SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    1.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20110117493A1

    公开(公告)日:2011-05-19

    申请号:US12946243

    申请日:2010-11-15

    IPC分类号: G03F7/004 C07D307/93 G03F7/20

    摘要: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

    摘要翻译: 由式(X)表示的盐:其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基,L1表示C1-C17二价饱和烃基,其中一个或多个-CH 2 - 可以被 -O-或-CO-,环W1表示C4-C36内酯环,R3表示C1-C6烷基等,t表示0〜2的整数,Z +表示有机抗衡离子,W10表示 由式(X-1)表示:其中L2表示单键等,环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,R1表示C1-C12烃基,R2表示C1-C6烷基等,s表示0〜2的整数,或式( X-2):其中L3表示C1-C17二价饱和烃基,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,环W3重复 呈现C3-C36饱和烃环,R4为羟基等,R5为C1-C6烷基等,v为1〜3的整数,w为0〜2的整数。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    2.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20100304294A1

    公开(公告)日:2010-12-02

    申请号:US12786799

    申请日:2010-05-25

    摘要: A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译: 由式(I-AA)表示的盐:其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基,X1表示单键等,Y1表示C1-C36脂族烃基等, A1和A2各自独立地表示C1-C20脂族烃基等,Ar1表示可具有一个或多个取代基的(m4 + 1)价C6-C20芳族烃基,B1表示单键等,m1和 m2独立地表示0至2的整数,m3表示1至3的整数,条件是m1加上m2加m3等于3,m4表示1至3的整数,并且包含表示的盐的光致抗蚀剂组合物 通过式(I-AA)和包含具有酸不稳定基团的结构单元的树脂,并且在碱性水溶液中不溶或难溶,但通过酸作用而溶于碱水溶液中。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    5.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20100304292A1

    公开(公告)日:2010-12-02

    申请号:US12786726

    申请日:2010-05-25

    摘要: A salt represented by the formula (I-BB): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OXa groups and which is not capable of being eliminated by the action of an acid etc., and Xa represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3.

    摘要翻译: 由式(I-BB)表示的盐:其中Q1和Q2各自独立地表示氟原子等,X1表示单键等,Y1表示C1-C36脂族烃基等,A1和A2各自独立地表示 表示C1-C20脂肪族烃基等,Ar1表示可以具有一个以上取代基的(m4 + 1)价的C6〜C20芳香族烃基,B1表示单键等,B2表示C4-C36脂环族 具有一个或多个-OXa基并且不能通过酸等的作用而被除去的烃基,Xa表示氢原子或能够通过酸的作用而被除去的基团,m1和m2 独立地表示0〜2的整数,m3表示1〜3的整数,条件是m1 + m2 + m3等于3,m4表示1〜3的整数。

    METHOD FOR PRODUCING RESIST PATTERN
    6.
    发明申请
    METHOD FOR PRODUCING RESIST PATTERN 审中-公开
    生产电阻图案的方法

    公开(公告)号:US20100230136A1

    公开(公告)日:2010-09-16

    申请号:US12720419

    申请日:2010-03-09

    摘要: The present invention provides a method for producing a resist pattern sufficiently miniaturized having an excellent shape including: repeating a process of forming a patterned resist film comprising the following step (1):(1) forming a resist film, and exposing the formed resist film, and the like to form a patterned resist film by n cycles to obtain a resist pattern, wherein the resist film exposed in the step (1) in at least one cycle of the n cycles of the process of forming the patterned resist film is a film formed by layering a resist composition containing a resin (B) that becomes soluble in an alkali aqueous solution by an action of an acid and has a weight-average molecular weight of 7,000 to 10,000 and a glass transition temperature of 150 to 200° C., a photoacid generator (A) and a crosslinking agent (C).

    摘要翻译: 本发明提供一种制造具有优异形状的抗蚀剂图案的方法,其特征在于包括:重复形成图案化抗蚀剂膜的方法,该方法包括以下步骤(1):(1)形成抗蚀剂膜,并使形成的抗蚀剂膜曝光 以形成图案化的抗蚀剂膜,以形成抗蚀剂图案,其中在形成图案化抗蚀剂膜的工艺的n个循环中的至少一个循环中,在步骤(1)中暴露的抗蚀剂膜为 通过使含有树脂(B)的抗蚀剂组合物层叠形成,所述抗蚀剂组合物通过酸的作用变成可溶于碱性水溶液的树脂(B),其重均分子量为7000〜10,000,玻璃化转变温度为150〜200℃ 光电产生剂(A)和交联剂(C)。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    7.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20110117495A1

    公开(公告)日:2011-05-19

    申请号:US12947349

    申请日:2010-11-16

    摘要: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

    摘要翻译: 由式(X)表示的盐:其中Q1和Q2各自独立地表示氟原子等,L1和L2各自独立地表示C1-C17二价饱和烃基,环W1表示C3-C36饱和烃环,R2 每次出现羟基等,s表示0〜2的整数,Z +表示有机抗衡离子,W10表示由式(X-1)表示的基团:其中,环W2表示C4-C36 饱和烃环,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替,R3是 在每次出现时独立地为C1-C6烷基等,t表示0〜2的整数,或式(X-2)表示的基团:其中,环W3表示C3-C36饱和烃环,R4表示 在每次出现时都独立地是羟基等,R5各自独立地出现 含有C 1 -C 6烷基等,v表示1〜3的整数,w表示0〜2的整数。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    8.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20110117494A1

    公开(公告)日:2011-05-19

    申请号:US12946886

    申请日:2010-11-16

    摘要: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C3-C36 saturated hydrocarbon ring, R5 is independently in each occurrence a C1-C6 alkyl group or a C1-C6 alkoxy group, w represents an integer of 0 to 2, v represents 1 or 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C3-C36 saturated hydrocarbon ring, R1 represents a C1-C12 hydrocarbon group, R2 is independently in each occurrence a C1-C6 alkyl group or a C1-C6 alkoxy group, and represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C4-C36 lactone ring, R3 is independently in each occurrence a C1-C6 alkyl group, a C1-C6 alkoxy group or a C2-C7 alkoxycarbonyl group and t represents an integer of 0 to 2.

    摘要翻译: 由式(X)表示的盐:其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基,L1和L2各自表示C1-C17二价饱和烃基,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,环W1表示C3-C36饱和烃环,R5各自独立地为C1-C6烷基或C1-C6烷氧基,w表示0〜 2,v表示1或2,Z +表示有机抗衡离子,W10表示由式(X-1)表示的基团:其中,环W2表示C3-C36饱和烃环,R1表示C1-C12烃基 R2各自独立地为C1-C6烷基或C1-C6烷氧基,代表0-2的整数,或由式(X-2)表示的基团:其中,环W3表示C4- C36内酯环,R3各自独立地为C1-C6烷基,C1-C6烷氧基或C2-C7 烷氧基羰基,t表示0〜2的整数。

    SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
    9.
    发明申请
    SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20120052440A1

    公开(公告)日:2012-03-01

    申请号:US13216776

    申请日:2011-08-24

    摘要: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.

    摘要翻译: 本发明提供由式(I)表示的盐:其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基,L1和L2各自表示C1-C17二价饱和烃基,其中一个或 更多的-CH 2 - 可被-O-或-CO-取代,环W1和环W2各自独立地表示C 3 -C 36脂族环,R 2在每次出现时独立地为C1-C6烷基,R4各自独立地为 C1-C6烷基,R3表示C1-C12烃基,t表示0〜2的整数,u表示0〜2的整数,Z +表示有机抗衡离子。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    10.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20100304293A1

    公开(公告)日:2010-12-02

    申请号:US12786738

    申请日:2010-05-25

    IPC分类号: G03F7/004 C07C309/02 G03F7/20

    摘要: A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X2—Y1 group has one or more fluorine atoms, and Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译: 由式(a)表示的盐:其中Q1和Q2各自独立地表示氟原子等,X1表示单键等,X2表示单键等,Y1表示C3-C6脂肪族烃基等。 条件是-X2-Y1基团具有一个或多个氟原子,Z +表示有机抗衡阳离子,以及包含由式(a)表示的盐的光致抗蚀剂组合物和包含具有酸性基团的结构单元的树脂, 不稳定的基团,并且在碱性水溶液中不溶或难溶,但是通过酸的作用变得可溶于碱性水溶液。