摘要:
An apparatus for supplying a constant amount of abrasive which can supply even dry ice particles, ice particles, or the like as abrasive in a constant amount is provided. In order to take out abrasive contained in measuring holes 21 of a rotating disc 20, an abrasive mixing section 40 for blowing a compressed gas into each of the measuring holes 21 has a cylinder 41′ which opens toward one surface of the rotating disc at the position where the measuring holes are formed. A piston 43′ is inserted into the cylinder. A fluid channel 45 opens toward the cylinder 41′ through the intermediary of the rotating disc 20 and whose opening rim 45a is in sliding contact with another surface of the rotating disc 20. One of the cylinder 41′ and the fluid channel 45 communicates with a compressed-gas supply source through the intermediary of a compressed-gas introduction path 52. The other one of the cylinder 41′ and the fluid channel 45 communicates with the abrasive transport path 51. The piston 43′ has a through-hole 43a passing therethrough in such a manner as to coincide with the position where the measuring holes are formed.
摘要:
The problem addressed by the present invention is providing a technique for fabricating, by a method simpler than conventional methods, a silicon substrate that is effective for light trapping, one surface of which has a textured structure and the other surface of which has higher reflectivity than the surface having the textured structure. The fabrication method for this semiconductor substrate comprises: a sandblasting step in which a first surface of a silicon substrate in an as-sliced state, fabricated by slicing a silicon ingot, is surface treated by sandblasting and, after the sandblasting step, a step for carrying out surface treatment using an etching solution that contains either or both of hydrofluoric acid and nitric acid on the silicon substrate.
摘要:
In blasting with an abrasive containing liquid to confer elasticity, the abrasive from which liquid evaporates in the course of continuance use is uniformly supplied with liquid. Liquid for swelling an elastic abrasive is sprayed in an air flow for transporting the abrasive in a blasting machine 1 including an abrasive-recovery duct 91 communicating between a bottom of a cabinet 2 and an abrasive-recovery tank 3, the abrasive-recovery tank 3, a compressed gas before being introduced into a blasting gun 8, and so forth. Since the abrasive being transported in the air flow is separated into individual particles, each abrasive can be uniformly supplied with liquid.
摘要:
Provided is a moving mechanism for a blast gun which can easily move a blast gun accommodated in a blasting chamber and which can easily perform other operations from the outside thereof without leaking dust. A plurality of arm members (first input arm 21, second input arm 22, first output arm 31, and second output arm 32) are interlocked to form an input arm 20 and an output arm 30, each having one pair of arm members, one arm of the two arm members is pivotally attached to the other arm so as to be rotatable around an interlocked portion serving as a fulcrum, the input arm 20 is disposed outside the blasting chamber 3, and the output arm 30 is disposed inside the blasting chamber 3. In addition, the input arm 20 and the output arm 30 are interlocked to each other by an interlocking unit 40 which penetrates a top plate of a cabinet 4, and a power transmission mechanism is provided which rotates the second arm 22 synchronously with the rotation of the input arm 20, so that a blast gun 5 fitted to the output arm 30 can be moved by operating the input arm 20.
摘要:
A bottom wall surface of a blasting chamber of a blasting machine provided with hoppers for recovering an abrasive is formed at a lowest possible position. A cabinet 3 of a blasting machine 1 is compartmentalized at a predetermined position into an upper space and a lower space by mesh members (21, 22) that allow the abrasive to pass therethrough to form a blasting chamber 2 having a bottom wall surface 20 defined by the mesh members (21, 22). Hoppers 10 substantially shaped like an inverted quadrangular pyramid are disposed below the mesh members (21, 22) such that top portions of the hoppers 10 are opened toward the mesh members (21, 22) and that the bottom end of each of the hoppers 10 is made to communicate with suction means, such as a dust collector, through a recovery pipe 30.
摘要:
Flaky particles whose thickness is ½ or less of a long side of a flat surface thereof are continuously injected together with a compressed gas onto a layer-forming surface of a workpiece to orient the flaky particles so that its flat surface is in line with the surface of the workpiece. By coating a binder to the surface of the workpiece in advance, a bonding between the flake particle thus oriented and the workpiece may be accomplished via this binder, or by generating heat at a point of collision between the surface of the workpiece and the flaky particle and at a collision point in which the subsequent flaky particles collide with the flaky particles that have already reached the surface of the workpiece, the bonding may be accomplished by means of this heat.
摘要:
A portion to be coated of a workpiece is subjected to substrate treatment by blasting to provide an anchor effect without leaving abrasive grains thereon. A substrate treatment method for a portion to be coated includes ejecting an elastic abrasive onto a portion to be coated of a workpiece to form irregularities with a predetermined surface roughness, thereby providing an anchor effect for a coating to be formed without causing the abrasive grains to be embedded in the surface of the workpiece. The elastic abrasive includes elastic carriers and abrasive grains, particularly, insulating abrasive grains, compounded and dispersed in the base material as an elastic body or carried on surfaces of the base materials by, for example, adhesion.
摘要:
An abrasive, which makes it possible to polish a surface to be processed of a workpiece with a blast processing, and together therewith, can bear using for a long period of time or a plurality of times, and a method for blast processing with the abrasive are provided. The abrasive is composed of a base material as an elastic body and abrasive grains, wherein the abrasive grains of 10 to 90% by weight are compounded and dispersed into the base material of 90 to 10% by weight such that a content rate (compounding ratio) of the abrasive grains in the abrasive is 10 to 90% by weight when an amount of the abrasive is 100% by weight. The method for blast processing includes a step of injecting or projecting the abrasive at a predetermined angle of incidence with respect to the surface to be processed of the workpiece.
摘要:
Particularly, a thin-film solar cell panel or the like is processed without necessity of attaching and detaching of mask and washing steps with respect to a workpiece in a fine blasting employing a fine abrasive. A negative pressure space (20) and an opposing negative pressure space (40) having openings (22, 42) are opposed by being spaced at a movement allowable interval of the workpiece such as a thin-film solar cell panel or the like and so as to face one side edge in the same direction as a moving direction of the workpiece. Then, a fine abrasive is injected from a blast gun (30) in which an injection hole (31) is disposed within the negative pressure space (20), the workpiece is relatively moved in a moving direction (T) with respect to the injection hole, and while the fine abrasive is injected, compressed gas generating a gas flow having a diffusing direction substantially parallel to the relative moving direction of the workpiece to carry out air blow, thereby the fine abrasive and a cut scrap injected from a space within each of negative pressure space through the intermediary of a suction device communicated with the negative pressure space (20) and/or the opposing negative pressure space (40).
摘要:
An abrasive has a plate shape with a flat surface, in which a maximum diameter of the flat surface thereof is in the range of 0.05 mm to 10 mm, and 1.5 to 100 times as the maximum diameter as thick of the abrasive, and the blast processing method is one in which this abrasive is ejected by being inclined at an incident angle with respect to a surface of a product to be treated. The ejected plate-shaped abrasive slides along the surface of the product to be treated while having the flat surface in slidable contact with the surface of the product to be treated which is an object surface to be treated, so that the surface of the product to be treated is flattened by removing the peaks only, without increasing the depth of the valleys of the roughness curve.