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    Etching agent, etching method and liquid for preparing etching agent
    8.
    发明授权
    Etching agent, etching method and liquid for preparing etching agent 有权
    蚀刻剂，蚀刻方法和制备蚀刻剂的液体

    公开(公告)号：US08513139B2

    公开(公告)日：2013-08-20

    申请号：US12808903

    申请日：2008-12-19

    申请人： Osamu Matsuda ,  Nobuyuki Kikuchi ,  Ichiro Hayashida ,  Satoshi Shirahata

    发明人： Osamu Matsuda ,  Nobuyuki Kikuchi ,  Ichiro Hayashida ,  Satoshi Shirahata

    IPC分类号： H01L21/302 ,  H01L21/461

    CPC分类号： H01L21/30604 ,  C23F1/38 ,  C23F1/44 ,  H01L21/32134

    摘要： The present invention is directed to provide an etching agent for a semiconductor substrate, which is capable of etching a titanium (Ti)-based metal film or a tungsten (W)-based metal film on a semiconductor substrate and an etching method using relevant etching agent, and relates to a liquid for preparing the etching agent for a semiconductor substrate composed of a solution comprising (A) hydrogen peroxide, (B) a phosphonic acid chelating agent having a hydroxyl group, (C) a basic compound, and (D-1) a copper anticorrosive and/or (D-2) 0.01 to 3% by weight of two or more kinds of anion species other than phosphonic acid chelating agents having a hydroxyl group, in which anion species have no oxidizing power, an etching method characterized by etching a titanium (Ti)-based metal film or a tungsten (W)-based metal film on a semiconductor substrate using relevant etching agent for a semiconductor substrate, further, a solution comprising (B) a phosphonic acid chelating agent having a hydroxyl group, (C) a basic compound, and (D-1) a copper anticorrosive and/or (D-2) anion species other than phosphonic acid chelating agents having a hydroxyl group, in which anion species have no oxidizing power.

    摘要翻译： 本发明旨在提供一种能够在半导体衬底上蚀刻基于钛（Ti）的金属膜或基于钨（W）的金属膜的半导体衬底的蚀刻剂和使用相关蚀刻的蚀刻方法 并且涉及一种用于制备半导体衬底蚀刻剂的液体，该半导体衬底由包含（A）过氧化氢，（B）具有羟基的膦酸螯合剂，（C）碱性化合物和（D） -1）铜防腐剂和/或（D-2）0.01〜3重量％的除了具有羟基的膦酸螯合剂以外的两种或更多种阴离子物质，其中阴离子种类不具有氧化能力，蚀刻 其特征在于，使用相关的半导体衬底蚀刻剂在半导体衬底上蚀刻基于钛（Ti）的金属膜或基于钨（W））的金属膜，此外，还包括（B）膦酸螯合剂的溶液，所述膦酸螯合剂具有 一个 羟基，（C）碱性化合物和（D-1）除了具有羟基的膦酸螯合剂以外的铜防腐和/或（D-2）阴离子物质，其中阴离子种类不具有氧化能力。

    Integrated confocal optical pick-up head with a hologram and a polarizer mounted on each side of a transparent heat sink
    10.
    发明授权
    Integrated confocal optical pick-up head with a hologram and a polarizer mounted on each side of a transparent heat sink 失效
    具有全息图的集成共焦光学拾取头和安装在透明散热器两侧的偏振器

    公开(公告)号：US5703861A

    公开(公告)日：1997-12-30

    申请号：US605842

    申请日：1996-02-26

    申请人： Osamu Matsuda

    发明人： Osamu Matsuda

    IPC分类号： G11B11/10 ,  G11B7/09 ,  G11B7/12 ,  G11B7/13 ,  G11B7/135 ,  G11B11/105 ,  H01L31/10 ,  H01S3/06 ,  H01S3/1055 ,  H01S5/00 ,  H01S3/18

    CPC分类号： G11B7/1353 ,  G11B11/10543 ,  G11B7/123 ,  G11B7/133 ,  G11B7/0901 ,  G11B7/0912

    摘要： Light is emitted from a light-emitting element toward an irradiated medium, and returning light reflected by the irradiated medium is diffracted by a hologram device. A polarizer polarizes the light diffracted by the hologram device to produce first polarized light that has passed through the polarizer and second polarized light that has been reflected by the polarizer. The first polarized light is detected by a first light-detecting element, and the second polarized light is detected by a second light-detecting element. A magnetooptical signal is generated as the difference between the intensities of the first and second polarized lights which are detected respectively by the first and second light-detecting elements.

    摘要翻译： 从发光元件向照射介质发射光，并且由被照射介质反射的返回光被全息元件衍射。 偏振器使由全息装置衍射的光偏振，产生已经通过偏振器的第一偏振光和被偏振器反射的第二偏振光。 第一偏振光由第一光检测元件检测，第二偏振光由第二光检测元件检测。 产生磁光信号作为分别由第一和第二光检测元件检测的第一和第二偏振光的强度之差。