattern image onto the substrate to expose the substrate. The projection optical system has a first group including an optical member that comes into contact with the liquid, and a second group that differs from the first group. The first group is supported by a first support member via a vibration isolating apparatus.

摘要翻译： 曝光装置用液体填充投影光学系统和基板之间的空间，并将图案图案投影到基板上以露出基板。 投影光学系统具有包括与液体接触的光学部件的第一组和与第一组不同的第二组。 第一组通过隔振装置由第一支撑构件支撑。

公开(公告)号：US20060103944A1

公开(公告)日：2006-05-18

申请号：US11322125

申请日：2005-12-30

申请人： Kazuya Ono ,  Yuichi Shibazaki

发明人： Kazuya Ono ,  Yuichi Shibazaki

IPC分类号： G02B3/00

CPC分类号： G03F7/70341 ,  G03F7/70833

摘要： An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.

公开(公告)号：US08228484B2

公开(公告)日：2012-07-24

申请号：US12068323

申请日：2008-02-05

申请人： Kazuya Ono ,  Yuichi Shibazaki

发明人： Kazuya Ono ,  Yuichi Shibazaki

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70833

摘要： An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.

摘要翻译： 曝光装置是曝光装置，其通过在投影光学系统和基板之间填充液体而曝光基板，并且经由投影光学系统和液体将图案图像投影到基板上，其中投影光学系统具有第一组 包括与液体接触的光学构件和与第一组不同的第二组; 第一组由第一个支持成员支持; 并且第二组与第一组分离，并且由与第一支撑构件不同的第二支撑构件支撑。

公开(公告)号：US20090190117A1

公开(公告)日：2009-07-30

申请号：US12320267

申请日：2009-01-22

申请人： Kazuya Ono ,  Toshimasa Shimoda ,  Yoichi Arai ,  Jin Nishikawa

发明人： Kazuya Ono ,  Toshimasa Shimoda ,  Yoichi Arai ,  Jin Nishikawa

IPC分类号： G03B27/54

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： An exposure apparatus includes an illumination optical system that guides illumination light to a mask; a projection optical system that projects the pattern irradiated with the illumination light, onto a substrate; and a supporting device that integrally suspendingly supports at least part of the illumination optical system and the projection optical system, with a supporting member having a flexible structure.

摘要翻译： 曝光装置包括将照明光引导到面罩的照明光学系统; 将照射光照射的图案投影到基板上的投影光学系统; 以及支撑装置，其利用具有柔性结构的支撑构件一体地悬挂地支撑照明光学系统和投影光学系统的至少一部分。

公开(公告)号：US20060285092A1

公开(公告)日：2006-12-21

申请号：US11412079

申请日：2006-04-27

申请人： Kazuya Ono

发明人： Kazuya Ono

IPC分类号： G03B27/52 ,  G03B27/42 ,  G01J1/00

CPC分类号： G03F7/706 ,  G03F7/70266 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70825 ,  G03F7/7085

摘要： An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light; a light-transmissive member provided at the stage apparatus, wherein a liquid is supplied on an upper surface of the light-transmissive member; and a measurement device which is settable below the light-transmissive member when measurement using the measurement device is performed. Leakage or entrance of a liquid used for exposure into an optical measurement device such as a wavefront aberration measurement device can be prevented, thereby enabling preferable optical adjustment such as imaging performance or optical characteristics.

公开(公告)号：US06724466B2

公开(公告)日：2004-04-20

申请号：US10107663

申请日：2002-03-26

申请人： Kazuya Ono ,  Andrew J. Hazelton

发明人： Kazuya Ono ,  Andrew J. Hazelton

IPC分类号： G03B2758

CPC分类号： G03F7/70766 ,  G03F7/70716

摘要： A stage assembly (10) for moving and positioning a device (30) includes a stage (14), a stage mover assembly (16), a device table (18), a table mover assembly (20) and a damping assembly (22). The table mover assembly (20) moves the device table (18) along a Z axis, about an X axis and about a Y axis relative to the stage (14) and generates reaction forces. The damping assembly (22) is coupled to the table mover assembly (20). Uniquely, the damping assembly (22) reduces the reaction forces created by the table mover assembly (20) that are transferred to the stage (14).

摘要翻译： 用于移动和定位装置（30）的平台组件（10）包括台架（14），平台移动器组件（16），装置台（18），台动机组件（20）和阻尼组件（22） ）。 台式移动器组件（20）沿Z轴围绕X轴移动设备台（18），并相对于平台（14）绕Y轴移动并产生反作用力。 阻尼组件（22）联接到台式推动器组件（20）。 唯一地，阻尼组件（22）减小了由移动器组件（20）产生的反作用力，这些反作用力被传递到载物台（14）。