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    Projection device
    3.
    发明授权
    Projection device 失效
    投影设备

    公开(公告)号：US4316665A

    公开(公告)日：1982-02-23

    申请号：US100858

    申请日：1979-12-06

    申请人： Noritaka Mochizuki ,  Setsuo Minami ,  Yoshiya Matsui ,  Koyo Midorikawa ,  Atsuo Tsunoda ,  Hidetoshi Murase ,  Mikio Suzuta ,  Masazumi Moriwaki

    发明人： Noritaka Mochizuki ,  Setsuo Minami ,  Yoshiya Matsui ,  Koyo Midorikawa ,  Atsuo Tsunoda ,  Hidetoshi Murase ,  Mikio Suzuta ,  Masazumi Moriwaki

    IPC分类号： G02B3/00 ,  G03B27/52 ,  G03B27/00

    CPC分类号： G02B3/0056 ,  G02B3/0062 ,  G03B27/525

    摘要： In a slit exposure type copying machine, a projection device basically includes transmission type element lens systems each including a lens having a great length in the direction of the optic axis thereof as compared with the effective diameter thereof. A part area of an original is projected upon a predetermined part area on an image plane and the light intensity distribution of the projected part area has a predetermined central area controlled by lens aperture eclipse and extending diametrically from at least the optic axis and a marginal area lying outwardly of the central area and weak in light intensity. A plurality of such element lens systems are substantially equidistantly arranged in the lengthwise direction of the slit in a plane perpendicular to the optic axis so that the marginal areas in at least the element lens systems are superposed upon one another. Further, the element lens systems are arranged in a plurality of rows so that each row is positioned just intermediate the adjacent row, whereby even if there is an error in the arrangement interval of the element lens systems, the uniformity, in the slit area, of the exposure amount time-integrated in the original scanning direction is maintained.

    摘要翻译： 在狭缝曝光型复印机中，投影装置基本上包括透射型元件透镜系统，每个透镜式元件透镜系统都包​​括与其有效直径相比在其光轴方向上具有大长度的透镜。 原稿的部分区域投影在图像平面上的预定部分区域上，并且投影部分区域的光强度分布具有由透镜孔径限制控制的预定中心区域，并且至少从光轴和边缘区域直径延伸 位于中心区域外面，光线强弱。 多个这样的元件透镜系统在垂直于光轴的平面中在狭缝的纵向方向上基本上等距地布置，使得至少元件透镜系统中的边缘区域彼此重叠。 此外，元件透镜系统布置成多行，使得每行位于相邻行的正中间，由此即使元件透镜系统的布置间隔中存在误差，在狭缝区域中的均匀性， 维持在原始扫描方向上积分的曝光量。

    Projection device
    4.
    发明授权
    Projection device 失效
    投影设备

    公开(公告)号：US4275962A

    公开(公告)日：1981-06-30

    申请号：US105789

    申请日：1979-12-20

    申请人： Koyo Midorikawa ,  Atsuo Tsunoda ,  Hidetoshi Murase ,  Noritaka Mochizuki ,  Setsuo Minami ,  Yoshiya Matsui ,  Masazumi Moriwaki ,  Mikio Suzuta

    发明人： Koyo Midorikawa ,  Atsuo Tsunoda ,  Hidetoshi Murase ,  Noritaka Mochizuki ,  Setsuo Minami ,  Yoshiya Matsui ,  Masazumi Moriwaki ,  Mikio Suzuta

    IPC分类号： G02B3/00 ,  G02B13/24 ,  G03B27/52 ,  G03G15/04 ,  G03B27/00

    CPC分类号： G02B3/0062 ,  G02B13/24 ,  G02B3/0075 ,  G03B27/525 ,  G03G15/0409 ,  G02B3/0087

    摘要： This specification discloses a compact projection device in which lens systems extending in the direction of the optic axis for projecting a part area of an object upon a predetermined part area on an image plane (hereinafter referred to as element lens systems) are initially set by a lens holding member having groove portions or hole portions extending in the direction of the optic axis, the distributions of intensity of light of the element lens systems on the image plane are controlled by an aperture eclipse such that the intensity of light is weaker in the marginal area than at least in the central area, a plurality of such element lens systems are arranged in a predetermined direction in a plane perpendicular to the optic axis and the distributions of intensity of light of the element lens systems are suitably superposed upon one another at least in the marginal area to provide uniformity of the distribution of the exposure amount integrated in the scanning direction with respect to the lengthwise direction of the slit of a copying machine of the slit exposure type. The element lens system each comprises two bar lenses each having a great length in the direction of the optic axis thereof as compared with the effective diameter thereof, and an intermediate image is once formed between the bar lenses and finally, a one-to-one magnification image is provided. The element lens systems are arranged in more than two rows in a honeycomb-like fashion such that the element lens systems of each row are positioned intermediate the element lens systems of the other row as viewed in the direction of the optic axis, whereby the uniformity of the distribution of the exposure amount integrated in the scanning direction with respect to the lengthwise direction of the slit is improved.

    摘要翻译： 本说明书公开了一种紧凑的投影装置，其中在光轴方向上延伸的透镜系统用于将物体的一部分区域投影在图像平面上的预定部分区域（以下称为元件透镜系统）上，最初由 透镜保持构件具有沿光轴方向延伸的凹槽部分或孔部分，像面上的元件透镜系统的光强度分布由孔径日食控制，使得光的强度在边缘较弱 区域至少在中心区域中，多个这样的元件透镜系统在垂直于光轴的平面中沿预定方向布置，并且元件透镜系统的光强度的分布至少适当地叠加在彼此上 在边缘区域中以提供在扫描方向上集成的曝光量的分布的均匀性 沿狭缝曝光型的复印机的狭缝的长度方向。 元件透镜系统各自包括两个条形透镜，每个透镜在其光轴的方向上与其有效直径相比具有大的长度，并且在条形透镜之间一度形成中间图像，最后是一对一 提供放大图像。 元件透镜系统以蜂窝状方式布置成两行以上，使得每行的元件透镜系统位于沿着光轴方向观察的另一排的元件透镜系统的中间，由此均匀性 提高了相对于狭缝的长度方向在扫描方向上积分的曝光量的分布。