Apparatus and Methods for Growing Nanofibres and Nanotips
    1.
    发明申请
    Apparatus and Methods for Growing Nanofibres and Nanotips 审中-公开
    用于生长纳米纤维和纳米线的装置和方法

    公开(公告)号:US20090078561A1

    公开(公告)日:2009-03-26

    申请号:US12179699

    申请日:2008-07-25

    IPC分类号: C01B31/00 H05B1/00 B01J19/08

    摘要: This invention relates to heating apparatus and methods with particular applications for growing a nanofibre, and to nanotips fabricated by such methods and apparatus. Embodiments of the invention can be implemented to provide nanotips for electron gun sources and scanning probe microscopy. A nanotip fabrication apparatus includes a heater for heating an object in the presence of an electric field. The heater comprises: a substantially planar electrically conductive heating element configured to define at least one aperture; a support to mount the heated object such that it protrudes through said aperture; and at least one electrical connection to said heating element. In use, the heating element can be biased by said at least one electrical connection such that the electric field in the vicinity of the object is substantially perpendicular to the plane of the element.

    摘要翻译: 本发明涉及具有用于生长纳米纤维的特殊应用的加热装置和方法,以及通过这些方法和装置制造的纳米技术。 本发明的实施例可以实现为电子枪源和扫描探针显微镜提供纳米尖端。 纳米尖端制造装置包括用于在存在电场的情况下加热物体的加热器。 加热器包括:基本上平面的导电加热元件,其被配置为限定至少一个孔; 用于安装加热物体使得其穿过所述孔突出的支撑件; 以及与所述加热元件的至少一个电连接。 在使用中,加热元件可以被所述至少一个电连接偏压,使得物体附近的电场基本上垂直于元件的平面。

    ELECTRON BEAM CONTROL METHOD, ELECTRON BEAM GENERATING APPARATUS, APPARATUS USING THE SAME, AND EMITTER
    2.
    发明申请
    ELECTRON BEAM CONTROL METHOD, ELECTRON BEAM GENERATING APPARATUS, APPARATUS USING THE SAME, AND EMITTER 有权
    电子束控制方法,电子束生成装置,使用其的装置和发射器

    公开(公告)号:US20100127170A1

    公开(公告)日:2010-05-27

    申请号:US12306635

    申请日:2006-06-30

    摘要: Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 μm on the emission side of an electron beam. Since a radius of curvature is 1 μm or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 μm to not more than 0.6 μm. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.

    摘要翻译: 提供了一种在电子束的发射侧具有2.0μm的曲率半径的锥形端的肖特基发射体。 由于曲率半径为1μm以上,电子枪的焦距可以比曲率半径在0.5μm以上0.6μm以下的现有技术中更长。 发现焦距与曲率半径成正比。 由于角电流强度(每单位立体角的射束电流)与电子枪焦距的平方成比例,所以前者可以在发射极半径的可行增加范围内提高一个数量级。 较高的角电流强度意味着可从电子枪获得的较大的束电流,并且本发明使肖特基发射体能够用于需要相对较高的微安电流束流的应用,如微焦X射线管,电子探针微量分析仪, 和电子束光刻系统。

    Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter
    3.
    发明授权
    Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter 有权
    电子束控制方法,电子束发生装置,使用该装置的装置和发射极

    公开(公告)号:US09257257B2

    公开(公告)日:2016-02-09

    申请号:US12306635

    申请日:2006-06-30

    摘要: Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 μm on the emission side of an electron beam. Since a radius of curvature is 1 μm or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 μm to not more than 0.6 μm. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.

    摘要翻译: 提供了一种在电子束的发射侧具有2.0μm的曲率半径的锥形端的肖特基发射体。 由于曲率半径为1μm以上,电子枪的焦距可以比曲率半径在0.5μm以上0.6μm以下的现有技术中长。 发现焦距与曲率半径成正比。 由于角电流强度(每单位立体角的射束电流)与电子枪焦距的平方成比例,所以前者可以在发射极半径的可行增加范围内提高一个数量级。 较高的角电流强度意味着可从电子枪获得的较大的束电流,并且本发明使肖特基发射体能够用于需要相对较高的微安电流束流的应用,如微焦X射线管,电子探针微量分析仪, 和电子束光刻系统。