Photosensitive composition, partition walls, color filter and organic EL device
    2.
    发明授权
    Photosensitive composition, partition walls, color filter and organic EL device 有权
    光敏组合物,隔墙,滤色片和有机EL器件

    公开(公告)号:US08168354B2

    公开(公告)日:2012-05-01

    申请号:US12971032

    申请日:2010-12-17

    IPC分类号: G03F7/038

    摘要: It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls.The photosensitive composition is a photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the formula: —CFXRf  (1) or a group represented by the formula: and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×104 and at most 7×104 and a weight average molecular weight of at least 5×104 and at most 25×104.

    摘要翻译: 本发明的目的是提供一种光敏组合物,其能够形成具有良好疏墨性的上表面的隔壁和具有良好的油墨亲和性的开放区域,在该区域内油墨容易扩散。 此外,本发明的目的是提供通过使感光组合物固化而形成的隔壁,以及具有隔壁的滤色器和有机EL器件。 感光性组合物是包含具有侧链的聚合物(A)的光敏性组合物,所述侧链含有由式-CFXRf(1)表示的基团或由下式表示的基团:含有烯属双键的侧链, 黑色着色剂(B),光聚合引发剂(C)和含有酸性基团和烯属双键的感光性树脂(D),其中,所述聚合物(A)的数均分子量为2×10 4以上, 至多7×10 4,重均分子量至少为5×10 4,最多为25×10 4。

    FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS
    3.
    发明申请
    FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS 审中-公开
    氟化聚合物,负离子敏感性树脂组合物和分散剂

    公开(公告)号:US20100273967A1

    公开(公告)日:2010-10-28

    申请号:US12828820

    申请日:2010-07-01

    IPC分类号: C08F220/22 C08F16/24

    摘要: To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition.A fluorinated polymer which is a copolymer made of at least two monomers each having an ethylenic double bond, and which has a side chain having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain an etheric oxygen atom between carbon atoms) and a side chain having at least two ethylenic double bonds per side chain.

    摘要翻译: 提供能够减少隔壁上的残留墨水量并形成膜厚均匀性高的油墨层的氟化聚合物和负性感光性组合物。 作为由至少两种各自具有烯属双键的单体构成的共聚物的氟化聚合物,具有碳原子数为2〜20的低级烷基的侧链,其中至少一个氢原子被氟原子取代(提供 该烷基可以在碳原子之间含有醚性氧原子)和每个侧链具有至少两个烯属双键的侧链。

    Negative photosensitive resin composition
    4.
    发明授权
    Negative photosensitive resin composition 有权
    负型感光性树脂组合物

    公开(公告)号:US07494764B2

    公开(公告)日:2009-02-24

    申请号:US11121203

    申请日:2005-05-04

    摘要: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.

    摘要翻译: 一种负型感光性树脂组合物,其含有具有酸性基团并且每分子具有至少三个烯属双键的碱溶性感光性树脂(A),由具有C20以下的聚合单元(b1)的聚合物构成的拒墨剂(B) 烷基中的至少一个氢原子被氟原子取代(条件是烷基可以含有醚性氧)和具有烯属双键的聚合单元(b2)和光聚合引发剂(C),其中 斥墨剂(B)中的氟含量为5〜25质量%,斥墨剂(B)的比例为0.01〜20质量%,相对于负型感光性树脂组合物的总固体成分。 本发明的负型感光性树脂组合物对基材的附着性优异,拒墨性和耐久性优异,碱溶性和显影性优异。

    PHOTOSENSITIVE COMPOSITION, PARTITION WALLS, COLOR FILTER AND ORGANIC EL DEVICE
    5.
    发明申请
    PHOTOSENSITIVE COMPOSITION, PARTITION WALLS, COLOR FILTER AND ORGANIC EL DEVICE 有权
    光敏组合物,分光镜,彩色滤光片和有机EL器件

    公开(公告)号:US20110143282A1

    公开(公告)日:2011-06-16

    申请号:US12971032

    申请日:2010-12-17

    IPC分类号: G03F7/004 G02B5/22 H01J1/62

    摘要: It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls.The photosensitive composition is a photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the formula: —CFXRf  (1) or a group represented by the formula: and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×104 and at most 7×104 and a weight average molecular weight of at least 5×104 and at most 25×104.

    摘要翻译: 本发明的目的是提供一种光敏组合物,其能够形成具有良好疏墨性的上表面的隔壁和具有良好的油墨亲和性的开放区域,在该区域内油墨容易扩散。 此外,本发明的目的是提供通过使感光组合物固化而形成的隔壁,以及具有隔壁的滤色器和有机EL器件。 感光性组合物是包含具有侧链的聚合物(A)的光敏性组合物,所述侧链含有由式-CFXRf(1)表示的基团或由下式表示的基团:和含有烯属双键的侧链, 黑色着色剂(B),光聚合引发剂(C)和含有酸性基团和烯属双键的感光性树脂(D),其中,所述聚合物(A)的数均分子量为2×10 4以上, 至多7×10 4,重均分子量至少为5×10 4,最多为25×10 4。

    Negative photosensitive resin composition
    7.
    发明授权
    Negative photosensitive resin composition 有权
    负型感光性树脂组合物

    公开(公告)号:US07267929B2

    公开(公告)日:2007-09-11

    申请号:US11515729

    申请日:2006-09-06

    摘要: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.

    摘要翻译: 一种负型感光性树脂组合物,其含有具有酸性基团且每分子具有至少3个烯属双键的碱溶性感光性树脂(A),由具有C 其中至少一个氢原子被氟原子取代(优选烷基可以含有醚性氧)和具有烯属双键的聚合单元(b2)的低级烷基,以及 光聚合引发剂(C),其中斥油墨剂(B)中的氟含量为5〜25质量%,斥墨剂(B)的比例为0.01〜20质量% 的负型感光性树脂组合物。 本发明的负型感光性树脂组合物对基材的附着性优异,拒墨性和耐久性优异,碱溶性和显影性优异。

    Photosensitive resin composition and coating film cured product thereof
    8.
    发明授权
    Photosensitive resin composition and coating film cured product thereof 失效
    感光性树脂组合物及其涂膜固化物

    公开(公告)号:US07232648B2

    公开(公告)日:2007-06-19

    申请号:US11219869

    申请日:2005-09-07

    IPC分类号: G03C1/73 G03F7/032 G03F7/028

    摘要: A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule. Further, a photosensitive resin composition comprising a resin (A2) having fluorine atom-containing groups and ethylenic double bonds, a resin (A3) having silicon atom-containing groups and ethylenic double bonds, a radical initiator (B), and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule.

    摘要翻译: 包含具有含氟原子的基团的树脂(A1),含硅原子的基团和烯属双键的感光性树脂组合物,具有至少三个烯键式双键的自由基引发剂(B)和碱溶性感光性树脂(D) 每分子。 此外,包含具有含氟原子的基团的树脂(A2)和烯属双键的感光性树脂组合物,具有含硅原子的基团和烯键式双键的树脂(A3),自由基引发剂(B) 每分子具有至少三个烯属双键的可溶性光敏树脂(D)。

    Negative photosensitive resin composition
    9.
    发明申请
    Negative photosensitive resin composition 有权
    负型感光性树脂组合物

    公开(公告)号:US20050191580A1

    公开(公告)日:2005-09-01

    申请号:US11121203

    申请日:2005-05-04

    摘要: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain etheric oxygen), and polymerized units (b2) having an ethylenic double bond, and a photopolymerization initiator (C), wherein the fluorine content in the ink repellent (B) is from 5 to 25 mass %, and the proportion of the ink repellent (B) is from 0.01 to 20 mass %, based on the total solid content of the negative photosensitive resin composition. The negative photosensitive resin composition of the present invention is excellent in adhesion to a substrate, ink repellency and durability thereof and further excellent in alkali solubility and developability.

    摘要翻译: 一种负型感光性树脂组合物,其含有具有酸性基团且每分子具有至少3个烯属双键的碱溶性感光性树脂(A),由具有C 其中至少一个氢原子被氟原子取代(优选烷基可以含有醚性氧)和具有烯属双键的聚合单元(b2)的低级烷基,以及 光聚合引发剂(C),其中斥油墨剂(B)中的氟含量为5〜25质量%,斥墨剂(B)的比例为0.01〜20质量% 的负型感光性树脂组合物。 本发明的负型感光性树脂组合物对基材的附着性优异,拒墨性和耐久性优异,碱溶性和显影性优异。

    Photosensitive composition, partition walls and black matrix
    10.
    发明授权
    Photosensitive composition, partition walls and black matrix 失效
    光敏组合物,隔墙和黑色矩阵

    公开(公告)号:US08153340B2

    公开(公告)日:2012-04-10

    申请号:US12627099

    申请日:2009-11-30

    IPC分类号: G03F7/004 G02B5/20

    摘要: To provide a photosensitive composition with which it is possible to form partition walls (black matrix) having excellent light shielding properties and liquid repellency.A photosensitive composition, which comprises a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is an O-acyloxime compound, and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %.

    摘要翻译: 为了提供可以形成具有优异的遮光性和拒水性的分隔壁(黑矩阵)的光敏组合物。 一种光敏组合物,其包含在一分子中具有含有含氟原子基团或含硅原子的基团的侧链和含有烯属双键的侧链的聚合物(A),黑色着色剂(B), 作为O-酰氧基肟化合物的光聚合引发剂(C)和在一个分子中含有酸性基团和烯属双键的感光性树脂(D),其中黑色着色剂(B)的总固体成分的比例 组成为15〜60质量%。