公开(公告)号：US20190341275A1

公开(公告)日：2019-11-07

申请号：US15972927

申请日：2018-05-07

Applicant: Lam Research Corporation

Inventor： Yansha JIN ,  Zhongkui Tan ,  Tyler Kent ,  Haoquan Yan ,  Qian Fu ,  Anthony Contreras

IPC: H01L21/67 ,  H01J37/32 ,  B08B7/00 ,  B08B5/00

Abstract: A method for performing a cleaning process in a processing chamber includes, without a substrate arranged on a substrate support of the processing chamber, supplying reactant gases in a side gas flow via side tuning holes of a gas distribution device to effect deposition of a coating on an edge ring of the substrate support. The side gas flow targets an outer region of the processing chamber above the edge ring, and the reactant gases are supplied at a first flow rate. The method further includes, while supplying the reactant gases via the side tuning holes, supplying inert gases in a center gas flow via center holes of the gas distribution device. The inert gases are supplied at a second flow rate that is greater than the first flow rate.

公开(公告)号：US11798789B2

公开(公告)日：2023-10-24

申请号：US16960818

申请日：2018-09-10

Applicant: LAM RESEARCH CORPORATION

Inventor： Alejandro Sanchez ,  Grayson Ford ,  Darrell Ehrlich ,  Aravind Alwan ,  Kevin Leung ,  Anthony Contreras ,  Zhumin Han ,  Raphael Casaes ,  Joanna Wu

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01J37/32642 ,  H01J37/32715 ,  H01L21/67069 ,  H01L21/68735 ,  H01L21/68742 ,  H01J2237/20235

Abstract: A first edge ring for a substrate support is provided. The first edge ring includes an annular-shaped body and one or more lift pin receiving elements. The annular-shaped body is sized and shaped to surround an upper portion of the substrate support. The annular-shaped body defines an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The one or more lift pin receiving elements are disposed along the lower surface of the annular-shaped body and sized and shaped to receive and provide kinematic coupling with top ends respectively of three or more lift pins.

公开(公告)号：US20220270863A1

公开(公告)日：2022-08-25

申请号：US17671211

申请日：2022-02-14

Applicant: LAM RESEARCH CORPORATION

Inventor： Christopher Kimball ,  Hema Swaroop Mopidevi ,  Saravanapriyan Sriraman ,  Tom A. Kamp ,  Darrell Ehrlich ,  Anthony Contreras ,  Chiara Helena Catherina Giammanco Macpherson

IPC: H01J37/32 ,  H01L21/687

Abstract: A moveable edge ring system for a plasma processing system includes a top edge ring and a first edge ring arranged below the top edge ring. A second edge ring is made of conductive material and includes an upper portion, a middle portion and a lower portion. The top edge ring and the second edge ring are configured to move in a vertical direction relative to a substrate support and the first edge ring when biased upwardly by a lift pin. The second edge ring is arranged below the top edge ring and radially outside of the first edge ring.

公开(公告)号：US20240038504A1

公开(公告)日：2024-02-01

申请号：US18377141

申请日：2023-10-05

Applicant: Lam Research Corporation

Inventor： Alejandro SANCHEZ ,  Grayson Ford ,  Darrell Ehrlich ,  Aravind Alwan ,  Kevin Leung ,  Anthony Contreras ,  Zhumin Han ,  Raphael Casaes ,  Joanna Wu

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01J37/32642 ,  H01J37/32715 ,  H01L21/67069 ,  H01L21/68735 ,  H01L21/68742 ,  H01J2237/20235

Abstract: A first edge ring for a substrate support is provided. The first edge ring includes an annular-shaped body and one or more lift pin receiving elements. The annular-shaped body is sized and shaped to surround an upper portion of the substrate support. The annular-shaped body defines an upper surface, a lower surface, a radially inner surface, and a radially outer surface. The one or more lift pin receiving elements are disposed along the lower surface of the annular-shaped body and sized and shaped to receive and provide kinematic coupling with top ends respectively of three or more lift pins.