RF antenna producing a uniform near-field Poynting vector

    公开(公告)号:US10685810B2

    公开(公告)日:2020-06-16

    申请号:US16512285

    申请日:2019-07-15

    Abstract: An apparatus for generating plasma, including a quadrupole antenna having a center region and an outer region and configured to be disposed over a dielectric window of a plasma chamber. The quadrupole antenna including a first coil defining a first SDA and a second coil defining a second SDA, the first coil being in a nested arrangement within the second coil. The nested arrangement places a turn of the first coil to be adjacent to a corresponding turn of the second coil as the first and second coils spiral from the center region to the outer region of the quadrupole antenna. Adjacent turns of each of the first and second coils are horizontally separated from one another by a distance when disposed over the dielectric window.

    CONTROL OF PLASMA FORMATION BY RF COUPLING STRUCTURES

    公开(公告)号:US20230326720A1

    公开(公告)日:2023-10-12

    申请号:US18000895

    申请日:2021-06-07

    CPC classification number: H01J37/32174 H01J37/321

    Abstract: An apparatus for forming a plasma may include one or more coupling ports to accept a radiofrequency (RF) current. The apparatus may additionally include one or more coupling structures which may include one or more conductive loops to permit the RF current to conduct from at least a first portion of the one or more coupling ports to at least a second port of the one or more coupling ports. The one or more conductive loops may each be configured to exhibit a first value of inductance in the absence of the plasma and to exhibit a second value of inductance in the presence of the plasma. The one or more coupling structures may each include a reactive element, in which each reactive element is coupled to a corresponding one of the one or more conductive loops so as to form a corresponding number of coupling structures. Each RF coupling structure may have a resonant frequency that increases in response to the presence of the plasma.

    Transformer Isolator Having RF Shield Structure for Effective Magnetic Power Transfer

    公开(公告)号:US20230134296A1

    公开(公告)日:2023-05-04

    申请号:US17918538

    申请日:2021-03-23

    Abstract: An apparatus for a transformer isolator used for transferring power to an element of a substrate support used in a plasma chamber is provided. A primary of the transformer isolator includes a primary base plate configured to electrically couple to ground. A primary ferrite disposed over the primary base plate, and the primary ferrite has a primary circular channel. A primary coil is wound within the primary circular channel. A primary shield is disposed over the primary ferrite and the primary coil. The primary shield includes a first plurality of radial segments that extend from a primary center region to outside a periphery of the primary ferrite. An extended region of the primary shield has a curved section to connect the primary shield with the primary base plate. In one example, the secondary of the transformer isolator has similar construction as the primary and are used together as part of the transformer isolator.

    RF ANTENNA PRODUCING A UNIFORM NEAR-FIELD POYNTING VECTOR

    公开(公告)号:US20200118792A1

    公开(公告)日:2020-04-16

    申请号:US16512285

    申请日:2019-07-15

    Abstract: An apparatus for generating plasma, including a quadrupole antenna having a center region and an outer region and configured to be disposed over a dielectric window of a plasma chamber. The quadrupole antenna including a first coil defining a first SDA and a second coil defining a second SDA, the first coil being in a nested arrangement within the second coil. The nested arrangement places a turn of the first coil to be adjacent to a corresponding turn of the second coil as the first and second coils spiral from the center region to the outer region of the quadrupole antenna. Adjacent turns of each of the first and second coils are horizontally separated from one another by a distance when disposed over the dielectric window.

    RF antenna producing a uniform near-field Poynting vector

    公开(公告)号:US10354838B1

    公开(公告)日:2019-07-16

    申请号:US16156837

    申请日:2018-10-10

    Abstract: An apparatus for generating plasma, including a quadrupole antenna having a center region and an outer region and configured to be disposed over a dielectric window of a plasma chamber. The quadrupole antenna including a first coil defining a first SDA and a second coil defining a second SDA, the first coil being in a nested arrangement within the second coil. The nested arrangement places a turn of the first coil to be adjacent to a corresponding turn of the second coil as the first and second coils spiral from the center region to the outer region of the quadrupole antenna. Adjacent turns of each of the first and second coils are horizontally separated from one another by a distance when disposed over the dielectric window.

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