-
公开(公告)号：US20130342820A1
公开(公告)日：2013-12-26
申请号：US14001863
申请日：2012-02-02
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G03F7/70275 , G03F7/70358
摘要： A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time.
摘要翻译： 曝光装置设置有微透镜阵列，其上以规定的规则排列多个微透镜，在该微透镜上引入透过光源和掩模的曝光光，以解析基板上的直立等倍放大图像。 在达到规定位置时，用来自光源的脉冲激光对衬底进行照射，然后依次露出衬底，并且在衬底的曝光区域的整个区域暴露之后，微透镜阵列与微透镜阵列之间的相对位置关系 该掩模在垂直方向依次切换微透镜的水平间距的量，然后进行随后的曝光。 从而能够以短的曝光周期时间进行高精度，高分辨率的曝光。
-
公开(公告)号：US09086514B2
公开(公告)日：2015-07-21
申请号：US13877653
申请日：2011-09-12
CPC分类号： G02B3/0037 , G02B3/0062 , G02B26/0875 , G03F7/70258 , G03F7/70275
摘要： A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure.
摘要翻译： 扫描曝光装置使用多个微透镜阵列将掩模曝光图案投影到基板上。 CCD行摄像机此时检测衬底上的图像，并且使用衬底上的第一层图案作为参考图案，检测掩模曝光图案是否与参考图案匹配。 在图案不匹配的情况下，微透镜阵列从平行于衬底的方向倾斜，并且通过使用微透镜阵列使掩模曝光图案与参考图案相匹配，以调整曝光区域 基质。 当曝光图案偏离参考图案时，由此可以检测曝光期间的偏差并防止曝光图案重合，从而提高曝光图案在重叠曝光中的精度。
-
公开(公告)号：US20130188161A1
公开(公告)日：2013-07-25
申请号：US13877653
申请日：2011-09-12
IPC分类号： G02B3/00
CPC分类号： G02B3/0037 , G02B3/0062 , G02B26/0875 , G03F7/70258 , G03F7/70275
摘要： A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure.
摘要翻译： 扫描曝光装置使用多个微透镜阵列将掩模曝光图案投影到基板上。 CCD行摄像机此时检测衬底上的图像，并且使用衬底上的第一层图案作为参考图案，检测掩模曝光图案是否与参考图案匹配。 在图案不匹配的情况下，微透镜阵列从平行于衬底的方向倾斜，并且通过使用微透镜阵列使掩模曝光图案与参考图案相匹配，以调整曝光区域 基质。 当曝光图案偏离参考图案时，由此可以检测曝光期间的偏差并防止曝光图案重合，从而提高曝光图案在重叠曝光中的精度。
-
公开(公告)号：US09383652B2
公开(公告)日：2016-07-05
申请号：US14001863
申请日：2012-02-02
CPC分类号： G03F7/70191 , G02B3/0056 , G03F7/70275 , G03F7/70358
摘要： A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time.
摘要翻译： 曝光装置设置有微透镜阵列，其上以规定的规则排列多个微透镜，在该微透镜上引入透过光源和掩模的曝光光，以解析基板上的直立等倍放大图像。 在达到规定位置时，用来自光源的脉冲激光对衬底进行照射，然后依次露出衬底，并且在衬底的曝光区域的整个区域暴露之后，微透镜阵列与微透镜阵列之间的相对位置关系 该掩模在垂直方向依次切换微透镜的水平间距的量，然后进行随后的曝光。 从而能够以短的曝光周期时间进行高精度，高分辨率的曝光。
-
公开(公告)号：US09134537B2
公开(公告)日：2015-09-15
申请号：US14009807
申请日：2012-04-03
CPC分类号： G02B27/0955 , G02B27/48 , G02F1/0311 , G02F1/0322 , G02F1/19 , G02F2202/20
摘要： In a laser lighting device, a fly's eye lens and a condenser lens are disposed in an optical path of pulsed laser light emitted from a light source, and an electro-optical crystal element for continuously changing the deflection direction of the pulsed laser light with respect to the incident light and allowing the deflected light to pass therethrough is disposed in a position between the light source and the fly's eye lens or between the fly's eye lens and the condenser lens. The electro-optical crystal element is formed, for example, of a pair of electrodes and an optical crystal material disposed between the electrodes, and a voltage is applied between the electrodes to produce an electric field that changes the refractive index of the electro-optical crystal element. As a result, non-uniform illumination due to interference fringes produced by light having passed through the fly's eye lens can be reduced.
摘要翻译： 在激光照明装置中，将飞眼镜片和聚光透镜配置在从光源发射的脉冲激光的光路中，以及电光晶体元件，用于连续地改变脉冲激光的偏转方向， 并且允许偏转的光通过的位置设置在光源和蝇眼透镜之间或蝇眼透镜和聚光透镜之间的位置。 电光晶体元件例如由一对电极和设置在电极之间的光学晶体材料形成，并且在电极之间施加电压，以产生改变电光学折射率的电场 水晶元素。 结果，可以减少由于穿过蝇眼透镜的光产生的干涉条纹引起的不均匀照明。
-
公开(公告)号：US20140063808A1
公开(公告)日：2014-03-06
申请号：US14009807
申请日：2012-04-03
IPC分类号： G02B27/09
CPC分类号： G02B27/0955 , G02B27/48 , G02F1/0311 , G02F1/0322 , G02F1/19 , G02F2202/20
摘要： In a laser lighting device, a fly's eye lens and a condenser lens are disposed in an optical path of pulsed laser light emitted from a light source, and an electro-optical crystal element for continuously changing the deflection direction of the pulsed laser light with respect to the incident light and allowing the deflected light to pass therethrough is disposed in a position between the light source and the fly's eye lens or between the fly's eye lens and the condenser lens. The electro-optical crystal element is formed, for example, of a pair of electrodes and an optical crystal material disposed between the electrodes, and a voltage is applied between the electrodes to produce an electric field that changes the refractive index of the electro-optical crystal element. As a result, non-uniform illumination due to interference fringes produced by light having passed through the fly's eye lens can be reduced.
摘要翻译： 在激光照明装置中，将飞眼镜片和聚光透镜配置在从光源发射的脉冲激光的光路中，以及电光晶体元件，用于连续地改变脉冲激光的偏转方向， 并且允许偏转的光通过的位置设置在光源和蝇眼透镜之间或蝇眼透镜和聚光透镜之间的位置。 电光晶体元件例如由一对电极和设置在电极之间的光学晶体材料形成，并且在电极之间施加电压，以产生改变电光学折射率的电场 水晶元素。 结果，可以减少由于穿过蝇眼透镜的光产生的干涉条纹引起的不均匀照明。
-
公开(公告)号：US20140152968A1
公开(公告)日：2014-06-05
申请号：US14232733
申请日：2012-07-23
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B3/00 , G02B3/0056 , G02B3/0062 , G02B3/0075 , G02B7/00 , G02B27/0961 , G03F7/70275
摘要： In this microlens array, unitary microlens arrays are respectively stacked onto an upper surface and lower surface of a glass plate, and each of the unitary microlens arrays is supported by an upper plate and a lower plate. Marks for alignment are formed on each of the unitary microlens arrays and on the glass plate, and the unitary microlens arrays and the glass plate are stacked onto each other aligned by these marks. This makes it possible to prevent ununiform exposure in scanning exposure using a plurality of microlens arrays.
摘要翻译： 在这种微透镜阵列中，单位微透镜阵列分别堆叠在玻璃板的上表面和下表面上，并且每个单一微透镜阵列由上板和下板支撑。 用于对准的标记形成在每个单一微透镜阵列和玻璃板上，并且整体微透镜阵列和玻璃板彼此堆叠，由这些标记对准。 这使得可以防止使用多个微透镜阵列的扫描曝光中的不均匀曝光。
-
公开(公告)号：US09152057B2
公开(公告)日：2015-10-06
申请号：US13880352
申请日：2011-09-12
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70275
摘要： A microlens array is a stacked body of four unit microlens arrays, and the optical axis of a portion of the unit microlens arrays can be shifted from the optical axis of the other unit microlens arrays. In a scanning exposure apparatus, a CCD line camera detects an image on a substrate, and using a first-layer pattern on the substrate as a reference pattern, in a case in which a mask exposure pattern does not match the reference pattern, shifts the optical axis of the microlenses to adjust the magnification of a projection pattern using the microlens array. This makes it possible to adjust the exposure position using the microlens array so that even when the exposure pattern deviates from the reference pattern, the deviation can be detected during exposure and an exposure pattern misregistration can be prevented, enabling the precision of the exposure pattern to be enhanced in an overlay exposure.
摘要翻译： 微透镜阵列是四个单位微透镜阵列的堆叠体，并且单位微透镜阵列的一部分的光轴可以从另一单元微透镜阵列的光轴移位。 在扫描曝光装置中，CCD线照相机检测基板上的图像，并且在基板上使用第一层图案作为基准图案，在掩模曝光图案与参考图案不一致的情况下， 微透镜的光轴以使用微透镜阵列来调整投影图案的放大率。 这使得可以使用微透镜阵列调节曝光位置，使得即使当曝光图案偏离参考图案时，可以在曝光期间检测偏差，并且可以防止曝光图案重合失调，使曝光图案的精度 在叠加曝光中进行增强。
-
公开(公告)号：US20130208255A1
公开(公告)日：2013-08-15
申请号：US13880352
申请日：2011-09-12
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70275
摘要： A microlens array is a stacked body of four unit microlens arrays, and the optical axis of a portion of the unit microlens arrays can be shifted from the optical axis of the other unit microlens arrays. In a scanning exposure apparatus, a CCD line camera detects an image on a substrate, and using a first-layer pattern on the substrate as a reference pattern, in a case in which a mask exposure pattern does not match the reference pattern, shifts the optical axis of the microlenses to adjust the magnification of a projection pattern using the microlens array. This makes it possible to adjust the exposure position using the microlens array so that even when the exposure pattern deviates from the reference pattern, the deviation can be detected during exposure and an exposure pattern misregistration can be prevented, enabling the precision of the exposure pattern to be enhanced in an overlay exposure.
摘要翻译： 微透镜阵列是四个单位微透镜阵列的堆叠体，并且单位微透镜阵列的一部分的光轴可以从另一单元微透镜阵列的光轴移位。 在扫描曝光装置中，CCD线照相机检测基板上的图像，并且在基板上使用第一层图案作为基准图案，在掩模曝光图案与参考图案不一致的情况下， 微透镜的光轴以使用微透镜阵列来调整投影图案的放大率。 这使得可以使用微透镜阵列调节曝光位置，使得即使当曝光图案偏离参考图案时，可以在曝光期间检测偏差，并且可以防止曝光图案重合失调，从而能够使曝光图案的精度 在叠加曝光中进行增强。
-
公开(公告)号：US20120236283A1
公开(公告)日：2012-09-20
申请号：US13483751
申请日：2012-05-30
IPC分类号： G03B27/54
CPC分类号： G03F7/70275
摘要： Exposure apparatus includes photomasks on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of a TFT substrate held on a stage is formed, lens assemblies in which unit lens groups in each of which a plurality of convex lenses are arranged in a normal direction to the photomasks so that same-size erect images of mask patterns formed on the photomasks can be formed on the surface of the TFT substrate are arranged in a plane parallel with the photomasks and the surface of the TFT substrate held on the stage, and moving device that moves the lens assemblies in a plane parallel with the masks and the surface of TFT substrate held on the stage.
摘要翻译： 曝光装置包括光掩模，其上形成有与暴露在保持在台架上的TFT基板的表面上的曝光图案相同形状的掩模图案，其中单个透镜组中的多个凸透镜 被布置在光掩模的法线方向上，使得形成在光掩模上的掩模图案的相同尺寸的直立图像可以形成在TFT基板的表面上，平面与光掩模平行，并且TFT基板的表面保持 以及在与掩模平行的平面和保持在平台上的TFT基板的表面移动透镜组件的移动装置。
-
-
-
-
-
-
-
-
-
搜索结果
24 条记录 (耗时 0.018 秒)