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1.发明授权公开(公告)号：US11618840B2
公开(公告)日：2023-04-04
申请号：US16499571
申请日：2018-05-09
Applicant: PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERRATION FOUNDATION , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
Inventor： Young Sun Choe , Joona Bang , Jun Soo Moon
IPC: C09J163/00 , C08F220/18 , C08F236/20 , C08G64/04 , C08L19/00 , C08L63/00 , C08L75/04 , C09J11/08
Abstract: In an additive for an epoxy adhesive and an epoxy adhesive composition for construction including same, the additive for an epoxy adhesive is formed by atomic transfer radical polymerization (ATRP) of a polyacrylate of which one terminal is halogenated, as an arm-polymer, and a diacrylate-based compound or a dimethacrylate-based compound, as a cross-linker, and comprises a star polymer of a star-shape having a core/shell structure including a core formed by the polymerization of the cross-linker and a shell formed by a portion of the arm-polymer.
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Patent Agency Ranking
公开(公告)号：US11608470B2
公开(公告)日：2023-03-21
申请号：US17012510
申请日：2020-09-04
Inventor： Joona Bang , Jaewan Ko
Abstract: The present invention relates to thermally and chemically stable quantum dots encapsulated with functional polymeric ligands, a thermally stable quantum dot optical film using the encapsulated quantum dots, and a method for preparing the encapsulated quantum dots. The coating of the surface of the quantum dots with the polymer stabilizes the quantum dots and improves the durability and dispersibility of the quantum dot optical film, achieving markedly improved efficiency of photoluminescent quantum dot devices. Therefore, it is anticipated that the present invention will pave the way for practical use of quantum dots in a variety of light-emitting applications, particularly in high power light-emitting sources, to find commercial application in various fields, including displays, bioimaging, lightings, and photovoltaic cells.
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公开(公告)号：US09725550B2
公开(公告)日：2017-08-08
申请号：US14962183
申请日：2015-12-08
Applicant: Samsung Display Co., Ltd. , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION , Sogang University Research Foundation
Inventor： Min Hyuck Kang , Su Mi Lee , Myung Im Kim , Tae Woo Kim , Seung-Won Park , Xie Lei , Na Na Kang , Bong-Jin Moon , Joona Bang , Sang Hoon Woo , Jin Yeong Lee , Hyun Jung Jung , June Huh
IPC: C08F299/02 , C08F293/00 , C08G61/08 , C08F299/00
CPC classification number: C08F299/024 , C08F293/00 , C08G61/08 , C08G2261/1424 , C08G2261/1426 , C08G2261/3324 , C08G2261/418 , C08G2261/74
Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
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4.发明授权公开(公告)号：US09255170B2
公开(公告)日：2016-02-09
申请号：US14086182
申请日：2013-11-21
Applicant: Samsung Display Co., Ltd. , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION , Sogang University Research Foundation
Inventor： Min Hyuck Kang , Su Mi Lee , Myung Im Kim , Tae Woo Kim , Seung-Won Park , Xie Lei , Na Na Kang , Bong-Jin Moon , Joona Bang , Sang Hoon Woo , Jin Yeong Lee , Hyun Jung Jung , June Huh
IPC: C08F279/02 , C08F277/00 , C08F293/00 , C08G61/08 , C08F279/00 , C08G63/00 , C08F32/06
CPC classification number: C08F299/024 , C08F293/00 , C08G61/08 , C08G2261/1424 , C08G2261/1426 , C08G2261/3324 , C08G2261/418 , C08G2261/74
Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
Abstract translation: 提供嵌段共聚物。 根据示例性实施方案的嵌段共聚物包括由化学式1表示的第一嵌段和由化学式2表示的第二嵌段：其中COM1和COM2独立地选自聚苯乙烯部分，聚甲基丙烯酸甲酯部分，聚环氧乙烷部分，聚乙烯基吡啶部分，聚二甲基硅氧烷 部分，聚二茂铁基二甲基硅烷部分和聚异戊二烯部分，R1为氢或碳原子数为1〜10的烷基，Ph为苯基，a为1〜50，R2为氢或碳原子数1〜10的烷基， b为1〜50。
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5.发明授权Method of manufacturing nanostructure and method of forming pattern using the same 有权制造纳米结构的方法和使用其形成图案的方法公开(公告)号：US09074055B2
公开(公告)日：2015-07-07
申请号：US13870473
申请日：2013-04-25
Inventor： Eun-Ae Kwak , Min-Hyuck Kang , Su Mi Lee , Jun Han Lee , Moon Gyu Lee , Joona Bang , Hyun Jung Jung
CPC classification number: C08J7/04 , G03F7/0002 , G03F7/26
Abstract: An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.
Abstract translation: 提供了制造纳米结构的方法。 在基板上形成包含第一嵌段共聚物的第一薄膜。 在第一薄膜上形成引导图案。 在引导图案的各部分之间形成包括第二嵌段共聚物的第二薄膜。 第二薄膜固化。 第一嵌段共聚物是圆筒型，第二嵌段共聚物是薄片型。
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6.发明申请METHOD OF MANUFACTURING NANOSTRUCTURE AND METHOD OF FORMING PATTERN USING THE SAME 有权制造纳米结构的方法及其形成图案的方法公开(公告)号：US20140158664A1
公开(公告)日：2014-06-12
申请号：US13870473
申请日：2013-04-25
Inventor： Eun-Ae Kwak , Min-Hyuck Kang , Su Mi Lee , Jun Han Lee , Moon Gyu Lee , Joona Bang , Hyun Jung Jung
IPC: C08J7/04
CPC classification number: C08J7/04 , G03F7/0002 , G03F7/26
Abstract: An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.
Abstract translation: 提供了制造纳米结构的方法。 在基板上形成包含第一嵌段共聚物的第一薄膜。 在第一薄膜上形成引导图案。 在引导图案的各部分之间形成包括第二嵌段共聚物的第二薄膜。 第二薄膜固化。 第一嵌段共聚物是圆筒型，第二嵌段共聚物是薄片型。
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