公开(公告)号：US20120028188A1

公开(公告)日：2012-02-02

申请号：US13190173

申请日：2011-07-25

申请人： Koji ICHIKAWA ,  Mitsuhiro HATA ,  Takahiro YASUE

发明人： Koji ICHIKAWA ,  Mitsuhiro HATA ,  Takahiro YASUE

IPC分类号： G03F7/20 ,  G03F7/027

CPC分类号： G03F7/0045 ,  G03F7/0397

摘要： The present invention provides a photoresist composition comprisinga resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein R1 and R2 are independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.

摘要翻译： 本发明提供一种光致抗蚀剂组合物，其包含树脂，其包含衍生自具有酸不稳定基团的化合物的结构单元，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过 酸，酸产生剂和由式（I）表示的化合物：其中R1和R2在每次出现时独立地为C1-C12烃基，C1-C6烷氧基，C2-C7酰基，C2-C7 酰氧基，C 2 -C 7烷氧基羰基，硝基或卤素原子，m和n分别表示0〜4的整数。

公开(公告)号：US20120219908A1

公开(公告)日：2012-08-30

申请号：US13404123

申请日：2012-02-24

申请人： Koji ICHIKAWA ,  Takahiro YASUE

发明人： Koji ICHIKAWA ,  Takahiro YASUE

IPC分类号： G03F7/20 ,  G03F7/027

CPC分类号： G03F7/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist composition of the present invention has (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator and (D) a compound represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom, R3 and R4 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m′ and n′ independently represent an integer of 0 to 4.

摘要翻译： 本发明的抗蚀剂组合物具有（A1）具有由式（I）表示的结构单元的树脂，（A2）树脂在碱性水溶液中不溶或难溶，但在碱性水溶液中溶解， 酸的作用，（B）酸产生剂和（D）由式（II）表示的化合物。 其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基，R3和R4各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2〜C7酰氧基， C2至C7烷氧基羰基，硝基或卤素原子; m'和n'独立地表示0〜4的整数。

公开(公告)号：US20120258404A1

公开(公告)日：2012-10-11

申请号：US13441185

申请日：2012-04-06

申请人： Koji ICHIKAWA ,  Takahiro YASUE ,  Satoshi YAMAGUCHI

发明人： Koji ICHIKAWA ,  Takahiro YASUE ,  Satoshi YAMAGUCHI

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

摘要： A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.

摘要翻译： 本发明的抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）由式（II）表示的酸发生剂 ）和（D）由式（I）表示的化合物，其中R1，R2，m，n，Q1，Q2，L1，环W1和Z +在说明书中定义。

公开(公告)号：US20120258401A1

公开(公告)日：2012-10-11

申请号：US13441032

申请日：2012-04-06

申请人： Koji ICHIKAWA ,  Takahiro YASUE ,  Yuichi MUKAI

发明人： Koji ICHIKAWA ,  Takahiro YASUE ,  Yuichi MUKAI

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/029 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/092 ,  G03F7/2041

摘要： A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1 and R2, m and n, R3 and R4, X1, R5 and Z1+ are defined in the specification.

摘要翻译： 抗蚀剂组合物含有（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液，（B）由式（II）表示的酸发生剂和（ D）由式（I）表示的化合物，其中R1和R2，m和n，R3和R4，X1，R5和Z1 +在说明书中定义。

公开(公告)号：US20120264059A1

公开(公告)日：2012-10-18

申请号：US13441205

申请日：2012-04-06

申请人： Koji ICHIKAWA ,  Takahiro YASUE ,  Tatsuro MASUYAMA

发明人： Koji ICHIKAWA ,  Takahiro YASUE ,  Tatsuro MASUYAMA

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041

摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

摘要翻译： 抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过 碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

公开(公告)号：US20120219907A1

公开(公告)日：2012-08-30

申请号：US13404064

申请日：2012-02-24

申请人： Koji ICHIKAWA ,  Takahiro YASUE ,  Akira KAMABUCHI

发明人： Koji ICHIKAWA ,  Takahiro YASUE ,  Akira KAMABUCHI

IPC分类号： G03F7/20 ,  G03F7/027

CPC分类号： G03F7/027 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041

摘要： A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), wherein R1, ring X1, R3, R4, m, and n are defined in the specification.

摘要翻译： 抗蚀剂组合物含有（A）具有由式（I）表示的结构单元，（B）酸产生剂和（D）由式（II）表示的化合物的树脂，其中R1，X1，R3，R4 ，m和n在说明书中定义。

公开(公告)号：US20130022924A1

公开(公告)日：2013-01-24

申请号：US13552281

申请日：2012-07-18

申请人： Koji ICHIKAWA ,  Takahiro YASUE

发明人： Koji ICHIKAWA ,  Takahiro YASUE

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, R3, R4, m′ and n′ are defined in the specification.

摘要翻译： 一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元 由式（I）表示的酸产生剂，其中R1，A1，A13，A14，X12，R3，R4，m'和n'在说明书中定义。

公开(公告)号：US20120258405A1

公开(公告)日：2012-10-11

申请号：US13441035

申请日：2012-04-06

申请人： Koji ICHIKAWA ,  Takahiro YASUE ,  Satoshi YAMAGUCHI

发明人： Koji ICHIKAWA ,  Takahiro YASUE ,  Satoshi YAMAGUCHI

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

摘要： A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

摘要翻译： 抗蚀剂组合物包括： （A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用变得可溶于碱性水溶液，（B）具有酸不稳定基团的酸发生剂; 和（D）式（I）表示的化合物，其中R 1和R 2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2〜C7酰氧基 C2-C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

公开(公告)号：US20120225385A1

公开(公告)日：2012-09-06

申请号：US13406634

申请日：2012-02-28

申请人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Takahiro YASUE

发明人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Takahiro YASUE

IPC分类号： G03F7/20 ,  C07D327/04 ,  C07D305/06 ,  C07D303/40 ,  G03F7/027 ,  C07C69/96

CPC分类号： C07C309/17 ,  C07C25/18 ,  C07C309/12 ,  C07C381/12 ,  C07C2603/74 ,  C07D303/16 ,  C07D305/06 ,  C07D307/33 ,  C07D307/77 ,  C07D327/04 ,  C07D333/46 ,  C07D497/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.

摘要翻译： 本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，L 2表示单键或C 1 -C 6烷二基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，Y代表C3-C18 可以具有一个或多个取代基的脂环族烃基，脂环族烃基中的一个或多个-CH 2 - 可以被-O - ， - CO-或-SO 2 - 代替，Z +代表有机抗衡离子。

公开(公告)号：US20110123926A1

公开(公告)日：2011-05-26

申请号：US12953606

申请日：2010-11-24

申请人： Koji ICHIKAWA ,  Takayuki MIYAGAWA ,  Mitsuhiro HATA

发明人： Koji ICHIKAWA ,  Takayuki MIYAGAWA ,  Mitsuhiro HATA

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and RC6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.

摘要翻译： 本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子， 可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和RC 6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或R c4和R c6键合 彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基 ，或Rc5和Rc7彼此键合形成烷二基。