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公开(公告)号：US20230238253A1
公开(公告)日：2023-07-27
申请号：US18002619
申请日：2021-11-15
Applicant: Lam Research Corporation
Inventor： Evangelos T. Spyropoulos , Iqbal A. Shareef
IPC: H01L21/67 , C23C16/44 , C23C16/455
CPC classification number: H01L21/67017 , C23C16/4412 , C23C16/45561
Abstract: Gas boxes for providing semiconductor processing gases are provided that incorporate a cross-flow ventilation system that may effectively remove potentially leaking gases from within the gas box at significantly lower volumetric flow rates than are possible with conventional gas box ventilation systems.
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公开(公告)号：US20210183626A1
公开(公告)日：2021-06-17
申请号：US17165923
申请日：2021-02-02
Applicant: Lam Research Corporation
Inventor： Mark Taskar , Iqbal A. Shareef
IPC: H01J37/32
Abstract: In some examples, a gas mixer comprises a body and an orbital array of gas inlets for receiving one or more constituents of a mixed gas. A mixed gas outlet emits a mixed gas from the body and is disposed at a center of the orbital array of gas inlets. A central gas mixing point, separate from the mixed gas outlet, comprises an internal volume disposed within the body and is surrounded by the orbital array of gas inlet. The internal volume is in fluid communication with the orbital array of gas inlets via a corresponding array of gas pathways extending from the internal volume to each of the gas inlets. Each gas path length of the respective gas pathways is the same. Control circuitry is configured to control gas flow rate within each of the gas pathways individually.
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公开(公告)号：US20140158153A1
公开(公告)日：2014-06-12
申请号：US13711962
申请日：2012-12-12
Applicant: LAM RESEARCH CORPORATION
Inventor： Evangelos T. Spyropoulos , Iqbal A. Shareef , Clifford Erik La Croix
IPC: B08B3/12
CPC classification number: B08B3/12 , A47L2601/17 , B08B1/00 , B08B3/00 , B08B3/044 , B08B3/045 , B08B3/047 , B08B3/048 , B08B3/10 , B08B3/108 , B08B11/00 , B08B11/02 , B08B11/04 , B08B2209/005 , G02B27/0006 , H01J37/32862
Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.
Abstract translation: 超声波清洗装置和清洁基本上平面的物品的方法。 一种装置包括（i）基本圆形的罐; （ii）用于将清洁流体输送到罐的多个清洁流体入口; （iii）用于接收待清洁物品的中间支撑件; 以及（iv）耦合到所述罐的超声波发生器，用于在所述罐中产生超声波并且在其中接收清洁流体。 该装置构造成从基本上平面的制品中除去颗粒，并使它们通过清洁流体的流动远离制品并从罐中运送。 使用这种装置，清洁方法包括将待清洁的基本上平面的物品引入到罐中; 通过所述多个清洁流体入口将清洁流体引入所述罐中; 并用超声波激发清洗液。
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公开(公告)号：US11532460B2
公开(公告)日：2022-12-20
申请号：US17165923
申请日：2021-02-02
Applicant: Lam Research Corporation
Inventor： Mark Taskar , Iqbal A. Shareef
Abstract: In some examples, a gas mixer comprises a body and an orbital array of gas inlets for receiving one or more constituents of a mixed gas. A mixed gas outlet emits a mixed gas from the body and is disposed at a center of the orbital array of gas inlets. A central gas mixing point, separate from the mixed gas outlet, comprises an internal volume disposed within the body and is surrounded by the orbital array of gas inlet. The internal volume is in fluid communication with the orbital array of gas inlets via a corresponding array of gas pathways extending from the internal volume to each of the gas inlets. Each gas path length of the respective gas pathways is the same. Control circuitry is configured to control gas flow rate within each of the gas pathways individually.
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公开(公告)号：US20160045941A1
公开(公告)日：2016-02-18
申请号：US14926575
申请日：2015-10-29
Applicant: Lam Research Corporation
Inventor： Evangelos T. Spyropoulos , Iqbal A. Shareef , Clifford Erik La Croix
CPC classification number: B08B3/12 , A47L2601/17 , B08B1/00 , B08B3/00 , B08B3/044 , B08B3/045 , B08B3/047 , B08B3/048 , B08B3/10 , B08B3/108 , B08B11/00 , B08B11/02 , B08B11/04 , B08B2209/005 , G02B27/0006 , H01J37/32862
Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.
Abstract translation: 超声波清洗装置和清洁基本上平面的物品的方法。 一种装置包括（i）基本圆形的罐; （ii）用于将清洁流体输送到罐的多个清洁流体入口; （iii）用于接收待清洁物品的中间支撑件; 以及（iv）耦合到所述罐的超声波发生器，用于在所述罐中产生超声波并且在其中接收清洁流体。 该装置构造成从基本上平面的制品中除去颗粒，并使它们通过清洁流体的流动远离制品并从罐中运送。 使用这种装置，清洁方法包括将待清洁的基本上平面的物品引入到罐中; 通过所述多个清洁流体入口将清洁流体引入所述罐中; 并用超声波激发清洗液。
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Patent Agency Ranking
公开(公告)号：US20200027702A1
公开(公告)日：2020-01-23
申请号：US16040326
申请日：2018-07-19
Applicant: Lam Research Corporation
Inventor： Mark Taskar , Iqbal A. Shareef
IPC: H01J37/32
Abstract: Apparatus and methods for distributing and mixing gas are provided. In one example, a gas distributor comprises a body, a gas inlet for admitting gas to the body, an orbital array of gas outlets for distributing the gas to an external component, and a central gas distribution point disposed within the body at a center of the orbital array of gas outlets and in fluid communication with the orbital array of gas outlets.
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公开(公告)号：US10022689B2
公开(公告)日：2018-07-17
申请号：US14809041
申请日：2015-07-24
Applicant: Lam Research Corporation
Inventor： Iqbal A. Shareef , Mark Taskar
Abstract: A mixing hub for use in semiconductor processing tools is provided. The hub may include a plurality of ports arranged about an axis, a mixing chamber, and a plurality of flow paths. Each of the flow paths may fluidically connect a corresponding one of the ports to the mixing chamber and each flow path may include a first passage, a second passage, and a valve interface. Each valve interface may be configured to interface with a valve such that the valve, when installed in the valve interface, is able to regulate fluid flow between the first passage and the second passage. Each valve interface may be located between a first reference plane that is perpendicular to the axis and passes through the corresponding port and a second reference plane that is perpendicular to the axis and passes through the mixing chamber.
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公开(公告)号：US20170021317A1
公开(公告)日：2017-01-26
申请号：US14809041
申请日：2015-07-24
Applicant: Lam Research Corporation
Inventor： Iqbal A. Shareef , Mark Taskar
CPC classification number: B01F15/0226 , B01F3/02 , B01F13/1058 , B01F15/0222 , B01F2215/0096
Abstract: A mixing hub for use in semiconductor processing tools is provided. The hub may include a plurality of ports arranged about an axis, a mixing chamber, and a plurality of flow paths. Each of the flow paths may fluidically connect a corresponding one of the ports to the mixing chamber and each flow path may include a first passage, a second passage, and a valve interface. Each valve interface may be configured to interface with a valve such that the valve, when installed in the valve interface, is able to regulate fluid flow between the first passage and the second passage. Each valve interface may be located between a first reference plane that is perpendicular to the axis and passes through the corresponding port and a second reference plane that is perpendicular to the axis and passes through the mixing chamber.
Abstract translation: 提供了一种用于半导体加工工具的搅拌轮毂。 轮毂可包括围绕轴线布置的多个端口，混合室和多个流动路径。 每个流动路径可以将相应的一个端口流体连接到混合室，并且每个流动路径可以包括第一通道，第二通道和阀接口。 每个阀接口可被配置为与阀接口，使得当安装在阀接口中时，阀能够调节第一通道和第二通道之间的流体流动。 每个阀接口可以位于垂直于轴线并穿过对应端口的第一参考平面和垂直于轴线并通过混合室的第二参考平面之间。
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公开(公告)号：US09174249B2
公开(公告)日：2015-11-03
申请号：US13711962
申请日：2012-12-12
Applicant: Lam Research Corporation
Inventor： Evangelos T. Spyropoulos , Iqbal A. Shareef , Clifford Erik La Croix
CPC classification number: B08B3/12 , A47L2601/17 , B08B1/00 , B08B3/00 , B08B3/044 , B08B3/045 , B08B3/047 , B08B3/048 , B08B3/10 , B08B3/108 , B08B11/00 , B08B11/02 , B08B11/04 , B08B2209/005 , G02B27/0006 , H01J37/32862
Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.
Abstract translation: 超声波清洗装置和清洁基本上平面的物品的方法。 一种装置包括（i）基本圆形的罐; （ii）用于将清洁流体输送到罐的多个清洁流体入口; （iii）用于接收待清洁物品的中间支撑件; 以及（iv）耦合到所述罐的超声波发生器，用于在所述罐中产生超声波并且在其中接收清洁流体。 该装置构造成从基本上平面的制品中除去颗粒，并使它们通过清洁流体的流动远离制品并从罐中运送。 使用这种装置，清洁方法包括将待清洁的基本上平面的物品引入到罐中; 通过所述多个清洁流体入口将清洁流体引入所述罐中; 并用超声波激发清洗液。
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公开(公告)号：US11662237B2
公开(公告)日：2023-05-30
申请号：US17043182
申请日：2019-04-02
Applicant: LAM RESEARCH CORPORATION
Inventor： Iqbal A. Shareef , Dennis Smith , John E. Daugherty
CPC classification number: G01F1/8445 , G01F1/48 , G01F1/845 , G01F1/8427 , G01F1/8431 , G01F15/005
Abstract: A fluid delivery system includes N first valves. Inlets of the N first valves are fluidly connected to N gas sources, respectively, where N is an integer greater than zero. N mass flow controllers include a microelectromechanical (MEMS) Coriolis flow sensor having an inlet in fluid communication with an outlet of a corresponding one of the N first valves. A second valve has an inlet in fluid communication with an outlet of the MEMS Coriolis flow sensor and an outlet supplying fluid to treat a substrate arranged in a processing chamber. A controller in communication with the MEMS Coriolis flow sensor is configured to determine at least one of a mass flow rate and a density of fluid flowing through the MEMS Coriolis flow sensor.
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