公开(公告)号：US20120315762A1

公开(公告)日：2012-12-13

申请号：US13315143

申请日：2011-12-08

申请人： LI JIANG ,  Mingqi Li ,  Pulei Zhu

发明人： LI JIANG ,  Mingqi Li ,  Pulei Zhu

IPC分类号： H01L21/306

CPC分类号： H01L29/495 ,  H01L21/02074 ,  H01L21/02244 ,  H01L21/28079 ,  H01L21/3212

摘要： The present invention discloses a method for fabricating semiconductor devices. After removing excessive aluminium to form aluminium gates through a chemical mechanical planarization (CMP) process, the exposed surfaces of the aluminium gates are oxidized with H2O2 solution to form a film of alumina, and the semiconductor device is cleaned.

摘要翻译： 本发明公开了半导体器件的制造方法。 在通过化学机械平坦化（CMP）工艺除去过量的铝以形成铝门之后，铝浇口的暴露表面用H 2 O 2溶液氧化以形成氧化铝膜，并且清洁半导体器件。

公开(公告)号：US20120164922A1

公开(公告)日：2012-06-28

申请号：US13163667

申请日：2011-06-17

申请人： LI JIANG ,  Mingqi Li

发明人： LI JIANG ,  Mingqi Li

IPC分类号： B24B53/00

CPC分类号： B24B53/017

摘要： A method for cleaning a polishing pad includes dispensing a first amount of deionized water on the polishing pad; cleaning the polishing pad with an acidity/alkalinity solution after dispensing the first amount of deionized water on the polishing pad; rinsing the polishing pad with a second amount of deionized water after cleaning the polishing pad with the acidity/alkalinity solution; removing the acidity/alkalinity solution from the polishing pad. In a subsequent CMP process, the method includes polishing a GST material device for obtaining an improved performance of the GST material device.

摘要翻译： 一种用于清洁抛光垫的方法包括：在抛光垫上分配第一量的去离子水; 在抛光垫上分配第一量的去离子水后，用酸度/碱度溶液清洗抛光垫; 用酸度/碱度溶液清洗抛光垫后用第二量的去离子水冲洗抛光垫; 从抛光垫去除酸度/碱度溶液。 在随后的CMP工艺中，该方法包括抛光GST材料装置以获得GST材料装置的改进的性能。

公开(公告)号：US20130105919A1

公开(公告)日：2013-05-02

申请号：US13486994

申请日：2012-06-01

申请人： LI JIANG ,  Mingqi Li ,  Pulei Zhu

发明人： LI JIANG ,  Mingqi Li ,  Pulei Zhu

IPC分类号： H01L29/49 ,  H01L29/40

CPC分类号： H01L29/4966 ,  H01L21/28088 ,  H01L29/401 ,  H01L29/495 ,  H01L29/517 ,  H01L29/518 ,  H01L29/66545

摘要： A semiconductor device and a method for manufacturing the semiconductor device are provided. The semiconductor device uses an aluminum alloy, rather than aluminum, for a metal gate. Therefore, the surface of the high-k metal gate after the CMP is aluminum alloy rather than pure aluminum, which can greatly reduce defects, such as corrosion, pits and damage, in the metal gate and improve reliability of the semiconductor device.

摘要翻译： 提供半导体器件和制造半导体器件的方法。 半导体器件使用铝合金而不是铝合金作为金属栅极。 因此，CMP后的高k金属栅极的表面是铝合金而不是纯铝，这可以大大减少金属栅极中的腐蚀，凹坑和损伤等缺陷，提高半导体器件的可靠性。

公开(公告)号：US20130045581A1

公开(公告)日：2013-02-21

申请号：US13323489

申请日：2011-12-12

申请人： LI JIANG ,  Mingqi Li

发明人： LI JIANG ,  Mingqi Li

IPC分类号： H01L21/336

CPC分类号： H01L21/28123

摘要： The present invention discloses a method of manufacturing semiconductor devices. The method includes a step of performing a chemical mechanical planarization processing on a poly-silicon layer before fabricating a poly-silicon gate such that the poly-silicon gates obtained in subsequent fabrication process are kept at the same height, which thus avoids the silicon nitride residues issue that occurs in the prior art. Therefore, the present invention is capable of enhancing product yield of semiconductor devices and improving device performances.

摘要翻译： 本发明公开了半导体器件的制造方法。 该方法包括在制造多晶硅栅极之前对多晶硅层进行化学机械平面化处理的步骤，使得在随后的制造工艺中获得的多晶硅栅极保持在相同的高度，从而避免了氮化硅 在现有技术中发生的残留问题。 因此，本发明能够提高半导体器件的产量，提高器件性能。

公开(公告)号：US20120164824A1

公开(公告)日：2012-06-28

申请号：US13178455

申请日：2011-07-07

申请人： LI JIANG ,  Mingqi Li

发明人： LI JIANG ,  Mingqi Li

IPC分类号： H01L21/28

CPC分类号： H01L29/66545 ,  H01L29/78

摘要： A method is provided for fabricating a high-K metal gate MOS device. The method includes providing a semiconductor substrate having a surface region, a gate oxide layer on the surface region, a sacrificial gate electrode on the gate oxide layer, and a covering layer on the sacrificial gate electrode, an inter-layer dielectric layer on the semiconductor substrate and the sacrificial gate electrode. The method also includes planarizing the inter-layer dielectric layer to expose a portion of the covering layer atop the sacrificial gate electrode, implanting nitrogen ions into the inter-layer dielectric layer until a depth of implantation is deeper than a thickness of the portion of the covering layer atop the sacrificial gate electrode and polishing the inter-layer dielectric layer to expose a surface of the sacrificial gate electrode, removing the sacrificial gate electrode, and depositing a metal gate.

摘要翻译： 提供了制造高K金属栅极MOS器件的方法。 该方法包括提供具有表面区域，表面区域上的栅极氧化物层，栅极氧化物层上的牺牲栅极电极和牺牲栅电极上的覆盖层的半导体衬底，半导体上的层间电介质层 基板和牺牲栅电极。 该方法还包括平坦化层间电介质层以暴露牺牲栅电极顶部的覆盖层的一部分，将氮离子注入到层间电介质层中，直到植入深度比该部分的厚度更深 覆盖层，并抛光该层间电介质层以暴露牺牲栅电极的表面，去除牺牲栅极电极和沉积金属栅极。

公开(公告)号：US20120270343A1

公开(公告)日：2012-10-25

申请号：US13244196

申请日：2011-09-23

申请人： LI JIANG ,  MINGQI LI

发明人： LI JIANG ,  MINGQI LI

IPC分类号： H01L21/66 ,  H01L21/28

CPC分类号： H01L21/31053 ,  C09G1/04 ,  H01L29/495 ,  H01L29/66545

摘要： A polishing method and a method for forming a gate are provided. The method includes forming a dummy gate on a semiconductor substrate including a sacrificial oxide layer and a polysilicon layer which covers the sacrificial oxide layer, forming spacers around the dummy gate, and successively forming a silicon nitride layer and a dielectric layer covering the silicon nitride layer. The method further includes polishing the dielectric layer until the silicon nitride layer is exposed, polishing the silicon nitride layer on a fixed abrasive pad until the polysilicon layer is exposed by using a polishing slurry with a PH value ranging from 10.5 to 11 and comprising an anionic surfactant or a zwitterionic surfactant. Additionally, the method includes forming an opening after removing the dummy gate, and forming a gate in the opening. The method eliminates potential erosion and dishing caused in the polishing of the silicon nitride layer.

摘要翻译： 提供了一种用于形成栅极的抛光方法和方法。 该方法包括在包括牺牲氧化物层和覆盖牺牲氧化物层的多晶硅层的半导体衬底上形成伪栅极，在虚拟栅极周围形成间隔物，并且依次形成氮化硅层和覆盖氮化硅层的电介质层 。 该方法还包括抛光电介质层，直到暴露氮化硅层，在固定的研磨垫上抛光氮化硅层，直到通过使用pH值范围为10.5至11的抛光浆料暴露多晶硅层，并且包含阴离子 表面活性剂或两性离子表面活性剂。 此外，该方法包括在去除虚拟门之后形成开口，并在开口中形成栅极。 该方法消除了在氮化硅层的抛光中引起的潜在的腐蚀和凹陷。

公开(公告)号：US20130242178A1

公开(公告)日：2013-09-19

申请号：US13664607

申请日：2012-10-31

申请人： CHIH-KUANG CHANG ,  DONG-HAI LI ,  LI JIANG ,  JIAN-HUA LIU ,  DONG-SHENG LIU

发明人： CHIH-KUANG CHANG ,  DONG-HAI LI ,  LI JIANG ,  JIAN-HUA LIU ,  DONG-SHENG LIU

IPC分类号： G02B27/12 ,  H04N5/225

CPC分类号： G01B11/00

摘要： An optical module includes a first sleeve, a second sleeve, a connecting member and a beam splitter. The first sleeve defines a first hollow cavity and includes a first light source and a pattern plate. The second sleeve defines a second hollow cavity and a second light source. The connecting member is connected to the first sleeve and the second sleeve, and communicates with the first hollow cavity and the second hollow cavity. The beam splitter is positioned in the connecting member. Light from the first light source passes through the pattern plate, and the beam splitter, light from the second light source passes through the beam splitter, the beam splitter refracts the light from the first light source and the second light source to a tested workpiece.

摘要翻译： 光学模块包括第一套筒，第二套筒，连接件和分束器。 第一套管限定第一中空腔并且包括第一光源和图案板。 第二套管限定第二中空腔和第二光源。 连接构件连接到第一套筒和第二套筒，并与第一中空腔和第二中空腔连通。 分束器位于连接构件中。 来自第一光源的光通过图案板，并且分束器，来自第二光源的光穿过分束器，分束器将来自第一光源和第二光源的光折射到被测试的工件。

公开(公告)号：US20130173216A1

公开(公告)日：2013-07-04

申请号：US13553799

申请日：2012-07-19

申请人： CHIH-KUANG CHANG ,  ZHONG-KUI YUAN ,  LI JIANG ,  ZHI-JUN ZOU ,  XIAO-GUANG XUE

发明人： CHIH-KUANG CHANG ,  ZHONG-KUI YUAN ,  LI JIANG ,  ZHI-JUN ZOU ,  XIAO-GUANG XUE

IPC分类号： G06F17/18

CPC分类号： G05B1/00 ,  G06T1/0007 ,  G06T15/00 ,  G06T17/20 ,  G06T17/205 ,  G06T2207/30164

摘要： In a method for processing a point cloud using a computing device, a straight line fitted by the point cloud comprising border points is determined as a benchmark line. An inflection point in the point cloud of the benchmark line is determined. If the vertical distance of the inflection point is not greater than the preset filtration value, needless border points in the point cloud are deleted and a remainder point cloud is obtained. If the vertical distance between the inflection point and the benchmark line is greater than a filtration value, the point cloud is divided into two sub-point clouds, and the one sub-point cloud having border points less than the preset number is deleted, and the other sub-point cloud is set as a remainder point cloud.

摘要翻译： 在使用计算装置处理点云的方法中，由包括边界点的点云拟合的直线被确定为基准线。 确定基准线的点云中的拐点。 如果拐点的垂直距离不大于预设的过滤值，则点云中不必要的边界点被删除，并获得剩余点云。 如果拐点和基准线之间的垂直距离大于过滤值，则点云被划分为两个子点云，并且具有小于预设数字的边界点的一个子点云被删除，并且 另一个子点云被设置为余点云。

公开(公告)号：US20130169975A1

公开(公告)日：2013-07-04

申请号：US13594857

申请日：2012-08-26

申请人： CHIH-KUANG CHANG ,  LI JIANG ,  ZHONG-KUI YUAN ,  DONG-HAI LI ,  ZHI-JUN ZOU

发明人： CHIH-KUANG CHANG ,  LI JIANG ,  ZHONG-KUI YUAN ,  DONG-HAI LI ,  ZHI-JUN ZOU

IPC分类号： G01B11/24

CPC分类号： G01B11/028 ,  G01B11/03 ,  G06T7/13 ,  G06T2207/30116 ,  G06T2207/30136

摘要： In a method for scanning edges of an object using a computing device, the computing device is connected to an image measuring machine including an image capturing device. A start point, an end point, a scan direction, and a scan distance interval are set. Scan points on the edges of the object are determined. For each scan point, the computing device aims the image capturing device at the scan point, controls the image capturing device to capture images of the object at different depths, and records focal points. Definition values of the images are calculated and an image with a highest definition value is determined. A focal point corresponds to the image with the highest definition value and so coordinates of the scan point are determined. Scanned edges of the object are formed based on all the scan points.

摘要翻译： 在使用计算装置扫描对象的边缘的方法中，计算装置连接到包括图像捕获装置的图像测量机。 设置起始点，终点，扫描方向和扫描距离间隔。 确定物体边缘上的扫描点。 对于每个扫描点，计算设备将图像捕获设备瞄准扫描点，控制图像捕获设备以不同深度捕获对象的图像，并记录焦点。 计算图像的定义值，并确定具有最高定义值的图像。 焦点对应于具有最高定义值的图像，因此确定扫描点的坐标。 基于所有扫描点形成物体的扫描边缘。

公开(公告)号：US20130091131A1

公开(公告)日：2013-04-11

申请号：US13267163

申请日：2011-10-06

申请人： JAKUB SZYMANSKI ,  LI JIANG ,  ALEKSANDER KOLCZ

发明人： JAKUB SZYMANSKI ,  LI JIANG ,  ALEKSANDER KOLCZ

IPC分类号： G06F17/30

CPC分类号： G06F16/353

摘要： Systems and methods are provided for classifying a search query. A first group of query classifiers can be used to evaluate a query relative to various subject matter domains. The evaluation results from the first group of domain classifiers can then be used by a second group of meta-classifiers. The meta-classifiers are associated with meta-classifier categories that may correspond to a domain or that may correspond to a plurality of domains. The assigned meta-classifier category for a query can be used in any convenient manner, such as by triggering additional uses of the search query to match images or other alternative types of documents, or such as by allowing a subject matter domain to be assigned to the query.

摘要翻译： 提供了用于对搜索查询进行分类的系统和方法。 第一组查询分类器可用于评估相对于各主题域的查询。 第一组域分类器的评估结果可以由第二组元分类器使用。 元分类器与可能对应于域或可对应于多个域的元分类器类别相关联。 用于查询的分配的元分类器类别可以以任何便利的方式使用，例如通过触发搜索查询的附加使用来匹配图像或其他替代类型的文档，或者例如通过允许将主题域分配给 查询。