IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN SUBSTRATE PROCESSING SYSTEMS

    公开(公告)号:US20250069866A1

    公开(公告)日:2025-02-27

    申请号:US18940259

    申请日:2024-11-07

    Abstract: Systems and methods of the disclosure perform in situ sensing and real time compensation of various non-uniformities in substrate processing systems. A plasma non-uniformity is sensed by determining a temperature distribution across a matrix of a plurality of micro-heaters disposed in the substrate support. Alternatively, the plasma non-uniformity is sensed by determining heat flux through the substrate support using the matrix heaters and one or more heaters used to heat one or more zones of the substrate support. The plasma non-uniformity is compensated by adjusting one or more parameters such as power supplied to the matrix heaters, RF power supplied to generate plasma, chemistry and/or flow rate of gas or gases used to generate plasma, settings of thermal control units or chillers, and so on. Additionally, non-uniformities inherent in the substrate support are sensed using the zone and matrix heaters and are compensated by adjusting the one or more parameters.

    IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN SUBSTRATE PROCESSING SYSTEMS

    公开(公告)号:US20220277928A1

    公开(公告)日:2022-09-01

    申请号:US17628282

    申请日:2020-07-21

    Abstract: Systems and methods of the disclosure perform in situ sensing and real time compensation of various non-uniformities in substrate processing systems. A plasma non-uniformity is sensed by determining a temperature distribution across a matrix of a plurality of micro-heaters disposed in the substrate support. Alternatively, the plasma non-uniformity is sensed by determining heat flux through the substrate support using the matrix heaters and one or more heaters used to heat one or more zones of the substrate support. The plasma non-uniformity is compensated by adjusting one or more parameters such as power supplied to the matrix heaters, RF power supplied to generate plasma, chemistry and/or flow rate of gas or gases used to generate plasma, settings of thermal control units or chillers, and so on. Additionally, non-uniformities inherent in the substrate support are sensed using the zone and matrix heaters and are compensated by adjusting the one or more parameters.

    POWER AND DATA TRANSMISSION TO SUBSTRATE SUPPORT IN PLASMA CHAMBERS VIA OPTICAL FIBER

    公开(公告)号:US20220247492A1

    公开(公告)日:2022-08-04

    申请号:US17617517

    申请日:2020-06-08

    Abstract: A substrate support assembly comprises a first optical receiver, a power converter, a first circuit, and a first optical transmitter, all embedded in the substrate support assembly. The first optical receiver is configured to receive a first optical signal and a first optical data through a fiber optic cable. The power converter is configured to generate DC power based on the first optical signal and the first optical data received by the first optical receiver. The first circuit is configured to receive the DC power from the power converter and to receive a second data from a sensor disposed in the substrate support assembly in response to the first optical data. The first optical transmitter is configured to transmit the second data as a second optical data through the fiber optic cable.

Patent Agency Ranking