摘要:
A photoelectric conversion device comprises a first semiconductor region of a first conductivity type; a second semiconductor region of a second conductivity type serving as a photoelectric conversion element together with a part of the first semiconductor region; a gate electrode transferring electric carriers generated in the photoelectric conversion element to a third semiconductor region of the second conductivity type. Moreover, the photoelectric conversion device comprises an isolation region for electrically isolating the second semiconductor region from a fourth semiconductor region of the second conductivity type adjacent to the second semiconductor region. Wiring for applying voltage to the gate electrode is arranged on the isolation region. Here, a fifth semiconductor region of the second conductivity type having an impurity concentration lower than that of the fourth semiconductor region is provided between the fourth semiconductor region and the isolation region.
摘要:
A photoelectric conversion device comprises a first semiconductor region of a first conductivity type; a second semiconductor region of a second conductivity type serving as a photoelectric conversion element together with a part of the first semiconductor region; a gate electrode transferring electric carriers generated in the photoelectric conversion element to a third semiconductor region of the second conductivity type. Moreover, the photoelectric conversion device comprises an isolation region for electrically isolating the second semiconductor region from a fourth semiconductor region of the second conductivity type adjacent to the second semiconductor region. Wiring for applying voltage to the gate electrode is arranged on the isolation region. Here, a fifth semiconductor region of the second conductivity type having an impurity concentration lower than that of the fourth semiconductor region is provided between the fourth semiconductor region and the isolation region.
摘要:
A photoelectric conversion device comprises a first semiconductor region of a first conductivity type; a second semiconductor region of a second conductivity type serving as a photoelectric conversion element together with a part of the first semiconductor region; a gate electrode transferring electric carriers generated in the photoelectric conversion element to a third semiconductor region of the second conductivity type. Moreover, the photoelectric conversion device comprises an isolation region for electrically isolating the second semiconductor region from a fourth semiconductor region of the second conductivity type adjacent to the second semiconductor region. Wiring for applying voltage to the gate electrode is arranged on the isolation region. Here, a fifth semiconductor region of the second conductivity type having an impurity concentration lower than that of the fourth semiconductor region is provided between the fourth semiconductor region and the isolation region.
摘要:
The present invention provides a thermal head with increased contact pressure between a heat generating portion and a printing medium to increase printing quality with a low heat loss. A thermal head includes: a plurality of heat generating resistors formed via an insulating layer; a driver circuit unit for driving the plurality of heat generating resistors to generate a heat; a wiring for connecting the driver circuit unit to the plurality of heat generating resistors; a protecting film formed to cover the plurality of heat generating resistors, the driver circuit unit and the wiring, wherein the plurality of heat generating resistors, the driver circuit unit, the wiring and the protecting film are formed on a substrate, and a thermal insulating layer having a thermal conductivity smaller than 0.5 W/m·K and having a maximum thickness of larger than 10 μm is provided between the heat generating resistor and the substrate.
摘要:
Disclosed herein is a method of producing a display device comprising a substrate and a plurality of conductive members provided on the substrate, said conductive members each having a substantially even surface and making up pixels, wherein the conductive members are smoothed by means of chemical mechanical polishing.
摘要:
A syndrome calculation unit 101 forming a first pipeline stage, a Euclidean algorithm arithmetic operation/error value calculation unit 102 and a Chien search unit 103 together forming a second pipeline stage, and an error correction unit 105 forming a third pipeline stage are provided. The unit 102 implements, by iterative use of a single inverse element calculator, a single Galois multiplier, and a single Galois adder, the Euclidean algorithm arithmetic operation of finding an error locator polynomial .sigma.(z) and an error evaluator polynomial .omega.(z) from a syndrome polynomial S(z) and the calculation of finding an error value e.sub.u by dividing an error evaluation value .omega.(.alpha..sup.-ju) by an error locator polynomial differential value .sigma.'(.alpha..sup.-ju).
摘要:
A device includes a plurality of photoelectric conversion regions, an interlayer insulating film arranged on the plurality of photoelectric conversion regions, a protective insulating film that is arranged in contact with the interlayer insulating film and has a refractive index different from that of the interlayer insulating film, recesses arranged in a light-receiving surface of each of the plurality of photoelectric conversion regions, and embedded regions embedded in the recesses. When a wavelength of incident light to each of the plurality of photoelectric conversion regions is denoted by λ and a refractive index of the embedded regions is denoted by n, a depth d of the recesses is represented by an expression d≧λ/4n.
摘要:
Between an analog circuit area 120 which includes circuits whose characteristics are degraded according to the level of noise contained in an input signal and a digital circuit area 130 which includes circuits that produce noise at such a level that the characteristics of the circuits in the analog circuit area 120 are caused to degrade, a digital circuit area 140 which only includes circuits that produce noise at such a level that the characteristics of the circuits in the analog circuit area 120 are not caused to degrade (or are caused to degrade within their acceptable limits) is located so as to prevent contact between the analog circuit area 120 and the digital circuit area 130.
摘要:
A matrix substrate comprises a pixel region formed by arranging a plurality of pixel electrodes to a matrix, drive circuit regions for feeding said pixel electrodes with electric signals and sealing regions. The gaps separating the pixel electrodes are filled with insulation members of an insulating material to provide a continuous surface connecting those of the pixel electrodes and members of the material of the pixel electrodes and those of the material of the insulation members are arranged at least either in the drive circuit regions or in the sealing regions to provide a continuous surface there.
摘要:
It purposes to provide a D/A conversion apparatus of a high accuracy oversampling method by noise shaping which is not needed a high frequency clock or accurate working, and a high accuracy A/D conversion apparatus having a configuration to which said D/A conversion technology is applied. It has configuration outputting the digital signal by dividing to plural 1-bit D/A converters, and by using said D/A converters so as to circulate, correlation of the signal and the output value of a specified 1-bit D/A converter is canceled, and noise or distortion due to a relative error of the 1-bit D/A converter is reduced.