Semiconductor memory device having memory layer extending between insulation layer and semiconductor layer

    公开(公告)号:US11985834B2

    公开(公告)日:2024-05-14

    申请号:US17346478

    申请日:2021-06-14

    CPC classification number: H10B63/845 H10B53/20 H10B53/30 H10B63/34

    Abstract: A semiconductor memory device, includes: a stack including a wiring layer and an insulation layer alternately stacked in a first direction; a semiconductor layer including a first region overlapping with the insulation layer in a second direction, and a second region overlapping with the wiring layer in the second direction; an insulation region between the wiring layer and the second region; and a memory region on the opposite side of the second region from the wiring layer. The wiring layer is farther from the first region in the second direction than the insulation layer is. The second region has a part between the insulation layers in the first direction and protruding further toward the wiring layer than the first region in the second direction. The memory region has a face opposite to the second region and closer to the wiring layer in the second direction than the first region is.

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