公开(公告)号：US06376977B1

公开(公告)日：2002-04-23

申请号：US09580638

申请日：2000-05-30

申请人： Makoto Kawai ,  Keiichi Goto ,  Kazuyoshi Tamura ,  Yoshihiro Kubota ,  Toshimi Kobayashi

发明人： Makoto Kawai ,  Keiichi Goto ,  Kazuyoshi Tamura ,  Yoshihiro Kubota ,  Toshimi Kobayashi

IPC分类号： G01M1102

CPC分类号： H01J37/32009 ,  H01J37/3255 ,  Y10T428/24421 ,  Y10T428/249969

摘要： There is disclosed a silicon electrode plate including silicon single crystal used as an upper electrode in a plasma etching apparatus wherein concentration of interstitial oxygen contained in the silicon electrode plate is not less than 5×1017 atoms/cm3 and not more than 1.5×1018 atoms/cm3, and the silicon electrode plate wherein nitrogen concentration in the silicon electrode plate is not less than 5×1013 atoms/cm3 and not more than 5×1015 atoms/cm3. There can be provided a silicon electrode plate consisting of silicon single crystal used as an upper electrode in a plasma etching apparatus wherein problems due to adhesion of impurities such as heavy metal or the like can be prevented.

摘要翻译： 公开了一种在等离子体蚀刻装置中用作上电极的硅单晶的硅电极板，其中硅电极板中所含的间隙氧的浓度不小于5×10 17原子/ cm 3且不大于1.5×10 18原子/ cm 3， 硅电极板中的氮浓度不小于5×10 13原子/ cm 3且不大于5×10 15原子/ cm 3的硅电极板。 在等离子体蚀刻装置中可以提供由用作上电极的硅单晶组成的硅电极板，其中可以防止由于诸如重金属等的杂质的附着而引起的问题。

公开(公告)号：US06815352B1

公开(公告)日：2004-11-09

申请号：US09696955

申请日：2000-10-27

申请人： Kazuyoshi Tamura ,  Makoto Kawai ,  Keiichi Goto

发明人： Kazuyoshi Tamura ,  Makoto Kawai ,  Keiichi Goto

IPC分类号： H01L21302

CPC分类号： H01J37/32642 ,  C30B15/00 ,  C30B29/06

摘要： There is disclosed a silicon focus ring consisting of silicon single crystal used as a silicon focus ring in a plasma apparatus, wherein concentration of interstitial oxygen contained in the silicon focus ring is not less than 5×1017 atoms/cm3 and not more than 1.5×1018 atoms/cm3, and a producing method for a silicon focus ring used for a plasma apparatus, wherein a single crystal silicon wherein concentration of interstitial oxygen contained in the silicon focus ring is not less than 5×1017 atoms/cm3 and not more than 1.5×1018 atoms/cm3 is grown by a Czochralski method, the single crystal silicon is processed in a circle, and a silicon focus ring is produced. There can be provided a silicon focus ring, which can prevent disadvantage due to impurities such as heavy metal.

摘要翻译： 公开了在等离子体装置中用作硅聚焦环的硅单晶组成的硅聚焦环，其中硅聚焦环中所含的间隙氧的浓度不小于5×10 17原子/ cm 3，而不是 大于1.5×10 18原子/ cm 3，以及用于等离子体装置的硅聚焦环的制造方法，其中，在硅聚焦环中包含的间隙氧的浓度为5×10 6个以上的单晶硅 通过Czochralski法生长17个原子/ cm 3以上1.5×10 18个/ cm 3以下的单晶硅，制成硅聚焦环。 可以提供硅聚焦环，其可以防止由于诸如重金属的杂质导致的不利影响。

公开(公告)号：US4600601A

公开(公告)日：1986-07-15

申请号：US744726

申请日：1985-06-14

申请人： Kazuyoshi Tamura

发明人： Kazuyoshi Tamura

IPC分类号： H05K3/28 ,  B05C5/00 ,  B05D1/30 ,  B05D7/00 ,  H01B19/04 ,  H05K3/00 ,  B05D5/12

CPC分类号： B05D1/30 ,  B05C5/004 ,  B05C5/005 ,  H01B19/04 ,  H05K3/0091 ,  H05K2203/1527 ,  H05K2203/1563 ,  H05K2203/159 ,  H05K3/284

摘要： A process of insulatingly coating a front and a back surface of a printed circuit board is disclosed. A vessel has a large top opening for receiving coating liquid therein and has a plurality of small apertures formed in the bottom. The vessel is immersed into a pool of coating liquid contained in a reservoir for injection of coating liquid into the vessel. The vessel is pulled upward from the reservoir before a printed circuit board reaches the location of the vessel, whereby a coating liquid flows down through the plurality of apertures in the vessel as series of continuous thin streams in the form of strings. A printed circuit board disposed at an angle is fed through the shower thus formed. After passing through the shower, the board is pivotally driven to present a surface which has previously been facing downward upward, and the board is again fed in an inclined position through the shower. The coating liquid on the front and the back surface is allowed to be drained off the board, which is then fed to a drying stage where an air stream is directed upward toward the board from the downside thereof, and the board is angularly driven about a horizontal axis.

摘要翻译： 公开了绝缘涂布印刷电路板的正面和背面的工艺。 容器具有用于在其中接收涂布液体的大的顶部开口，并且在底部形成有多个小孔。 将容器浸入容纳在用于将涂布液注入容器中的储存器中的涂布液池中。 在印刷电路板到达容器的位置之前，容器从储存器向上拉，由此涂覆液体以串的形式的一系列连续的细流向下流过容器中的多个孔。 以一定角度设置的印刷电路板通过如此形成的淋浴器进给。 在通过淋浴之后，板被枢转地驱动以呈现先前已经面向下的表面，并且板再次通过淋浴器以倾斜的位置进给。 允许将前表面和后表面上的涂布液从板上排出，然后将其进料到干燥阶段，其中空气流从其下侧朝向板向上指向板，并且板沿着 横轴。

公开(公告)号：US5721926A

公开(公告)日：1998-02-24

申请号：US178654

申请日：1994-01-07

申请人： Kazuyoshi Tamura

发明人： Kazuyoshi Tamura

IPC分类号： G06F9/06 ,  G06F9/44

CPC分类号： G06F8/10

摘要： It is an object of the present invention to provide a state-transition-model-based programming system where the program data structure is simple and compact. To achieve this object, one or more specifications comprising a program are entered from the input unit (11) and specification input section (12) in the from of state transition models. The specification storage means (21) stores the specifications. The specification execution section (32) executes the specifications. When one of the beginning conditions is satisfied, the priority processing section (33) changes the specification to the next specification corresponding to the beginning condition. The change processing section (34) determines the beginning state of the next specification according to the correspondence stored in the state map storage means.

摘要翻译： 本发明的目的是提供一种基于状态转换模型的编程系统，其中程序数据结构简单紧凑。 为了实现该目的，从状态转换模型中的输入单元（11）和规格输入部（12）输入包括程序的一个或多个规格。 规格存储装置（21）存储规格。 规格执行部（32）执行规格。 当满足开始条件之一时，优先处理部（33）将规格改变为与开始条件对应的下一规格。 变更处理部（34）根据存储在状态图存储单元中的对应关系确定下一规格的开始状态。

公开(公告)号：US5940617A

公开(公告)日：1999-08-17

申请号：US931244

申请日：1997-09-16

申请人： Kazuyoshi Tamura

发明人： Kazuyoshi Tamura

IPC分类号： G05B19/05 ,  G06F11/28 ,  G06F11/36 ,  G06F1/00

CPC分类号： G06F11/3612 ,  G06F11/362

摘要： In a debug transition information file or a debug state information file, individual states and individual transitions have been correlated with addresses of an object code. While a program executing portion is executing a program, if a program stop command or the like is issued, a debugger executes the stop operation of the program with an address of the object code specified, based on the correlated results. Thus, the program can be more easily stopped or re-executed at any position in the function specifications. In addition, a state or a transition can be easily specified at any position of the program. When the function specifications have a hierarchical structure, the operation of the system can be easily checked.

摘要翻译： 在调试转换信息文件或调试状态信息文件中，各个状态和各个转换已经与目标代码的地址相关联。 当程序执行部正在执行程序时，如果发出程序停止命令等，则调试器基于相关结果执行具有指定目标代码的地址的程序的停止操作。 因此，程序可以在功能规范中的任何位置更容易地停止或重新执行。 此外，可以在程序的任何位置轻松指定状态或转换。 当功能规格具有层次结构时，可以方便地检查系统的操作。

公开(公告)号：US4196685A

公开(公告)日：1980-04-08

申请号：US924322

申请日：1978-07-13

申请人： Kazuyoshi Tamura

发明人： Kazuyoshi Tamura

IPC分类号： D05B51/00 ,  D05B69/36 ,  H02P3/06 ,  H02P29/00

CPC分类号： D05B51/00

摘要： A drive control system for stopping a sewing machine when a thread of the sewing machine is broken or tangled. The system comprises rotational speed meter circuits, each one of which is coupled with respective thread tension disk means which rotate in synchronism due to movement of threads on them. A deceleration of the rotation of one of the thread tension disk means is detected by a rotational speed meter circuit coupled with it. An electric logic circuit in the system, which is energized to drive the sewing machine in response to a closure of a start switch and deenergized to stop the sewing machine in response to a closure of a stop switch, is deenergized to stop the sewing machine in response to the detection of the deceleration of the rotation of one of the rotary disks.

摘要翻译： 一种驱动控制系统，用于当缝纫机的线断裂或缠结时停止缝纫机。 该系统包括旋转速度计电路，其中的每一个电路与相应的线张力盘装置耦合，由于它们上的线的移动而同步旋转。 线张力盘装置中的一个的旋转的减速度由与其耦合的转速计电路检测。 系统中的电逻辑电路被激励以响应于启动开关的闭合而驱动缝纫机，并且断电以响应于停止开关的关闭而停止缝纫机，断电以使缝纫机停止 响应于检测一个旋转盘的旋转的减速度。