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Patent Agency Ranking
公开(公告)号：US11860016B2
公开(公告)日：2024-01-02
申请号：US17042059
申请日：2019-03-28
Applicant: LAM RESEARCH CORPORATION
Inventor： Dennis Smith , Peter Reimer , Sudhakar Gopalakrishnan
CPC classification number: G01F1/8445 , G01F1/8422 , G01F1/8427 , G01F1/8431 , G01F15/005 , G01F15/125 , G01N9/32 , H01L21/67253 , G05D7/0688
Abstract: A mass flow controller assembly includes a housing defining a cavity, a plurality of internal passages, a first inlet, a first outlet, a second inlet, and a second outlet. A valve is connected to the housing, has an inlet fluidly coupled to the second outlet of the housing and an outlet fluidly coupled to the second inlet of the housing. The valve is configured to control fluid flow from the second outlet of the housing to the second inlet of the housing. A microelectromechanical (MEMS) Coriolis flow sensor is arranged in the cavity, includes an inlet fluidly coupled by at least one of the plurality of internal passages to the first inlet of the housing and is configured to measure at least one of a mass flow rate and density of fluid flowing through the MEMS Coriolis flow sensor. An outlet of the MEMS Coriolis flow sensor is fluidly coupled by at least one of the plurality of internal passages to the second outlet of the housing. The second inlet of the housing is fluidly coupled by at least one of the plurality of internal passages to the first outlet of the housing.
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公开(公告)号：US10591934B2
公开(公告)日：2020-03-17
申请号：US15917528
申请日：2018-03-09
Applicant: Lam Research Corporation
Inventor： Sudhakar Gopalakrishnan , Peter Reimer , John Haruff , Dennis Smith
Abstract: Methods and apparatuses for delivering a process gas to a processing chamber are provided. A mass flow controller includes a first flow line for introducing a process fluid and an inlet valve disposed along the first flow line for controlling a flow rate of the process fluid. The mass flow controller includes a second flow line for introducing a carrier fluid into the mass flow controller and a micro-electro-mechanical system (MEMS) Coriolis sensor for providing a density signal and a mass flow rate signal for a mixture of the process fluid and the carrier fluid. The mass flow controller provided includes an outlet valve for controlling a mass flow rate of the mixture that is output by the mass flow controller as well as a controller for operating the inlet valve based on the density signal and for operating the outlet valve based on the mass flow rate signal.
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公开(公告)号：US10655638B2
公开(公告)日：2020-05-19
申请号：US15922857
申请日：2018-03-15
Applicant: Lam Research Corporation
Inventor： Dennis Smith , Peter Reimer
Abstract: A gas pump and processes for preparing the gas pump are presented. The gas pump includes a bottom Holweck stage with internal heaters for cleaning deposits resulting from exhausting gases from a semiconductor manufacturing chamber. One example gas pump includes a turbomolecular stage on a top section of the gas pump and a Holweck stage below the turbomolecular stage. The Holweck stage comprises a rotor element, a stator element with an opening in the center, and one or more heaters. The opening has a substantially cylindrical shape and an inside surface with a plurality of grooves separated by threads. Each heater is situated on a surface of one of the plurality of grooves. The heaters may be turned on to clean the deposits accumulated on the gas pump during the processing of a substrate.
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公开(公告)号：US20190285090A1
公开(公告)日：2019-09-19
申请号：US15922857
申请日：2018-03-15
Applicant: Lam Research Corporation
Inventor： Dennis Smith , Peter Reimer
Abstract: A gas pump and processes for preparing the gas pump are presented. The gas pump includes a bottom Holweck stage with internal heaters for cleaning deposits resulting from exhausting gases from a semiconductor manufacturing chamber. One example gas pump includes a turbomolecular stage on a top section of the gas pump and a Holweck stage below the turbomolecular stage. The Holweck stage comprises a rotor element, a stator element with an opening in the center, and one or more heaters. The opening has a substantially cylindrical shape and an inside surface with a plurality of grooves separated by threads. Each heater is situated on a surface of one of the plurality of grooves. The heaters may be turned on to clean the deposits accumulated on the gas pump during the processing of a substrate.
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公开(公告)号：US20190279888A1
公开(公告)日：2019-09-12
申请号：US15917528
申请日：2018-03-09
Applicant: Lam Research Corporation
Inventor： Sudhakar Gopalakrishnan , Peter Reimer , John Haruff , Dennis Smith
Abstract: Methods and apparatuses for delivering a process gas to a processing chamber are provided. A mass flow controller includes a first flow line for introducing a process fluid and an inlet valve disposed along the first flow line for controlling a flow rate of the process fluid. The mass flow controller includes a second flow line for introducing a carrier fluid into the mass flow controller and a micro-electro-mechanical system (MEMS) Coriolis sensor for providing a density signal and a mass flow rate signal for a mixture of the process fluid and the carrier fluid. The mass flow controller provided includes an outlet valve for controlling a mass flow rate of the mixture that is output by the mass flow controller as well as a controller for operating the inlet valve based on the density signal and for operating the outlet valve based on the mass flow rate signal.
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