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公开(公告)号：US11860016B2
公开(公告)日：2024-01-02
申请号：US17042059
申请日：2019-03-28
Applicant: LAM RESEARCH CORPORATION
Inventor： Dennis Smith , Peter Reimer , Sudhakar Gopalakrishnan
CPC classification number: G01F1/8445 , G01F1/8422 , G01F1/8427 , G01F1/8431 , G01F15/005 , G01F15/125 , G01N9/32 , H01L21/67253 , G05D7/0688
Abstract: A mass flow controller assembly includes a housing defining a cavity, a plurality of internal passages, a first inlet, a first outlet, a second inlet, and a second outlet. A valve is connected to the housing, has an inlet fluidly coupled to the second outlet of the housing and an outlet fluidly coupled to the second inlet of the housing. The valve is configured to control fluid flow from the second outlet of the housing to the second inlet of the housing. A microelectromechanical (MEMS) Coriolis flow sensor is arranged in the cavity, includes an inlet fluidly coupled by at least one of the plurality of internal passages to the first inlet of the housing and is configured to measure at least one of a mass flow rate and density of fluid flowing through the MEMS Coriolis flow sensor. An outlet of the MEMS Coriolis flow sensor is fluidly coupled by at least one of the plurality of internal passages to the second outlet of the housing. The second inlet of the housing is fluidly coupled by at least one of the plurality of internal passages to the first outlet of the housing.
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公开(公告)号：US20220384145A1
公开(公告)日：2022-12-01
申请号：US17770968
申请日：2020-10-21
Applicant: Lam Research Corporation
Inventor： Seyedalireza Torbatisarraf , Kurt Alan Kern , Dennis Smith
IPC: H01J37/32 , C23C16/455
Abstract: Methods, systems, and computer programs are presented for manufacturing a showerhead for a semiconductor manufacturing system. One method includes an operation for drilling first holes on a faceplate made of a first material, where the first holes have a first diameter. Further, the method includes an operation for cladding the first holes and the faceplate with a second material to cover the first holes and the faceplate with the second material. Further yet, the method includes drilling second holes concentric with the first holes resulting in a part with holes coated with the second material. The second holes have a second diameter that is smaller than the first diameter. Additionally, the method includes an operation for creating the showerhead utilizing the part, where gas is deliverable through the second holes of the faceplate in the showerhead.
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公开(公告)号：US11662237B2
公开(公告)日：2023-05-30
申请号：US17043182
申请日：2019-04-02
Applicant: LAM RESEARCH CORPORATION
Inventor： Iqbal A. Shareef , Dennis Smith , John E. Daugherty
CPC classification number: G01F1/8445 , G01F1/48 , G01F1/845 , G01F1/8427 , G01F1/8431 , G01F15/005
Abstract: A fluid delivery system includes N first valves. Inlets of the N first valves are fluidly connected to N gas sources, respectively, where N is an integer greater than zero. N mass flow controllers include a microelectromechanical (MEMS) Coriolis flow sensor having an inlet in fluid communication with an outlet of a corresponding one of the N first valves. A second valve has an inlet in fluid communication with an outlet of the MEMS Coriolis flow sensor and an outlet supplying fluid to treat a substrate arranged in a processing chamber. A controller in communication with the MEMS Coriolis flow sensor is configured to determine at least one of a mass flow rate and a density of fluid flowing through the MEMS Coriolis flow sensor.
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公开(公告)号：US10737359B2
公开(公告)日：2020-08-11
申请号：US15948910
申请日：2018-04-09
Applicant: Lam Research Corporation
Inventor： Dennis Smith
Abstract: Methods and systems for preparing a hole having an accurately controlled area in an orifice plate for a mass flow controller are provided. Methods involve forming an initial hole in the orifice plate. The initial hole has an opening having an initial area. The orifice plate comprises a material that can react to form a coating on the orifice plate. The coating occupies a greater volume than the material consumed to form the coating. The material of the orifice plate is reacted with a reactant to produce the coating and thereby produce a reduced area hole having an opening with a reduced area that is smaller than the initial area. The reduced area hole is measured. A determined amount of the coating is removed from at least the reduced area hole to produce a final hole in the orifice plate, wherein the reduced area is smaller than an opening area of the final hole.
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Patent Agency Ranking
公开(公告)号：US10591934B2
公开(公告)日：2020-03-17
申请号：US15917528
申请日：2018-03-09
Applicant: Lam Research Corporation
Inventor： Sudhakar Gopalakrishnan , Peter Reimer , John Haruff , Dennis Smith
Abstract: Methods and apparatuses for delivering a process gas to a processing chamber are provided. A mass flow controller includes a first flow line for introducing a process fluid and an inlet valve disposed along the first flow line for controlling a flow rate of the process fluid. The mass flow controller includes a second flow line for introducing a carrier fluid into the mass flow controller and a micro-electro-mechanical system (MEMS) Coriolis sensor for providing a density signal and a mass flow rate signal for a mixture of the process fluid and the carrier fluid. The mass flow controller provided includes an outlet valve for controlling a mass flow rate of the mixture that is output by the mass flow controller as well as a controller for operating the inlet valve based on the density signal and for operating the outlet valve based on the mass flow rate signal.
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公开(公告)号：US20190308286A1
公开(公告)日：2019-10-10
申请号：US15948910
申请日：2018-04-09
Applicant: Lam Research Corporation
Inventor： Dennis Smith
Abstract: Methods and systems for preparing a hole having an accurately controlled area in an orifice plate for a mass flow controller are provided. Methods involve forming an initial hole in the orifice plate. The initial hole has an opening having an initial area. The orifice plate comprises a material that can react to form a coating on the orifice plate. The coating occupies a greater volume than the material consumed to form the coating. The material of the orifice plate is reacted with a reactant to produce the coating and thereby produce a reduced area hole having an opening with a reduced area that is smaller than the initial area. The reduced area hole is measured. A determined amount of the coating is removed from at least the reduced area hole to produce a final hole in the orifice plate, wherein the reduced area is smaller than an opening area of the final hole.
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公开(公告)号：US10655638B2
公开(公告)日：2020-05-19
申请号：US15922857
申请日：2018-03-15
Applicant: Lam Research Corporation
Inventor： Dennis Smith , Peter Reimer
Abstract: A gas pump and processes for preparing the gas pump are presented. The gas pump includes a bottom Holweck stage with internal heaters for cleaning deposits resulting from exhausting gases from a semiconductor manufacturing chamber. One example gas pump includes a turbomolecular stage on a top section of the gas pump and a Holweck stage below the turbomolecular stage. The Holweck stage comprises a rotor element, a stator element with an opening in the center, and one or more heaters. The opening has a substantially cylindrical shape and an inside surface with a plurality of grooves separated by threads. Each heater is situated on a surface of one of the plurality of grooves. The heaters may be turned on to clean the deposits accumulated on the gas pump during the processing of a substrate.
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公开(公告)号：US20190285090A1
公开(公告)日：2019-09-19
申请号：US15922857
申请日：2018-03-15
Applicant: Lam Research Corporation
Inventor： Dennis Smith , Peter Reimer
Abstract: A gas pump and processes for preparing the gas pump are presented. The gas pump includes a bottom Holweck stage with internal heaters for cleaning deposits resulting from exhausting gases from a semiconductor manufacturing chamber. One example gas pump includes a turbomolecular stage on a top section of the gas pump and a Holweck stage below the turbomolecular stage. The Holweck stage comprises a rotor element, a stator element with an opening in the center, and one or more heaters. The opening has a substantially cylindrical shape and an inside surface with a plurality of grooves separated by threads. Each heater is situated on a surface of one of the plurality of grooves. The heaters may be turned on to clean the deposits accumulated on the gas pump during the processing of a substrate.
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公开(公告)号：US20190279888A1
公开(公告)日：2019-09-12
申请号：US15917528
申请日：2018-03-09
Applicant: Lam Research Corporation
Inventor： Sudhakar Gopalakrishnan , Peter Reimer , John Haruff , Dennis Smith
Abstract: Methods and apparatuses for delivering a process gas to a processing chamber are provided. A mass flow controller includes a first flow line for introducing a process fluid and an inlet valve disposed along the first flow line for controlling a flow rate of the process fluid. The mass flow controller includes a second flow line for introducing a carrier fluid into the mass flow controller and a micro-electro-mechanical system (MEMS) Coriolis sensor for providing a density signal and a mass flow rate signal for a mixture of the process fluid and the carrier fluid. The mass flow controller provided includes an outlet valve for controlling a mass flow rate of the mixture that is output by the mass flow controller as well as a controller for operating the inlet valve based on the density signal and for operating the outlet valve based on the mass flow rate signal.
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