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1.发明申请POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING A METAL-PLATING FORMED MATERIAL, TRANSCRIPTION FILM AND PRODUCTION METHOD OF A METAL-PLATING FORMED MATERIAL 审中-公开用于生产金属成型材料的正型类型的辐射敏感性树脂组合物，转印膜和金属镀层材料的生产方法公开(公告)号：US20090288855A1
公开(公告)日：2009-11-26
申请号：US12512211
申请日：2009-07-30
CPC分类号： G03F7/0392 , H01L24/11 , H01L2924/01019 , H01L2924/01078 , H01L2924/01079 , H01L2924/10253 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H01L2924/00
摘要： The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a radiation-sensitive acid generator; and (C) an organic solvent. The positive-type radiation-sensitive resin composition is excellent in sensitivity and resolution, exhibits excellent adhesion to a substrate, leaves no residue at an opening after development, and is capable of preventing occurrence of crack in the resin film after metal plating and push-in of plated metal into the resin film.
摘要翻译： 用于生产本发明的金属镀覆成形材料的正型辐射敏感性树脂组合物包含（A）含有具有酸解离官能团的结构单元的聚合物，其在酸存在下分解成 产生酸性官能团和交联结构; （B）辐射敏感酸产生剂; 和（C）有机溶剂。 正型辐射敏感性树脂组合物的灵敏度和分辨率优异，表现出对基材的优异粘附性，在显影后的开口处不留下残留物，并且能够防止在金属电镀和推压后的树脂膜中发生裂纹， 将电镀金属插入树脂膜中。
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2.发明申请公开(公告)号：US20100190109A1
公开(公告)日：2010-07-29
申请号：US12690913
申请日：2010-01-20
申请人： Kouji NISHIKAWA
发明人： Kouji NISHIKAWA
CPC分类号： G03F7/095 , G03F7/0045 , G03F7/0048 , G03F7/38
摘要： The acid transfer composition of the invention comprises a radiation-sensitive acid generator, a polymer having a nitrogen-containing group and a ketone-based solvent. The composition may comprise further a sensitizer. The pattern forming method of the invention comprises a second resin film formation process in which the acid transfer composition is used to form a second resin film (acid transfer film) on a first resin film containing an acid-dissociable group-containing resin, but not containing a radiation-sensitive acid generator, an exposure process for exposing the second resin film to a light through a mask to generate an acid in the second resin film, an acid transfer process for transferring the acid generated in the second resin film to the first resin film, and a second resin film removing process.
摘要翻译： 本发明的酸转移组合物包含辐射敏感的酸产生剂，具有含氮基团的聚合物和酮基溶剂。 组合物还可以包含敏化剂。 本发明的图案形成方法包括第二树脂膜形成方法，其中使用酸转移组合物在含有含酸解离基团的树脂的第一树脂膜上形成第二树脂膜（酸转移膜），但不 含有辐射敏感性酸产生剂的曝光方法，用于通过掩模将第二树脂膜暴露于光以在第二树脂膜中产生酸的曝光工艺，将在第二树脂膜中产生的酸转移到第一树脂膜的酸转移过程 树脂膜和第二树脂膜除去工序。
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3.发明申请COMPOUND SYNTHESIS METHOD, MICROARRAY, ACID-TRANSFER COMPOSITION, AND BIOCHIP COMPOSITION 有权化合物合成方法，微量滴定，酸转移组合物和生物化合物公开(公告)号：US20120196772A1
公开(公告)日：2012-08-02
申请号：US13329619
申请日：2011-12-19
申请人： Hyojin YUN , Changeun YOO , Myung-Sun KIM , Soo-Kyung KIM , Kouji NISHIKAWA , Hirofumi GOTO , Hidetoshi MIYAMOTO
发明人： Hyojin YUN , Changeun YOO , Myung-Sun KIM , Soo-Kyung KIM , Kouji NISHIKAWA , Hirofumi GOTO , Hidetoshi MIYAMOTO
CPC分类号： C08J7/14 , C09D133/08 , G03F7/0392 , C08F220/14 , C08F220/56 , C08F2220/302 , C08F220/54 , C08F2220/307
摘要： A compound synthesis method includes bonding a first compound to a substrate to form a first film. A second film is formed on the first film using an acid-transfer composition including (A) a polymer that includes a structural unit shown by a following formula (1) and a structural unit shown by a following formula (2), (B) a photoacid generator shown by a following formula (3), and (C) a sensitizer shown by a following formula (4). The second film is exposed to remove the protecting group from the first compound under an exposed are of the second film. An acid generated in the exposed area of the second film is transferred to the first film. The second film after being exposed is removed. A second compound is bonded to the first compound from which the protecting group has been removed.
摘要翻译： 复合合成方法包括将第一化合物键合到基底以形成第一膜。 使用酸转移组合物在第一膜上形成第二膜，所述酸转移组合物包含（A）包含由下式（1）表示的结构单元的聚合物和由下式（2），（B）表示的结构单元， 由下式（3）表示的光致酸发生剂和（C）下述式（4）所示的增感剂。 第二个膜暴露在暴露的第二个膜下，从第一个化合物中除去保护基团。 在第二膜的暴露区域产生的酸被转移到第一膜。 被曝光后的第二片胶片被去除。 第二化合物与已除去保护基团的第一化合物结合。
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4.发明申请METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TRANSFER RESIN FILM USED THEREFOR 有权用于修饰第一膜的方法及其用于形成酸转移树脂膜的组合物公开(公告)号：US20110076619A1
公开(公告)日：2011-03-31
申请号：US12962672
申请日：2010-12-08
申请人： Kouji NISHIKAWA
发明人： Kouji NISHIKAWA
CPC分类号： G03F7/095 , G03F7/0045 , G03F7/0392 , G03F7/11 , G03F7/38
摘要： A first film-modifying method includes forming a second film on a first film that includes an acid-dissociable group. The second film is an acid transfer resin film that includes a photoacid generator. The second film is exposed via a mask so that the second film generates an acid. The acid generated by the second film is transferred to the first film. The second film is removed
摘要翻译： 第一膜修饰方法包括在包含酸解离基团的第一膜上形成第二膜。 第二膜是包含光致酸发生剂的酸转移树脂膜。 通过掩模使第二膜曝光，使得第二膜产生酸。 由第二膜产生的酸转移到第一膜。 第二部电影被删除
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