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    Composition containing siloxane compound and phenol compound
    1.
    发明授权
    Composition containing siloxane compound and phenol compound 有权
    含有硅氧烷化合物和酚化合物的组合物

    公开(公告)号：US07737291B2

    公开(公告)日：2010-06-15

    申请号：US11597036

    申请日：2005-12-21

    申请人： Kunio Osasawara ,  Kazuhisa Onozawa ,  Hiroki Sato ,  Takashi Higashino

    发明人： Kunio Osasawara ,  Kazuhisa Onozawa ,  Hiroki Sato ,  Takashi Higashino

    IPC分类号： C23C16/42 ,  C07F7/21

    CPC分类号： C23C16/401 ,  C07F7/21 ,  C09D4/00 ,  C08G77/04

    摘要： A composition containing 100 parts by mass of a siloxane compound having —HSiRO— (wherein R is a hydrogen atom, a hydrocarbon group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms or a phenoxy group) and 0.0001 to 1 part by mass of at least one phenol compound of general formula (1) or (2) as a stabilizer. wherein a and b are each an integer of 0 to 4; m is 0 or 1; p and q are each 1 or 2; R1, R2, R3, and R4 are each an alkyl group having 1 to 4 carbon atoms; X1 and X2 each represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogen atom; Y is an alkanediyl group having 1 to 4 carbon atoms; and a plurality of R1s, R2s, R3s, R4s, X1s, X2s or Ys, where present per molecule, may be the same or different.

    摘要翻译： 包含100质量份具有-HSiRO-（其中R是氢原子，具有1至8个碳原子的烃基，具有1至8个碳原子的烷氧基或苯氧基）的硅氧烷化合物和0.0001至 1质量份的至少一种通式（1）或（2）的酚化合物作为稳定剂。 其中a和b各自为0至4的整数; m为0或1; p和q各自为1或2; R 1，R 2，R 3和R 4各自为具有1至4个碳原子的烷基; X1和X2各自表示具有1至4个碳原子的烷基，具有1至4个碳原子的烷氧基或卤素原子; Y为碳原子数为1〜4的烷二基; 并且每个分子存在的多个R 1，R 2，R 3，R 4，X 1，X 2或Y可以相同或不同。

    Composition Containing Siloxane Compound and Phenol Compound
    2.
    发明申请
    Composition Containing Siloxane Compound and Phenol Compound 有权
    含有硅氧烷化合物和苯酚化合物的组合物

    公开(公告)号：US20070232821A1

    公开(公告)日：2007-10-04

    申请号：US11597036

    申请日：2005-12-21

    申请人： Kunio Ogasawara ,  Kazuhisa Onozawa ,  Hiroki Sato ,  Takashi Higashino

    发明人： Kunio Ogasawara ,  Kazuhisa Onozawa ,  Hiroki Sato ,  Takashi Higashino

    IPC分类号： C07F7/21 ,  C07F7/02 ,  C07F7/18

    CPC分类号： C23C16/401 ,  C07F7/21 ,  C09D4/00 ,  C08G77/04

    摘要： A composition containing 100 parts by mass of a siloxane compound having —HSiRO— (wherein R is a hydrogen atom, a hydrocarbon group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms or a phenoxy group) and 0.0001 to 1 part by mass of at least one phenol compound of general formula (1) or (2) as a stabilizer. wherein a and b are each an integer of 0 to 4; m is 0 or 1; p and q are each 1 or 2; R1, R2, R3, and R4 are each an alkyl group having 1 to 4 carbon atoms; X1 and X2 each represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogen atom; Y is an alkanediyl group having 1 to 4 carbon atoms; and a plurality of R1s, R2s, R3s, R4s, X1s, X2s or Ys, where present per molecule, may be the same or different.

    摘要翻译： 包含100质量份具有-HSiRO-（其中R是氢原子，具有1至8个碳原子的烃基，具有1至8个碳原子的烷氧基或苯氧基）的硅氧烷化合物和0.0001至 1质量份的至少一种通式（1）或（2）的酚化合物作为稳定剂。 其中a和b各自为0至4的整数; m为0或1; p和q各自为1或2; R 1，R 2，R 3和R 4各自为具有1至4个碳原子的烷基 原子 X 1和X 2各自表示具有1至4个碳原子的烷基，具有1至4个碳原子的烷氧基或卤素原子; Y为碳原子数为1〜4的烷二基; 和多个R 1，R 2，R 3，R 4，X 4， 每个分子存在的，可以相同或不同。

    Molding stand
    4.
    发明授权
    Molding stand 失效
    成型架

    公开(公告)号：US4366268A

    公开(公告)日：1982-12-28

    申请号：US276700

    申请日：1981-06-23

    申请人： Akio Yamanishi ,  Kanichi Sato ,  Takashi Higashino

    发明人： Akio Yamanishi ,  Kanichi Sato ,  Takashi Higashino

    IPC分类号： B22C1/00 ,  B22C1/02 ,  B22C1/10 ,  B22C1/22 ,  B22C9/12 ,  C08L61/04

    CPC分类号： B22C1/22 ,  B22C1/02

    摘要： A molding sand for use in a molding process employing a microwave radiation for curing the molding sand. The molding sand comprises a new sand, a carbonized resin coated sand and a thermosetting or thermoplastic resin. The carbonized resin coated sand is preferably subjected to a scrubbing treatment prior to the admixture thereof with the new sand.

    摘要翻译： 一种用于使用微波辐射固化型砂的成型工艺中的型砂。 型砂包括新砂，碳化树脂涂层砂和热固性或热塑性树脂。 碳化树脂涂覆的砂优选在与新砂混合之前进行洗涤处理。

    Pattern for producing a mold and method for manufacture of the pattern
    6.
    发明授权
    Pattern for producing a mold and method for manufacture of the pattern 失效
    用于制造模具的图案和用于制造图案的方法

    公开(公告)号：US4535831A

    公开(公告)日：1985-08-20

    申请号：US357273

    申请日：1982-03-11

    申请人： Kan-ichi Sato ,  Akio Yamanishi ,  Takashi Higashino

    发明人： Kan-ichi Sato ,  Akio Yamanishi ,  Takashi Higashino

    IPC分类号： B22C7/00 ,  B22C7/06 ,  B22C9/02 ,  B22C9/12 ,  B22D13/10

    CPC分类号： B22C7/00 ,  B22C7/06

    摘要： A method of producing a pattern for use in the manufacture of a mold which is adapted to be cured by microwave irradiation. The method comprises forming a rolled-over male pattern, forming a rolled-over female pattern having a scale-off layer along a boundary thereof with the male pattern, removing the scale-off layer, pouring a silicone RTV rubber into a cavity of the female pattern to form a match plate therein, setting a metallic frame on the match plate, filling the interior of the metallic frame with a mixture of microwave-pervious resin and dry silica sand, causing the mixture to be thermally cured thereby forming a reinforcing layer on the peripheral surface of the match plate, placing the male pattern within the reinforcing layer after removing the match plate therefrom, and injecting a microwave-pervious silicone rubber into the gap formed between the reinforcing layer and the male pattern thereby forming a mold defining layer on the inner surface of the reinforcing layer.

    摘要翻译： 一种制造用于制造适于通过微波照射固化的模具的图案的方法。 该方法包括：形成滚压的阳型图案，沿其边界与阳型图案形成具有防倾斜层的滚压阴型图案，去除剥离层，将硅树脂RTV橡胶倒入到 阴型图案，在其中形成匹配板，在金属板上设置金属框架，用微波透过树脂和干硅砂的混合物填充金属框架的内部，使混合物热固化，从而形成增强层 在匹配板的外周表面上，在从其中取出匹配板之后，将阳图案放置在加强层内，并将微波可渗透的硅橡胶注入形成在增强层和阳图案之间的间隙中，从而形成模具限定层 在加强层的内表面上。