公开(公告)号：US09615450B2

公开(公告)日：2017-04-04

申请号：US14080980

申请日：2013-11-15

Applicant: LG CHEM, LTD.

Inventor： Ji-Young Hwang ,  In-Seok Hwang ,  Dong-Wook Lee ,  Min-Choon Park ,  Seung-Heon Lee ,  Sang-Ki Chun ,  Yong-Koo Son ,  Beom-Mo Koo

IPC: H05K1/02 ,  H05K3/10 ,  G06F3/045 ,  H01L31/0224 ,  H05K3/06 ,  G03F7/40 ,  H05K3/00

CPC classification number: H05K1/0296 ,  C23F1/02 ,  G03F7/40 ,  G06F3/045 ,  G06F2203/04103 ,  H01L31/022425 ,  H05K3/0079 ,  H05K3/061 ,  H05K3/10 ,  H05K2203/0108 ,  H05K2203/0143 ,  H05K2203/0537 ,  H05K2203/0571 ,  H05K2203/1105 ,  H05K2203/1184 ,  Y02E10/50 ,  Y10T29/49155 ,  Y10T29/49156

Abstract: The present invention provides a method for manufacturing a conductive pattern, comprising the steps of: a) forming a conductive film on a substrate; b) forming an etching resist pattern on the conductive film; and c) forming a conductive pattern having a smaller line width than a width of the etching resist pattern by over-etching the conductive film by using the etching resist pattern, and a conductive pattern manufactured by using the same. According to the exemplary embodiment of the present invention, it is possible to effectively and economically provide a conductive pattern having a ultrafine line width.

公开(公告)号：US09524043B2

公开(公告)日：2016-12-20

申请号：US14518464

申请日：2014-10-20

Applicant: LG CHEM, LTD.

Inventor： Ji-Young Hwang ,  In-Seok Hwang ,  Sang-Ki Chun ,  Dong-Wook Lee ,  Yong-Koo Son ,  Min-Choon Park ,  Seung-Heon Lee ,  Beom-Mo Koo ,  Young-Jun Hong ,  Ki-Hwan Kim ,  Su-Jin Kim ,  Hyeon Choi

IPC: B44C1/22 ,  H01H13/70 ,  G06F3/041 ,  G06F3/044 ,  G06F3/045 ,  H05K3/06 ,  H05K3/46

CPC classification number: G06F3/041 ,  G06F3/044 ,  G06F3/045 ,  G06F2203/04103 ,  G06F2203/04112 ,  H05K3/061 ,  H05K3/4611

Abstract: The present invention provides a method of manufacturing a touch screen, comprising the steps of: a) forming a conductive layer on a substrate; b) forming an etching resist pattern on the conductive layer; and c) forming a conductive pattern having a line width smaller than the line width of the etching resist pattern by over-etching the conductive layer by using the etching resist pattern and a touch screen manufactured by the method. According to the present invention, a touch screen comprising a conductive pattern having an ultrafine line width can be economically and efficiently provided.

Abstract translation: 本发明提供一种制造触摸屏的方法，包括以下步骤：a）在基片上形成导电层; b）在导电层上形成抗蚀剂图案; 以及c）通过使用所述抗蚀剂图案和由所述方法制造的触摸屏过度蚀刻所述导电层，形成具有小于所述抗蚀剂图案的线宽的线宽的导电图案。 根据本发明，可以经济有效地提供包括具有超细线宽度的导电图案的触摸屏。

公开(公告)号：US20140151109A1

公开(公告)日：2014-06-05

申请号：US14080980

申请日：2013-11-15

Applicant: LG CHEM, LTD.

Inventor： Ji-Young Hwang ,  In-Seok Hwang ,  Dong-Wook Lee ,  Min-Choon Park ,  Seung-Heon Lee ,  Sang-Ki Chun ,  Yong-Koo Son ,  Beom-Mo Koo

IPC: H05K1/02 ,  H05K3/10

CPC classification number: H05K1/0296 ,  C23F1/02 ,  G03F7/40 ,  G06F3/045 ,  G06F2203/04103 ,  H01L31/022425 ,  H05K3/0079 ,  H05K3/061 ,  H05K3/10 ,  H05K2203/0108 ,  H05K2203/0143 ,  H05K2203/0537 ,  H05K2203/0571 ,  H05K2203/1105 ,  H05K2203/1184 ,  Y02E10/50 ,  Y10T29/49155 ,  Y10T29/49156

Abstract: The present invention provides a method for manufacturing a conductive pattern, comprising the steps of: a) forming a conductive film on a substrate; b) forming an etching resist pattern on the conductive film; and c) forming a conductive pattern having a smaller line width than a width of the etching resist pattern by over-etching the conductive film by using the etching resist pattern, and a conductive pattern manufactured by using the same. According to the exemplary embodiment of the present invention, it is possible to effectively and economically provide a conductive pattern having a ultrafine line width.

Abstract translation: 本发明提供一种制造导电图案的方法，包括以下步骤：a）在基片上形成导电膜; b）在导电膜上形成抗蚀剂图案; 以及c）通过使用所述抗蚀剂图案对所述导电膜进行过蚀刻来形成具有比所述抗蚀剂图案的宽度小的线宽的导电图案，以及通过使用所述导电图案制造的导电图案。 根据本发明的示例性实施例，可以有效和经济地提供具有超细线宽度的导电图案。