公开(公告)号：US5739899A

公开(公告)日：1998-04-14

申请号：US649815

申请日：1996-05-17

申请人： Kenji Nishi ,  Seiro Murakami ,  Hiroshi Chiba

发明人： Kenji Nishi ,  Seiro Murakami ,  Hiroshi Chiba

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC分类号： G03F9/7019 ,  A61K38/395 ,  G03F7/70066 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70691 ,  G03F9/7011 ,  G03F9/7026 ,  G03F9/7034

摘要： A projection exposure apparatus wherein a pattern formed on a mask is projected onto a substrate through a projection optical system. The apparatus has an illumination optical system for illuminating the mask by exposure light, and a first adjusting member which is disposed in the illumination optical system to change telecentricity on the substrate. The apparatus further has a second adjusting member for adjusting at least one of the position of the substrate in the direction of an optical axis of the projection optical system and the tilt of the substrate, and a control system for controlling the first and second adjusting members. The control system locally corrects the position of a spatial image formed by the projection optical system.

摘要翻译： 投影曝光装置，其中通过投影光学系统将形成在掩模上的图案投影到基板上。 该装置具有用于通过曝光来照射掩模的照明光学系统，以及设置在照明光学系统中以改变基板上的远心度的第一调节构件。 该装置还具有第二调节构件，用于调整基板在投影光学系统的光轴方向上的位置和基板的倾斜中的至少一个以及用于控制第一和第二调节构件的控制系统 。 控制系统局部校正由投影光学系统形成的空间图像的位置。

公开(公告)号：US5448332A

公开(公告)日：1995-09-05

申请号：US345325

申请日：1994-11-21

申请人： Yasuyuki Sakakibara ,  Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

发明人： Yasuyuki Sakakibara ,  Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  G03B27/42 ,  H01J1/20

CPC分类号： G03F7/70358 ,  G03F9/7026

摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.

公开(公告)号：US06608681B2

公开(公告)日：2003-08-19

申请号：US10186687

申请日：2002-07-02

申请人： Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

发明人： Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

IPC分类号： G01B1100

CPC分类号： G03F7/70358 ,  G03F9/7026

摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.

公开(公告)号：US5693439A

公开(公告)日：1997-12-02

申请号：US482555

申请日：1995-06-07

申请人： Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

发明人： Yasuaki Tanaka ,  Seiro Murakami ,  Kenji Nishi

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  G03F7/22

CPC分类号： G03F7/70358 ,  G03F9/7026

摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.

摘要翻译： 用于通过步进重复方案将形成在掩模上的图案曝光在感光基板上的多个分隔区域中的图案的装置包括投影光学系统，用于将掩模的图案投影在感光基板上， 用于保持感光基板并在与投影光学系统的光轴垂直的平面内二维移动感光基板的检测单元，用于将具有预定形状的图案图像投影到感光基板上并将光反射的光电检测 通过所述感光基板沿着所述投影光学系统的光轴检测所述感光性基板上的多个点的位置，以及测量单元，其用于当分割区域中的多个测量点中的每一个 掩模的图案下一个曝光与图案图像重合或接近图案图像 在基板载台的步进操作期间，将投影光学系统的成像面与沿着光轴的下一个分割区域之间的偏移量切除，其中成像平面和下一个分割区域沿着光轴相对移动 在掩模的图案之前测量的偏移量暴露在下一个分割区域上。

公开(公告)号：US5464715A

公开(公告)日：1995-11-07

申请号：US217841

申请日：1994-03-25

申请人： Kenji Nishi ,  Seiro Murakami

发明人： Kenji Nishi ,  Seiro Murakami

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70358 ,  G03F7/70775 ,  G03F9/70

摘要： In a scanning-type projection exposure system, curvature of a movable mirror that is used to measure mask stage coordinate positions is determined while the mask stage is moved in the scanning direction, by measuring coordinate positions, perpendicular to the scan direction, of the mask stage and of a mask mark elongated in the scan direction. The results of the measurements are used for correcting or compensating positional deviation during scanning. Rotational deviation of a mask pattern area is determined and is corrected or compensated. Also, a mask is aligned with respect to a coordinate system of the mask stage as pre-processing for exposure, using a mask alignment mark having two crossing linear patterns and determining a coordinate position of the crossing point by moving the mask relative to an observation area.

公开(公告)号：USRE38113E1

公开(公告)日：2003-05-06

申请号：US09276465

申请日：1999-03-25

申请人： Kenji Nishi ,  Seiro Murakami

发明人： Kenji Nishi ,  Seiro Murakami

IPC分类号： G03F900

CPC分类号： G03F7/70358 ,  G03F7/70775 ,  G03F9/70

摘要： In a scanning-type projection exposure system, curvature of a movable mirror that is used to measure mask stage coordinate positions is determined while the mask stage is moved in the scanning direction, by measuring coordinate positions, perpendicular to the scan direction, of the mask stage and of a mask mark elongated in the scan direction. The results of the measurements are used for correcting or compensating positional deviation during scanning. Rotational deviation of a mask pattern area is determined and is corrected or compensated. Also, a mask is aligned with respect to a coordinate system of the mask stage as pre-processing for exposure, using a mask alignment mark having two crossing linear patterns and determining a coordinate position of the crossing point by moving the mask relative to an observation area.

摘要翻译： 在扫描型投影曝光系统中，通过测量掩模台在扫描方向上的坐标位置，垂直于扫描方向的坐标位置来确定用于测量掩模台坐标位置的可移动镜的曲率， 阶段和在扫描方向上延长的掩模标记。 测量结果用于校正或补偿扫描期间的位置偏差。 确定掩模图案区域的旋转偏差并进行校正或补偿。 此外，使用具有两个交叉线性图案的掩模对准标记，相对于掩模台的坐标系对准掩模作为曝光的预处理，并且通过相对于观察来移动掩模来确定交叉点的坐标位置 区。

公开(公告)号：US5883704A

公开(公告)日：1999-03-16

申请号：US689233

申请日：1996-08-06

申请人： Kenji Nishi ,  Kazuo Ushida ,  Seiro Murakami ,  Tohru Kiuchi ,  Yasuaki Tanaka

发明人： Kenji Nishi ,  Kazuo Ushida ,  Seiro Murakami ,  Tohru Kiuchi ,  Yasuaki Tanaka

IPC分类号： H01L21/027 ,  G03B27/26 ,  G03B27/54 ,  G03F7/20 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70891 ,  G03B27/26 ,  G03B27/54 ,  G03F7/70883

摘要： A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.

摘要翻译： 根据本发明的投影曝光装置的投影光学系统具有多个由玻璃材料制成的光学构件，其中至少一个具有不同于另一玻璃材料的折射率的温度特性。 此外，提供了一种用于控制至少一个光学构件的温度的温度控制装置。 控制投影光学系统的成像特性。 要控制的成像特性是非线性放大或曲率。 温度控制装置将要控制的温度设定为根据投影光学系统的成像特性确定的可变目标温度。 在要控制的光学部件的温度达到目标温度的预定容许范围之后，开始将掩模图案转印到感光基板上的曝光操作。

公开(公告)号：USRE38320E1

公开(公告)日：2003-11-18

申请号：US09809224

申请日：2001-03-16

申请人： Kenji Nishi ,  Kazuo Ushida ,  Seiro Murakami ,  Tohru Kiuchi ,  Yasuaki Tanaka

发明人： Kenji Nishi ,  Kazuo Ushida ,  Seiro Murakami ,  Tohru Kiuchi ,  Yasuaki Tanaka

IPC分类号： G03B2754

CPC分类号： G03F7/70891 ,  G03B27/26 ,  G03B27/54 ,  G03F7/70883

摘要： A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.

公开(公告)号：US06433872B1

公开(公告)日：2002-08-13

申请号：US09276441

申请日：1999-03-25

申请人： Kenji Nishi ,  Yasuaki Tanaka ,  Seiro Murakami

发明人： Kenji Nishi ,  Yasuaki Tanaka ,  Seiro Murakami

IPC分类号： G01B1100

CPC分类号： G03F7/70358 ,  G03F9/7026

摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.

公开(公告)号：US4655598A

公开(公告)日：1987-04-07

申请号：US799262

申请日：1985-11-18

申请人： Seiro Murakami ,  Toshio Matsuura ,  Yuji Imai ,  Kazuya Ohta

发明人： Seiro Murakami ,  Toshio Matsuura ,  Yuji Imai ,  Kazuya Ohta

IPC分类号： G01B11/00 ,  G03F9/00

CPC分类号： G03F9/7076 ,  G03F9/7049

摘要： Position detecting method and a apparatus detect a position of substrate formed with a diffraction grating mark and a linearly extending stepped edge mark spaced from the diffraction grating. In the method and apparatus, those marks are relatively scanned by light beam, and position of the substrate is detected based on light information generated by both the marks and the scanning position.

摘要翻译： 位置检测方法和装置检测由衍射光栅标记形成的基板的位置和与衍射光栅间隔开的线性延伸的阶梯状边缘标记。 在该方法和装置中，这些标记被光束相对扫描，并且基于由标记和扫描位置产生的光信息来检测基板的位置。