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公开(公告)号：US20120236283A1
公开(公告)日：2012-09-20
申请号：US13483751
申请日：2012-05-30
IPC分类号： G03B27/54
CPC分类号： G03F7/70275
摘要： Exposure apparatus includes photomasks on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of a TFT substrate held on a stage is formed, lens assemblies in which unit lens groups in each of which a plurality of convex lenses are arranged in a normal direction to the photomasks so that same-size erect images of mask patterns formed on the photomasks can be formed on the surface of the TFT substrate are arranged in a plane parallel with the photomasks and the surface of the TFT substrate held on the stage, and moving device that moves the lens assemblies in a plane parallel with the masks and the surface of TFT substrate held on the stage.
摘要翻译： 曝光装置包括光掩模，其上形成有与暴露在保持在台架上的TFT基板的表面上的曝光图案相同形状的掩模图案，其中单个透镜组中的多个凸透镜 被布置在光掩模的法线方向上，使得形成在光掩模上的掩模图案的相同尺寸的直立图像可以形成在TFT基板的表面上，平面与光掩模平行，并且TFT基板的表面保持 以及在与掩模平行的平面和保持在平台上的TFT基板的表面移动透镜组件的移动装置。
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公开(公告)号：US09122171B2
公开(公告)日：2015-09-01
申请号：US13483751
申请日：2012-05-30
CPC分类号： G03F7/70275
摘要： Exposure apparatus includes photomasks on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of a TFT substrate held on a stage is formed, lens assemblies in which unit lens groups in each of which a plurality of convex lenses are arranged in a normal direction to the photomasks so that same-size erect images of mask patterns formed on the photomasks can be formed on the surface of the TFT substrate are arranged in a plane parallel with the photomasks and the surface of the TFT substrate held on the stage, and moving device that moves the lens assemblies in a plane parallel with the masks and the surface of TFT substrate held on the stage.
摘要翻译： 曝光装置包括光掩模，其上形成有与暴露在保持在台架上的TFT基板的表面上的曝光图案相同形状的掩模图案，其中单个透镜组中的多个凸透镜 被布置在光掩模的法线方向上，使得形成在光掩模上的掩模图案的相同尺寸的直立图像可以形成在TFT基板的表面上，平面与光掩模平行，并且TFT基板的表面保持 以及在与掩模平行的平面和保持在平台上的TFT基板的表面移动透镜组件的移动装置。
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公开(公告)号：US20110244379A1
公开(公告)日：2011-10-06
申请号：US13160967
申请日：2011-06-15
CPC分类号： G02F1/133516 , G02F1/13394 , G02F2001/13396 , G03F7/203 , G03F7/70283
摘要： The present invention is a photomask 3 for exposing a substrate coated with a positive photosensitive material. At least a first mask pattern group 16 and a second mask pattern group 17 are formed on a transparent substrate at a predetermined arrangement pitch. The first mask pattern group 16 has first light shielding patterns 20 arranged at an interval corresponding to two types of convex pattern forming portions of different heights on the substrate, in which the first light shielding patterns 20 each have a substantially same area as a cross sectional area of a convex pattern. The second mask pattern group 17 has a second light shielding pattern 22 and an opening pattern 23, in which the second light shielding pattern 22 has a predetermined area and corresponds to a higher convex pattern forming portion among the two types of convex pattern forming portions, and the opening pattern corresponds to a lower convex pattern forming portion. This enables top parts of a plurality of types of convex patterns of different heights to be shaped substantially hemispherical.
摘要翻译： 本发明是一种光掩模3，用于暴露涂有正性感光材料的基材。 至少第一掩模图案组16和第二掩模图案组17以预定排列间距形成在透明基板上。 第一掩模图案组16具有以对应于基板上不同高度的两种类型的凸起图案形成部分的间隔布置的第一遮光图案20，其中第一遮光图案20各自具有与截面大致相同的面积 凸形图案的区域。 第二掩模图案组17具有第二遮光图案22和开口图案23，其中第二遮光图案22具有预定区域并且对应于两种类型的凸起图案形成部分中的较高凸起图案形成部分， 并且开口图案对应于下凸起图案形成部分。 这使得不同高度的多种类型的凸形图案的顶部部分能够基本上成半球形。
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公开(公告)号：US08488097B2
公开(公告)日：2013-07-16
申请号：US12899652
申请日：2010-10-07
IPC分类号： G02F1/1337
CPC分类号： G02F1/133788
摘要： One aspect of the invention provides a liquid crystal display device producing method for irradiating a liquid crystal display substrate, in which plural pixels are formed in a matrix state and liquid crystal is sealed between a TFT substrate and a counter electrode substrate, with light having a predetermined wavelength to orient liquid crystal molecules toward a predetermined direction in a state in which an electric field is applied to each pixel of the liquid crystal display substrate. The method includes the steps of: dipping the liquid crystal display substrate and a lamp in a transparent liquid having resistivity of a predetermined value or more and sufficiently high transmittance to the light in a state in which the liquid crystal display substrate and the lamp face each other; and lighting the lamp to irradiate the liquid crystal display substrate with the light having a predetermined light quantity in a state in which the electric field is applied to each pixel.
摘要翻译： 本发明的一个方面提供了一种用于照射液晶显示基板的液晶显示装置的制造方法，其中以矩阵状形成多个像素并将液晶密封在TFT基板和对电极基板之间， 在向液晶显示基板的每个像素施加电场的状态下将液晶分子朝向预定方向取向的预定波长。 该方法包括以下步骤：在液晶显示基板和灯各自面对的状态下，将液晶显示基板和灯浸入到具有预定值或更大的电阻率和足够高透射率的透明液体中 其他; 并且在对每个像素施加电场的状态下点亮灯以照射具有预定光量的光的液晶显示基板。
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公开(公告)号：US08293434B2
公开(公告)日：2012-10-23
申请号：US13160967
申请日：2011-06-15
CPC分类号： G02F1/133516 , G02F1/13394 , G02F2001/13396 , G03F7/203 , G03F7/70283
摘要： The present invention is a photomask 3 for exposing a substrate coated with a positive photosensitive material. At least a first mask pattern group 16 and a second mask pattern group 17 are formed on a transparent substrate at a predetermined arrangement pitch. The first mask pattern group 16 has first light shielding patterns 20 arranged at an interval corresponding to two types of convex pattern forming portions of different heights on the substrate, in which the first light shielding patterns 20 each have a substantially same area as a cross sectional area of a convex pattern. The second mask pattern group 17 has a second light shielding pattern 22 and an opening pattern 23, in which the second light shielding pattern 22 has a predetermined area and corresponds to a higher convex pattern forming portion among the two types of convex pattern forming portions, and the opening pattern corresponds to a lower convex pattern forming portion. This enables top parts of a plurality of types of convex patterns of different heights to be shaped substantially hemispherical.
摘要翻译： 本发明是一种光掩模3，用于暴露涂有正性感光材料的基材。 至少第一掩模图案组16和第二掩模图案组17以预定排列间距形成在透明基板上。 第一掩模图案组16具有以对应于基板上不同高度的两种类型的凸起图案形成部分的间隔布置的第一遮光图案20，其中第一遮光图案20各自具有与截面大致相同的面积 凸形图案的区域。 第二掩模图案组17具有第二遮光图案22和开口图案23，其中第二遮光图案22具有预定区域并且对应于两种类型的凸起图案形成部分中的较高凸起图案形成部分， 并且开口图案对应于下凸起图案形成部分。 这使得不同高度的多种类型的凸形图案的顶部部分能够基本上成半球形。
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公开(公告)号：US20130342820A1
公开(公告)日：2013-12-26
申请号：US14001863
申请日：2012-02-02
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G03F7/70275 , G03F7/70358
摘要： A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time.
摘要翻译： 曝光装置设置有微透镜阵列，其上以规定的规则排列多个微透镜，在该微透镜上引入透过光源和掩模的曝光光，以解析基板上的直立等倍放大图像。 在达到规定位置时，用来自光源的脉冲激光对衬底进行照射，然后依次露出衬底，并且在衬底的曝光区域的整个区域暴露之后，微透镜阵列与微透镜阵列之间的相对位置关系 该掩模在垂直方向依次切换微透镜的水平间距的量，然后进行随后的曝光。 从而能够以短的曝光周期时间进行高精度，高分辨率的曝光。
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公开(公告)号：US20110085126A1
公开(公告)日：2011-04-14
申请号：US12899652
申请日：2010-10-07
IPC分类号： G02F1/1337
CPC分类号： G02F1/133788
摘要： One aspect of the invention provides a liquid crystal display device producing method for irradiating a liquid crystal display substrate, in which plural pixels are formed in a matrix state and liquid crystal is sealed between a TFT substrate and a counter electrode substrate, with light having a predetermined wavelength to orient liquid crystal molecules toward a predetermined direction in a state in which an electric field is applied to each pixel of the liquid crystal display substrate. The method includes the steps of: dipping the liquid crystal display substrate and a lamp in a transparent liquid having resistivity of a predetermined value or more and sufficiently high transmittance to the light in a state in which the liquid crystal display substrate and the lamp face each other; and lighting the lamp to irradiate the liquid crystal display substrate with the light having a predetermined light quantity in a state in which the electric field is applied to each pixel.
摘要翻译： 本发明的一个方面提供了一种用于照射液晶显示基板的液晶显示装置的制造方法，其中以矩阵状形成多个像素并将液晶密封在TFT基板和对电极基板之间， 在向液晶显示基板的每个像素施加电场的状态下将液晶分子朝向预定方向取向的预定波长。 该方法包括以下步骤：在液晶显示基板和灯各自面对的状态下，将液晶显示基板和灯浸入具有预定值或更大的电阻率和足够高透射率的透明液体中 其他; 并且在对每个像素施加电场的状态下点亮灯以照射具有预定光量的光的液晶显示基板。
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公开(公告)号：US09086514B2
公开(公告)日：2015-07-21
申请号：US13877653
申请日：2011-09-12
CPC分类号： G02B3/0037 , G02B3/0062 , G02B26/0875 , G03F7/70258 , G03F7/70275
摘要： A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure.
摘要翻译： 扫描曝光装置使用多个微透镜阵列将掩模曝光图案投影到基板上。 CCD行摄像机此时检测衬底上的图像，并且使用衬底上的第一层图案作为参考图案，检测掩模曝光图案是否与参考图案匹配。 在图案不匹配的情况下，微透镜阵列从平行于衬底的方向倾斜，并且通过使用微透镜阵列使掩模曝光图案与参考图案相匹配，以调整曝光区域 基质。 当曝光图案偏离参考图案时，由此可以检测曝光期间的偏差并防止曝光图案重合，从而提高曝光图案在重叠曝光中的精度。
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公开(公告)号：US20140152968A1
公开(公告)日：2014-06-05
申请号：US14232733
申请日：2012-07-23
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B3/00 , G02B3/0056 , G02B3/0062 , G02B3/0075 , G02B7/00 , G02B27/0961 , G03F7/70275
摘要： In this microlens array, unitary microlens arrays are respectively stacked onto an upper surface and lower surface of a glass plate, and each of the unitary microlens arrays is supported by an upper plate and a lower plate. Marks for alignment are formed on each of the unitary microlens arrays and on the glass plate, and the unitary microlens arrays and the glass plate are stacked onto each other aligned by these marks. This makes it possible to prevent ununiform exposure in scanning exposure using a plurality of microlens arrays.
摘要翻译： 在这种微透镜阵列中，单位微透镜阵列分别堆叠在玻璃板的上表面和下表面上，并且每个单一微透镜阵列由上板和下板支撑。 用于对准的标记形成在每个单一微透镜阵列和玻璃板上，并且整体微透镜阵列和玻璃板彼此堆叠，由这些标记对准。 这使得可以防止使用多个微透镜阵列的扫描曝光中的不均匀曝光。
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公开(公告)号：US20130188161A1
公开(公告)日：2013-07-25
申请号：US13877653
申请日：2011-09-12
IPC分类号： G02B3/00
CPC分类号： G02B3/0037 , G02B3/0062 , G02B26/0875 , G03F7/70258 , G03F7/70275
摘要： A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure.
摘要翻译： 扫描曝光装置使用多个微透镜阵列将掩模曝光图案投影到基板上。 CCD行摄像机此时检测衬底上的图像，并且使用衬底上的第一层图案作为参考图案，检测掩模曝光图案是否与参考图案匹配。 在图案不匹配的情况下，微透镜阵列从平行于衬底的方向倾斜，并且通过使用微透镜阵列使掩模曝光图案与参考图案相匹配，以调整曝光区域 基质。 当曝光图案偏离参考图案时，由此可以检测曝光期间的偏差并防止曝光图案重合，从而提高曝光图案在重叠曝光中的精度。
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