Circuit layout for improved performance while preserving or improving density
    1.
    发明授权
    Circuit layout for improved performance while preserving or improving density 有权
    电路布局,以提高性能,同时保持或提高密度

    公开(公告)号:US07301182B1

    公开(公告)日:2007-11-27

    申请号:US11226695

    申请日:2005-09-13

    IPC分类号: H01L27/10

    CPC分类号: H01L27/0207 H01L27/11803

    摘要: In one embodiment, a circuit may be formed by forming at least one bent-gate output stage transistor and at least one bent-gate input stage transistor. The bent-gate output stage transistor may be electrically isolated from an input to the bent-gate input stage transistor by forming at least one bent-gate grounded-gate transistor between the bent-gate output stage transistor and the input to the bent-gate input stage transistor.

    摘要翻译: 在一个实施例中,可以通过形成至少一个弯曲栅极输出级晶体管和至少一个弯曲栅极输入级晶体管形成电路。 弯曲栅极输出级晶体管可以通过在弯曲栅极输出级晶体管和弯曲栅极的输入之间形成至少一个弯曲栅极接地栅晶体管而与输入到弯曲栅极输入级晶体管的电隔离 输入级晶体管。

    Electrostatic discharge protection circuits
    2.
    发明申请
    Electrostatic discharge protection circuits 审中-公开
    静电放电保护电路

    公开(公告)号:US20050213271A1

    公开(公告)日:2005-09-29

    申请号:US10808627

    申请日:2004-03-24

    IPC分类号: H02H9/00 H02H9/04

    CPC分类号: H02H9/046

    摘要: Systems and methods disclosed provide electrostatic discharge protection. For example, in accordance with an embodiment of the present invention, a circuit is disclosed having a diode string and a transistor in a cascode configuration that provides electrostatic discharge (ESD) protection and can operate in a mixed voltage environment.

    摘要翻译: 所公开的系统和方法提供静电放电保护。 例如,根据本发明的实施例,公开了一种电路,其具有二极管串和提供静电放电(ESD)保护并可在混合电压环境中工作的共源共栅配置中的晶体管。

    Voltage limited EEPROM device and process for fabricating the device
    4.
    发明授权
    Voltage limited EEPROM device and process for fabricating the device 失效
    电压限制EEPROM器件和制造器件的工艺

    公开(公告)号:US06846714B1

    公开(公告)日:2005-01-25

    申请号:US10263507

    申请日:2002-10-03

    摘要: An EEPROM device having voltage limiting charge pumping circuitry includes charge pumping circuitry that limits the voltage supplied to the high voltage transistors to levels below the breakdown field of the tunnel oxide layer. The EEPROM device includes a substrate having a programming region, a tunnel region, a sensing region, and a low voltage region. A first oxide layer having a first thickness overlies the tunnel region and the sensing region. A second oxide layer having a second thickness overlies the low voltage region. The first oxide thickness is greater than the second oxide thickness. A charge pumping circuit is coupled to the programming region and to the tunnel region. The charge pumping circuit impresses a voltage level across the first oxide layer that is below the field breakdown voltage of first oxide layer. A process for fabricating the device is also provided.

    摘要翻译: 具有电压限制电荷泵浦电路的EEPROM器件包括电荷泵浦电路,其将提供给高压晶体管的电压限制在低于隧道氧化物层的击穿场的水平。 EEPROM器件包括具有编程区域,隧道区域,感测区域和低电压区域的衬底。 具有第一厚度的第一氧化物层覆盖隧道区域和感测区域。 具有第二厚度的第二氧化物层覆盖在低电压区域上。 第一氧化物厚度大于第二氧化物厚度。 电荷泵浦电路耦合到编程区域和隧道区域。 电荷泵浦电路使第一氧化物层的电压电平低于第一氧化物层的场击穿电压。 还提供了一种用于制造该装置的工艺。

    EEPROM device with voltage-limiting charge pump circuit
    5.
    发明授权
    EEPROM device with voltage-limiting charge pump circuit 有权
    具有限压电荷泵电路的EEPROM器件

    公开(公告)号:US07242053B1

    公开(公告)日:2007-07-10

    申请号:US11036738

    申请日:2005-01-14

    IPC分类号: H01L29/788

    摘要: In one embodiment, an EEPROM device having voltage limiting charge pumping circuitry includes charge-pumping circuitry that limits the voltage supplied to the high voltage transistors to levels below the breakdown field of the tunnel oxide layer. The EEPROM device includes a substrate having a programming region, a tunnel region, a sensing region, and a low voltage region. A first oxide layer having a first thickness overlies the tunnel region and the sensing region. A second oxide layer having a second thickness overlies the low voltage region. The first oxide thickness is greater than the second oxide thickness. A charge pumping circuit is coupled to the programming region and to the tunnel region. The charge pumping circuit impresses a voltage level across the first oxide layer that is below the field breakdown voltage of first oxide layer.

    摘要翻译: 在一个实施例中,具有电压限制电荷泵浦电路的EEPROM器件包括电荷泵浦电路,其将提供给高压晶体管的电压限制在低于隧道氧化物层的击穿场的水平。 EEPROM器件包括具有编程区域,隧道区域,感测区域和低电压区域的衬底。 具有第一厚度的第一氧化物层覆盖隧道区域和感测区域。 具有第二厚度的第二氧化物层覆盖在低电压区域上。 第一氧化物厚度大于第二氧化物厚度。 电荷泵浦电路耦合到编程区域和隧道区域。 电荷泵浦电路使第一氧化物层的电压电平低于第一氧化物层的场击穿电压。