公开(公告)号：US20150332893A1

公开(公告)日：2015-11-19

申请号：US14721772

申请日：2015-05-26

Applicant: Komatsu Ltd.

Inventor： Toshihiro Tabuchi ,  Kouichi Ishida ,  Hiroyuki Mizukami ,  Masayuki Takashiri

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/50

CPC classification number: H01J37/32009 ,  C23C16/24 ,  C23C16/452 ,  C23C16/458 ,  C23C16/50 ,  C23C16/505 ,  H01J37/32357 ,  H01J37/32532 ,  H01J37/32715

Abstract: The present invention provides a surface treatment apparatus which can treat a surface with high speed and high quality. A casing of a surface treatment apparatus is defined into two chambers, a plasma generation chamber provided with a plasma generation electrode and a substrate treatment chamber provided with a substrate support table. A plasma nozzle is formed on an anode electrode constituting a partition wall of the both chambers. A recess is formed on an upper cathode electrode. Further, the plasma nozzle is used as a hollow anode discharge generation area, and the recess as a hollow cathode discharge generation area.

Abstract translation: 本发明提供一种表面处理装置，能够以高速，高质量对表面进行处理。 表面处理装置的壳体被限定为两个室，设置有等离子体产生电极的等离子体产生室和设置有基板支撑台的基板处理室。 在构成两个室的分隔壁的阳极电极上形成等离子体喷嘴。 在上阴极电极上形成凹部。 此外，等离子体喷嘴用作中空阳极放电产生区域，并且凹部用作中空阴极放电产生区域。