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公开(公告)号：US07022530B2
公开(公告)日：2006-04-04
申请号：US10311292
申请日：2002-04-03
IPC分类号： H01G7/06
CPC分类号： H01L29/802 , H01L21/823807 , H01L21/84 , H01L27/092 , H01L27/10873 , H01L27/11502 , H01L27/11507 , H01L27/1203 , H01L27/1214 , H01L27/1222 , H01L28/55 , H01L29/1054 , H01L29/783 , H01L29/78687
摘要： A silicon oxide film 102, a Pt film 103x, a Ti film 104x and a PZT film 105x are deposited in this order over a Si substrate 101. The Si substrate 101 is placed in a chamber 106 so that the PZT film 105x is irradiated with an EHF wave 108. The irradiation with the EHF wave locally heats a dielectric film such as the PZT film. As a result, it is possible to improve, for example, the leakage property of the dielectric film without adversely affecting a device formed on the Si substrate 101.
摘要翻译： 依次沉积硅衬底101上的氧化硅膜102，Pt膜103x，Ti膜104x和PZT膜105x。 将Si衬底101放置在室106中，使得PZT膜105x被EHF波108照射。 用EHF波照射局部加热电介质膜，例如PZT膜。 结果，可以改善例如电介质膜的泄漏特性，而不会对形成在Si衬底101上的器件产生不利影响。
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2.发明授权公开(公告)号：US08444806B2
公开(公告)日：2013-05-21
申请号：US12836161
申请日：2010-07-14
申请人： Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
发明人： Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
IPC分类号： C23C16/00 , C23C15/00 , H01L21/306 , H05H1/24
CPC分类号： H01J37/321 , H05H1/46 , H05H2001/4667
摘要： The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
摘要翻译： 本发明的目的在于提供能够产生高密度等离子体的空间均匀分布的等离子体发生器。 该目的通过以下结构实现。 多个天线位于真空室的侧壁上，RF电源经由板状导体并联连接到三个或四个天线。 每个天线的导体长度比真空室内产生的感应电磁波的四分之一波长短。 以这种方式设置天线的导体的长度防止驻波的发生，从而保持等离子体在真空室内的均匀性。 此外，板状导体提高了散热效率，这也有助于抑制阻抗。
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3.发明授权Plasma generator, plasma control method, and method of producing substrate 有权等离子体发生器，等离子体控制方法和生产基板的方法公开(公告)号：US07785441B2
公开(公告)日：2010-08-31
申请号：US10539254
申请日：2003-12-12
申请人： Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
发明人： Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
CPC分类号： H01J37/321 , H05H1/46 , H05H2001/4667
摘要： The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas 16 are located on the sidewall of a vacuum chamber 11, and a RF power source is connected to three or four antennas 16 in parallel via a plate-shaped conductor 19. The length of the conductor of each antenna 16 is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor 19 improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
摘要翻译： 本发明的目的在于提供能够产生高密度等离子体的空间均匀分布的等离子体发生器。 该目的通过以下结构实现。 多个天线16位于真空室11的侧壁上，RF电源通过板状导体19并联连接到三个或四个天线16.每个天线16的导体的长度比 在真空室内产生的感应电磁波的四分之一波长。 以这种方式设置天线的导体的长度防止驻波的发生，从而保持等离子体在真空室内的均匀性。 此外，板状导体19提高散热效率，这也有助于抑制阻抗。
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4.发明申请PLASMA GENERATOR, PLASMA CONTROL METHOD AND METHOD OF PRODUCING SUBSTRATE 有权等离子体发生器，等离子体控制方法和生产基材的方法公开(公告)号：US20100304046A1
公开(公告)日：2010-12-02
申请号：US12836161
申请日：2010-07-14
申请人： Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
发明人： Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
IPC分类号： C23C16/52 , C23C16/00 , C23C16/505
CPC分类号： H01J37/321 , H05H1/46 , H05H2001/4667
摘要： The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
摘要翻译： 本发明的目的在于提供能够产生高密度等离子体的空间均匀分布的等离子体发生器。 该目的通过以下结构实现。 多个天线位于真空室的侧壁上，RF电源经由板状导体并联连接到三个或四个天线。 每个天线的导体长度比真空室内产生的感应电磁波的四分之一波长短。 以这种方式设置天线的导体的长度防止驻波的发生，从而保持等离子体在真空室内的均匀性。 此外，板状导体提高了散热效率，这也有助于抑制阻抗。
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5.发明授权Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them 失效具有高耐腐蚀性的Zn-Mg合金气相镀敷金属及其制造方法
公开(公告)号：US5135817A
公开(公告)日：1992-08-04
申请号：US601673
申请日：1990-10-23
申请人： Kazutoshi Shimogori , Hiroshi Satoh , Masao Toyama , Hidetoshi Nishimoto , Koki Ikeda , Junji Kawahuku , Shoji Miyake , Shingo Nomura , Hirohiko Sakai
发明人： Kazutoshi Shimogori , Hiroshi Satoh , Masao Toyama , Hidetoshi Nishimoto , Koki Ikeda , Junji Kawahuku , Shoji Miyake , Shingo Nomura , Hirohiko Sakai
CPC分类号： C23C22/83 , C23C14/16 , C23C14/246 , C23C14/562 , C23C22/24 , Y10T428/12535 , Y10T428/12771 , Y10T428/12785 , Y10T428/12792 , Y10T428/12799
摘要： Zn-Mg alloy is plated by vapor deposition on the surface of metals. Since Zn and Mg are vapor-deposited as a vapor mixture of an optional ratio on the surface of metals, plated layers of excellent corrosion resistance, peeling resistance of coating film, formability, etc. can be formed. There is disclosed a method of forming uniform vapor mixtures of Zn and Mg, and vapor-depositing them on the surface of metals as the method forming the vapor-deposited layers.
摘要翻译： 通过气相沉积将Zn-Mg合金镀在金属表面上。 由于在金属表面上作为任意比例的蒸汽混合物蒸镀Zn和Mg，因此可以形成耐腐蚀性优异，涂膜抗剥离性，成形性等的镀层。 公开了形成Zn和Mg的均匀蒸气混合物并将其气相沉积在金属表面上的方法作为形成气相沉积层的方法。
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公开(公告)号：US07179337B2
公开(公告)日：2007-02-20
申请号：US10687894
申请日：2003-10-17
申请人： Yasuyoshi Suzuki , Yurio Nomura , Yoshiaki Nishijima , Shoji Miyake , Yukio Makino , Teppei Satoh
发明人： Yasuyoshi Suzuki , Yurio Nomura , Yoshiaki Nishijima , Shoji Miyake , Yukio Makino , Teppei Satoh
IPC分类号： H01F1/03
CPC分类号： B22F3/105 , B22F1/0088 , B22F2999/00 , H01F41/0246 , B22F2202/11 , B22F2202/13
摘要： The invention provides a method for preparing a soft magnetic material which meets demands for low iron loss, high density, high strength and high productivity. The method comprises a surface oxidation step of forming oxide films on the surfaces of a soft magnetic powder, a step of preparing a molding compound of the soft magnetic powder by mixing a soft magnetic powder and a binder with a predetermined blending ratio, a press molding step of press-molding the molding compound of the soft magnetic powder into a predetermined shape, and a sintering step of sintering the press-molded soft magnetic powder to produce a soft magnetic material, wherein a millimeter wave sintering apparatus or a discharge plasma sintering apparatus is used as a heating means in the surface oxidation step or in the sintering step. Thereby, energy of millimeter waves or discharge plasma acts locally on oxidized surface portions having a large electric resistance of the soft magnetic powder, the surfaces of the soft magnetic powder are locally heated at a temperature near the melting point, and oxidation of the surfaces of the soft magnetic powder (formation of an oxide film) and sintering (diffusional joining between oxide films) are promoted.
摘要翻译： 本发明提供一种制备软磁性材料的方法，该方法满足低铁损，高密度，高强度和高生产率的要求。 该方法包括在软磁性粉末的表面上形成氧化膜的表面氧化步骤，通过以预定的混合比例混合软磁性粉末和粘合剂来制备软磁性粉末的模塑料的步骤，压制成型 将软磁性粉末的模塑料压制成预定形状的步骤，以及将压制成型的软磁性粉末烧结以制造软磁性材料的烧结步骤，其中，使用毫米波烧结装置或放电等离子体烧结装置 在表面氧化步骤或烧结步骤中用作加热装置。 因此，毫米波或放电等离子体的能量局部地在软磁性粉末的电阻较大的氧化表面部分上作用，软磁性粉末的表面在接近熔点的温度下被局部加热， 促进软磁性粉末（氧化膜的形成）和烧结（氧化膜之间的扩散接合）。
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7.发明授权Image processing apparatus and method which performs patterning of color data to generate a pattern image 失效执行彩色数据图案化以生成图案图像的图像处理装置和方法
公开(公告)号：US5612793A
公开(公告)日：1997-03-18
申请号：US609864
申请日：1996-03-04
申请人： Akio Ito , Hiroyuki Ichikawa , Yoshinori Abe , Shoji Miyake
发明人： Akio Ito , Hiroyuki Ichikawa , Yoshinori Abe , Shoji Miyake
CPC分类号： H04N1/644
摘要： An image processing apparatus includes an image processing unit, a counter, and a determining unit. The image processing unit processes image data between first and second color values of an input image. The counter counts generation frequencies of the respective color values of the input image. The determining unit determines the first and second color values on the basis of the count result obtained by the counter.
摘要翻译： 图像处理装置包括图像处理单元，计数器和确定单元。 图像处理单元处理输入图像的第一和第二颜色值之间的图像数据。 计数器计数输入图像的各颜色值的生成频率。 确定单元基于由计数器获得的计数结果来确定第一和第二颜色值。
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公开(公告)号：US20090026195A1
公开(公告)日：2009-01-29
申请号：US11886549
申请日：2006-03-06
申请人： Shoji Miyake , Tasaburo Saji , Toshiyuki Ueno
发明人： Shoji Miyake , Tasaburo Saji , Toshiyuki Ueno
IPC分类号： H05B6/64
摘要： This utility model relates to the improvement of the high-frequency heating device providing high-frequency electricity with the box used for the heating-up. The high-frequency electricity was generated by high-frequency oscillator in the high-frequency heating device based on the high-frequency induction heating method.
摘要翻译： 本实用新型涉及用于加热的箱体提供高频电的高频加热装置的改进。 基于高频感应加热方式的高频加热装置中的高频振荡器产生高频电力。
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公开(公告)号：US5551679A
公开(公告)日：1996-09-03
申请号：US903289
申请日：1992-06-24
申请人： Takehiro Yoshida , Shoji Miyake
发明人： Takehiro Yoshida , Shoji Miyake
CPC分类号： H04N1/00639 , B42B5/00 , H04N1/00567 , H04N1/00676 , H04N1/32384 , H04N2201/3288
摘要： A recording apparatus having a recording unit for recording images of documents on a lengthwise recording sheet or a plurality of cut recording sheets, a cutter for cutting the lengthwise recording sheet by a length corresponding to one page or the overall length of each document, and a binding device for binding with a binding member a plurality of cut recording sheets on which a group of images of each document are recorded. The group of images is recorded on one recording sheet or image data is stored in a memory, if no staple is left. The stapling position can be changed according to the selected size and orientation of recording sheets and the orientation of recorded images.
摘要翻译： 一种记录装置，具有用于在纵向记录纸或多个切割记录纸上记录文件的图像的记录单元，用于将纵向记录纸切割一个与每个文档的一页或整个长度相对应的长度的切割器，以及 用于与装订构件结合的多个剪切记录纸，其上记录有每个文档的一组图像。 如果没有订书钉，则将一组图像记录在一张记录纸上，或将图像数据存储在存储器中。 可以根据记录纸张的选定尺寸和方向以及记录图像的方向来更改装订位置。
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10.发明授权Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them 失效具有高耐腐蚀性的Zn-Mg合金气相镀敷金属及其制造方法
公开(公告)号：US5002837A
公开(公告)日：1991-03-26
申请号：US293419
申请日：1989-01-04
申请人： Kazutoshi Shimogori , Hiroshi Satoh , Masao Toyama , Hidetoshi Shimoto , Koki Ikeda , Junji Kawahuku , Shoji Miyake , Shingo Nomura , Hirohiko Sakai
发明人： Kazutoshi Shimogori , Hiroshi Satoh , Masao Toyama , Hidetoshi Shimoto , Koki Ikeda , Junji Kawahuku , Shoji Miyake , Shingo Nomura , Hirohiko Sakai
CPC分类号： C23C14/246 , C23C14/16 , C23C14/562 , Y10T428/12535 , Y10T428/12771 , Y10T428/12785 , Y10T428/12792 , Y10T428/12799
摘要： Zn-Mg alloy is plated by vapor deposition on the surface of metals. Since Zn and Mg are vapor-deposited as a vapor mixture of an optional ratio on the surface of metals, plated layers of excellent corrosion resistance, peeling resistance of coating film, formability, etc. can be formed. There is disclosed a method of forming uniform vapor mixtures of Zn and Mg, and vapor-depositing them on the surface of metals as the method forming the vapor-deposited layers.
摘要翻译： 通过气相沉积将Zn-Mg合金镀在金属表面上。 由于在金属表面上作为任意比例的蒸汽混合物蒸镀Zn和Mg，因此可以形成耐腐蚀性优异，涂膜抗剥离性，成形性等的镀层。 公开了形成Zn和Mg的均匀蒸气混合物并将其气相沉积在金属表面上的方法作为形成气相沉积层的方法。
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