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1.发明申请WARP CORRECTION DEVICE AND WARP CORRECTION METHOD FOR SEMICONDUCTOR ELEMENT SUBSTRATE 有权用于半导体元件基板的温度校正装置和温度校正方法公开(公告)号：US20140287538A1
公开(公告)日：2014-09-25
申请号：US14353895
申请日：2012-07-13
申请人： Kouichi Inoue , Kazuyoshi Maeda , Norihito Shibuya
发明人： Kouichi Inoue , Kazuyoshi Maeda , Norihito Shibuya
IPC分类号： H01L21/66 , H01J37/317 , H01L21/265
CPC分类号： H01L22/12 , H01J37/3171 , H01L21/26 , H01L21/265 , H01L21/67288 , H01L21/6838 , H01L22/20 , H01L22/26 , H01L33/0095 , H01L2924/0002 , H01L2924/00
摘要： A warp correction apparatus includes an injection mechanism including a nozzle that performs injection treatment, an adsorption table that holds the substrate by adsorption at a principal surface side or a film surface side, a moving mechanism that moves the adsorption table so that the substrate relatively moves with respect to an injection area of an injection particle by the nozzle, an injection treatment chamber that houses the substrate held on the adsorption table and in the interior of which injection treatment is performed, a measurement mechanism that measures a warp of the substrate, and a control device that, based on a difference between a target warp amount and a warp amount measured by the measurement mechanism, performs at least either one of a setting processing of an injection treatment condition of the injection mechanism and an accept/reject determination of the substrate for which injection treatment has been performed.
摘要翻译： 翘曲修正装置包括：注射机构，其包括执行注射处理的喷嘴;吸附台，其通过主表面侧或膜表面侧的吸附而保持基板;移动机构，其移动吸附台，使得基板相对移动 相对于喷嘴的注射粒子的注入面积，容纳保持在吸附台上的衬底和进行注射处理的内部的注射处理室，测量衬底的翘曲的测量机构，以及 控制装置，其基于目标翘曲量与通过测量机构测量的翘曲量之间的差异，执行喷射机构的喷射处理条件的设定处理以及喷射机构的喷射处理条件的设定处理 已经进行了注射处理的基底。
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2.发明授权Warp correction device and warp correction method for semiconductor element substrate 有权半导体元件基板的经线矫正装置及翘曲矫正方法公开(公告)号：US09136192B2
公开(公告)日：2015-09-15
申请号：US14353895
申请日：2012-07-13
申请人： Kouichi Inoue , Kazuyoshi Maeda , Norihito Shibuya
发明人： Kouichi Inoue , Kazuyoshi Maeda , Norihito Shibuya
IPC分类号： H01L23/58 , H01L29/10 , H01L21/66 , H01L21/67 , H01L21/683 , H01J37/317 , H01L21/265 , H01L33/00
CPC分类号： H01L22/12 , H01J37/3171 , H01L21/26 , H01L21/265 , H01L21/67288 , H01L21/6838 , H01L22/20 , H01L22/26 , H01L33/0095 , H01L2924/0002 , H01L2924/00
摘要： A warp correction apparatus includes an injection mechanism including a nozzle that performs injection treatment, an adsorption table that holds the substrate by adsorption at a principal surface side or a film surface side, a moving mechanism that moves the adsorption table so that the substrate relatively moves with respect to an injection area of an injection particle by the nozzle, an injection treatment chamber that houses the substrate held on the adsorption table and in the interior of which injection treatment is performed, a measurement mechanism that measures a warp of the substrate, and a control device that, based on a difference between a target warp amount and a warp amount measured by the measurement mechanism, performs at least either one of a setting processing of an injection treatment condition of the injection mechanism and an accept/reject determination of the substrate for which injection treatment has been performed.
摘要翻译： 翘曲修正装置包括：注射机构，其包括执行注射处理的喷嘴;吸附台，其通过主表面侧或膜表面侧的吸附而保持基板;移动机构，其移动吸附台，使得基板相对移动 相对于喷嘴的注射粒子的注入面积，容纳保持在吸附台上的衬底和进行注射处理的内部的注射处理室，测量衬底的翘曲的测量机构，以及 控制装置，其基于目标翘曲量与通过测量机构测量的翘曲量之间的差异，执行喷射机构的喷射处理条件的设定处理以及喷射机构的喷射处理条件的设定处理 已经进行了注射处理的基底。
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公开(公告)号：US09114503B2
公开(公告)日：2015-08-25
申请号：US12937128
申请日：2009-04-10
申请人： Mikitoshi Hiraga , Ryoichi Tsunoda , Kenichiro Inagaki , Kazuyoshi Maeda , Yukinori Suzuki , Norihito Shibuya
发明人： Mikitoshi Hiraga , Ryoichi Tsunoda , Kenichiro Inagaki , Kazuyoshi Maeda , Yukinori Suzuki , Norihito Shibuya
摘要： A nozzle, a nozzle unit having a plurality of nozzles, and a blasting machine equipped with the nozzle unit, which can achieve a micro-machining with a high precision and a high productivity for the blasting process. A portion for escape 13c is formed at the distal end of the ejecting portion 13 of the nozzle 11, so if the distance between the surface of the work and the nozzle 11 is shortened to suppress the broadening of the flow of the abrasives, the reflected abrasives do not remain within the space between the surface of the work and the distal end of the ejecting portion 13. Thus, a blasting process with a high precision can be achieved. Further, since two nozzles 11m and 11n can be arranged so as to correspond to the width of the surface of the work to be processed by a rotational device 16, it is possible to blast a wider area of the surface of the work while the nozzle unit 10 or the blasting machine 20 sweep one time. Thus, the high productivity of the blasting process can be achieved.
摘要翻译： 喷嘴，具有多个喷嘴的喷嘴单元和配备有喷嘴单元的喷砂机，其可以以高精度和高生产率实现喷砂处理的微加工。 在喷嘴11的喷射部分13的远端处形成有用于逃逸部分13c的部分，因此如果工件的表面与喷嘴11之间的距离缩短以抑制磨料的流动的扩大，则反射 研磨剂不会残留在工件的表面与喷射部13的前端之间的空间内。因此，可以实现高精度的喷砂处理。 此外，由于可以将两个喷嘴11m和11n布置成与旋转装置16的待加工的工件的表面的宽度相对应，所以可以在喷嘴的表面喷射更宽的区域 单元10或喷砂机20扫一次。 因此，可以实现爆破过程的高生产率。
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4.发明申请公开(公告)号：US20130143473A1
公开(公告)日：2013-06-06
申请号：US13514413
申请日：2011-06-06
摘要： The present invention provides an apparatus for removing the unnecessary thin-film layer on the periphery of the substrate of the plate-like member having a square shape, on the surface of which substrate is formed a thin-film layer. The apparatus comprises a chamber to treat the peripheral part where the peripheral part of the plate-like member is inserted and where the unnecessary thin-film layer on the peripheral part of the plate-like member is removed; and a means to move the plate-like member. The chamber to treat the peripheral part comprises a cover to prevent the scattering of the sprayed particles and the dust for treating the peripheral part, the cover having one of its end-sides that forms a ceiling being closed and having the other end-side that is opposed to the ceiling being open and a suctioning cover for treating the peripheral part, having an opening that has the same shape as the opening of the cover to prevent the scattering of the dust. In the chamber to treat the peripheral part, a blasting nozzle for spraying particles for treating the peripheral part is disposed on the cover to prevent the scattering of the dust, so that the mouth of the blasting nozzle is covered by the wall of the cover to prevent the scattering of the sprayed particles and the dust.
摘要翻译： 本发明提供了一种用于去除在具有正方形形状的板状构件的基板的周边上的不需要的薄膜层的装置，其表面上形成有薄膜层。 该装置包括用于处理插入板状构件的周边部分的周边部分的腔室，并且去除板状构件的周边部分上的不需要的薄膜层; 以及移动板状构件的装置。 用于处理周边部分的腔室包括防止喷射的颗粒和用于处理周边部分的灰尘的飞散的盖，所述盖具有形成天花板的其中一端封闭，并且另一端侧具有 与天花板开放相对，并且具有用于处理周边部分的抽吸盖，具有与盖的开口相同形状的开口，以防止灰尘的飞散。 在用于处理周边部分的室中，在盖上设置用于喷射颗粒以用于处理周边部分的喷射喷嘴以防止灰尘的飞散，使得喷射喷嘴的口被盖的壁覆盖 防止喷射的颗粒和灰尘的飞散。
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公开(公告)号：US20110028075A1
公开(公告)日：2011-02-03
申请号：US12937128
申请日：2009-04-10
申请人： Mikitoshi Hiraga , Ryoichi Tsunoda , Kenichiro Inagaki , Kazuyoshi Maeda , Yukinori Suzuki , Norihito Shibuya
发明人： Mikitoshi Hiraga , Ryoichi Tsunoda , Kenichiro Inagaki , Kazuyoshi Maeda , Yukinori Suzuki , Norihito Shibuya
摘要： A nozzle, a nozzle unit having a plurality of nozzles, and a blasting machine equipped with the nozzle unit, which can achieve a micro-machining with a high precision and a high productivity for the blasting process, are provided.Since the portion for escape 13c is formed at the distal end of the ejecting portion 13, if the distance between the surface of the work and the nozzle 11 is shortened to suppress the broadening of the flow of the abrasives, the reflected abrasives do not remain within the space between the surface of the work and the distal end of the ejecting portion 13. Thus, the blasting process with a high precision can be achieved. Further, since the nozzle 11m and the nozzle 11n can be arranged so as to correspond to the width of the surface of the work to be processed by the rotational device 16, it is possible to blast a wider area of the surface of the work while the nozzle unit 10 or the blasting machine 20 sweep one time. Thus, the high productivity of the blasting process can be achieved.
摘要翻译： 提供了具有多个喷嘴的喷嘴，具有多个喷嘴的喷嘴单元和配备有喷嘴单元的喷砂机，其能够以高精度和高生产率进行喷砂处理的微加工。 由于在排出部13的前端形成有用于排出部13c的部分，如果工件表面与喷嘴11之间的距离缩短以抑制磨料的流动扩大，则反射的磨料不会残留 在工件表面和喷射部分13的远端之间的空间内。因此，可以实现高精度的喷砂处理。 此外，由于喷嘴11m和喷嘴11n可以布置成与由旋转装置16处理的工件的表面的宽度相对应，所以可以在工件的表面的较大面积上喷涂，同时 喷嘴单元10或喷砂机20一次扫掠。 因此，可以实现爆破过程的高生产率。
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6.发明授权公开(公告)号：US09308624B2
公开(公告)日：2016-04-12
申请号：US13514413
申请日：2011-06-06
摘要： The present invention provides an apparatus for removing the unnecessary thin-film layer on the periphery of the substrate of the plate-like member having a square shape, on the surface of which substrate is formed a thin-film layer. The apparatus comprises a chamber to treat the peripheral part where the peripheral part of the plate-like member is inserted and where the unnecessary thin-film layer on the peripheral part of the plate-like member is removed; and a means to move the plate-like member. The chamber to treat the peripheral part comprises a cover to prevent the scattering of the sprayed particles and the dust for treating the peripheral part, the cover having one of its end-sides that forms a ceiling being closed and having the other end-side that is opposed to the ceiling being open and a suctioning cover for treating the peripheral part, having an opening that has the same shape as the opening of the cover to prevent the scattering of the dust. In the chamber to treat the peripheral part, a blasting nozzle for spraying particles for treating the peripheral part is disposed on the cover to prevent the scattering of the dust, so that the mouth of the blasting nozzle is covered by the wall of the cover to prevent the scattering of the sprayed particles and the dust.
摘要翻译： 本发明提供了一种用于去除在具有正方形形状的板状构件的基板的周边上的不需要的薄膜层的装置，其表面上形成有薄膜层。 该装置包括用于处理插入板状构件的周边部分的周边部分的腔室，并且去除板状构件的周边部分上的不需要的薄膜层; 以及移动板状构件的装置。 用于处理周边部分的腔室包括防止喷射的颗粒和用于处理周边部分的灰尘的飞散的盖，所述盖具有形成天花板的其中一端封闭，并且另一端侧具有 与天花板开放相对，并且具有用于处理周边部分的抽吸盖，具有与盖的开口相同形状的开口，以防止灰尘的飞散。 在用于处理周边部分的室中，在盖上设置用于喷射颗粒以用于处理周边部分的喷射喷嘴以防止灰尘的飞散，使得喷射喷嘴的口被盖的壁覆盖 防止喷射的颗粒和灰尘的飞散。
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公开(公告)号：US07880806B2
公开(公告)日：2011-02-01
申请号：US11400934
申请日：2006-04-10
申请人： Kazuyoshi Maeda
发明人： Kazuyoshi Maeda
CPC分类号： H04N5/225 , H04N5/2251
摘要： An imaging operation controller including a casing, a control panel attached to a back part of the casing and having a plurality of operating members and function indicators that indicate the functions of the operating members and placed near the operating members, respectively. The control panel includes a base plate attached to the casing, a mounting plate placed on the base plate and a printed indicator sheet placed on the mounting plate. The plurality of operating members are supported on the base plate, indicator lighting light sources are supported on the base plate at positions respectively corresponding to the function indicators so as to emit light backward. The indicator lighting light sources are white light-emitting diodes attached to the base plate so as to emit light backward.
摘要翻译： 一种成像操作控制器，包括壳体，附接到壳体的后部的控制面板，并且具有分别指示操作构件的功能并放置在操作构件附近的多个操作构件和功能指示器。 控制面板包括附接到壳体的基板，放置在基板上的安装板和放置在安装板上的印刷指示板。 多个操作构件支撑在基板上，指示灯点亮光源分别支撑在基板上，分别对应于功能指示器，以便向后发光。 指示灯照明光源是附接到基板的白色发光二极管，以向后发光。
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公开(公告)号：US20120275614A1
公开(公告)日：2012-11-01
申请号：US13450680
申请日：2012-04-19
IPC分类号： G10K11/16
CPC分类号： H04N5/2251 , H04R1/086 , H04R3/005 , H04R2410/07 , H04R2499/15
摘要： A noise cancellation unit includes: a duct connected to an outlet of an electronic apparatus and configured to pass an exhaust flow discharged from the outlet therethrough; a first microphone provided to the duct; a speaker provided to the duct downstream of the first microphone; a second microphone provided to the duct downstream of the speaker; a first windscreen wall configured to prevent the exhaust flow from colliding with the first microphone; a second windscreen wall configured to prevent the exhaust flow from colliding with the second microphone; and a signal processing circuit configured to generate, based on outputs of the first microphone and the second microphone, a sound signal for removing a noise included in the exhaust flow and supply the sound signal to the speaker.
摘要翻译： 噪声消除单元包括：连接到电子设备的出口并被配置为使从出口排出的废气流通过的管道; 提供给导管的第一麦克风; 设置在第一麦克风下游的导管的扬声器; 设置在扬声器下游的导管的第二麦克风; 被配置为防止排气流与第一麦克风碰撞的第一挡风玻璃壁; 配置成防止排气流与第二麦克风碰撞的第二挡风玻璃壁; 以及信号处理电路，被配置为基于所述第一麦克风和所述第二麦克风的输出产生用于去除所述排气流中包括的噪声的声音信号，并将所述声音信号提供给所述扬声器。
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公开(公告)号：US20110039481A1
公开(公告)日：2011-02-17
申请号：US12988995
申请日：2009-04-10
摘要： This invention provides a conveying apparatus and a blasting machine equipped with the conveying apparatus that can prevent workpieces from being damaged by the used abrasives attached to the conveying rollers.For the conveying apparatus, a peripheral part 33a disposed at the peripheral surface of a rolling member 33 of a rolling roller 31 is made of a softer elastic material than the material of the panel P, wherein when used abrasives get stuck between the peripheral part 33a of the rolling member 33 and the panel P, since the peripheral part 33a acts as a cushioning material that can reduce the force caused by the used abrasives and loaded on the panel P, even if the panel P is made of a fragile material, such as glass, the panel P can be conveyed without flaws being caused by the used abrasives.
摘要翻译： 本发明提供一种输送装置和配备有输送装置的喷砂机，其能够防止工件被附着在输送辊上的使用过的磨料损坏。 对于输送装置，设置在滚动辊31的滚动部件33的周面的周边部分33a由比面板P的材料更软的弹性材料制成，其中当使用磨料粘附在周边部分33a 由于周边部分33a用作可以减少由使用过的磨料引起的并加载在面板P上的力的缓冲材料，所以即使面板P由易碎材料制成， 作为玻璃，面板P可以被传送而没有由使用的磨料引起的缺陷。
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公开(公告)号：US08814634B2
公开(公告)日：2014-08-26
申请号：US12988995
申请日：2009-04-10
摘要： This invention provides a conveying apparatus and a blasting machine equipped with the conveying apparatus that can prevent workpieces from being damaged by the used abrasives attached to the conveying rollers.For the conveying apparatus, a peripheral part 33a disposed at the peripheral surface of a rolling member 33 of a rolling roller 31 is made of a softer elastic material than the material of the panel P, wherein when used abrasives get stuck between the peripheral part 33a of the rolling member 33 and the panel P, since the peripheral part 33a acts as a cushioning material that can reduce the force caused by the used abrasives and loaded on the panel P, even if the panel P is made of a fragile material, such as glass, the panel P can be conveyed without flaws being caused by the used abrasives.
摘要翻译： 本发明提供一种输送装置和配备有输送装置的喷砂机，其能够防止工件被附着在输送辊上的使用过的磨料损坏。 对于输送装置，设置在滚动辊31的滚动部件33的周面的周边部分33a由比面板P的材料更软的弹性材料制成，其中当使用磨料粘附在周边部分33a 由于周边部分33a用作可以减少由使用过的磨料引起的并加载在面板P上的力的缓冲材料，所以即使面板P由易碎材料制成， 作为玻璃，面板P可以被传送而没有由使用的磨料引起的缺陷。
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