公开(公告)号：US07463413B2

公开(公告)日：2008-12-09

申请号：US11337807

申请日：2006-01-24

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： F21V9/04 ,  F21V9/06 ,  G02B5/08 ,  G02B5/20

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： 多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。 该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。 因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。 可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

公开(公告)号：US07145132B2

公开(公告)日：2006-12-05

申请号：US11020674

申请日：2004-12-27

申请人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： H01S1/00 ,  G03B27/52

CPC分类号： G03F7/70058 ,  G03F7/70916 ,  G03F7/70933

摘要： A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.

摘要翻译： 用于捕获由光刻设备中的辐射源产生辐射而释放的碎屑颗粒的碎片捕集系统包括第一和第二组通道。 第一组的每个通道使来自辐射源的辐射能够通过其传播并具有用于捕获碎屑颗粒的内壁。 相对于辐射的传播方向，第二组通道位于第一组的下游。 第二组的每个通道使得来自辐射源的辐射也能够通过其传播，并且具有用于捕获碎屑颗粒的内壁。 气体供应和排气被配置为在第一组和第二组通道之间提供气流，其具有基本上横跨辐射源的辐射的传播方向的净流动方向。

公开(公告)号：US07706057B2

公开(公告)日：2010-04-27

申请号：US12230384

申请日：2008-08-28

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： F21V9/04 ,  F21V9/06 ,  G02B5/08 ,  G02B5/20

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

摘要翻译： 多层反射镜包括多层堆叠。 多层堆叠包括多层交叠层，多层叠层顶层和布置在多层堆叠上的光谱过滤器顶层。 光谱过滤器顶层包括第一光谱纯度增强层，其包括第一材料m1并且具有第一层厚度d1，包括第二材料m2并具有第二层厚度d2的中间层。 中间层布置在多层堆叠顶层上。 第一种材料选自SiN，Si3N4，SiO2，ZnS，Te，金刚石，CsI，Se，SiC，无定形碳，MgF2，CaF2，TiO2，Ge，PbF2，ZrO2，BaTiO3，LiF或NaF。 第二材料包括与第一材料不同的材料，并且d1 + d2具有在1.5和40nm之间的厚度。

公开(公告)号：US07196343B2

公开(公告)日：2007-03-27

申请号：US11025851

申请日：2004-12-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder

IPC分类号： G03F7/20 ,  G02B27/14

CPC分类号： G03F7/70958 ,  G02B1/113 ,  G02B5/0891 ,  G03F7/70575 ,  G21K1/06 ,  G21K2201/067

摘要： An optical element including an anti-reflection (AR) coating is configured to reflect Extreme-Ultra-Violet (EUV) radiation only.

摘要翻译： 包括抗反射（AR）涂层的光学元件被配置为仅反射极紫外（EUV）辐射。

公开(公告)号：US20080316595A1

公开(公告)日：2008-12-25

申请号：US12230384

申请日：2008-08-28

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： G02B5/28 ,  G02B5/26 ,  G02B5/22

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

摘要翻译： 多层反射镜包括多层堆叠。 多层堆叠包括多层交叠层，多层叠层顶层和布置在多层堆叠上的光谱过滤器顶层。 光谱过滤器顶层包括第一光谱纯度增强层，其包括第一材料m1并且具有第一层厚度d1，包括第二材料m2并具有第二层厚度d2的中间层。 中间层布置在多层堆叠顶层上。 第一种材料选自SiN，Si3N4，SiO2，ZnS，Te，金刚石，CsI，Se，SiC，无定形碳，MgF2，CaF2，TiO2，Ge，PbF2，ZrO2，BaTiO3，LiF或NaF。 第二材料包括与第一材料不同的材料，并且d1 + d2具有在1.5和40nm之间的厚度。

公开(公告)号：US07468521B2

公开(公告)日：2008-12-23

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21G5/00 ,  G01J3/10 ,  G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US07106832B2

公开(公告)日：2006-09-12

申请号：US11031535

申请日：2005-01-10

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21K3/00

CPC分类号： G03F7/70916

摘要： Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.

摘要翻译： 由辐射源发射并从辐射源朝向用于处理来自辐射源的辐射的处理系统移动的颗粒被从辐射源通过辐射源发射的预定横截面传播的辐射滤出，该辐射源由过滤系统 。 过滤器系统包括多个箔片和运送器，用于沿着在光束内延伸的轨迹传送箔片，使得箔片截取光束内的颗粒。 输送器布置成通过沿着轨迹的至少一部分的箔片的基本上平移的运动来运输箔片。

公开(公告)号：US08139200B2

公开(公告)日：2012-03-20

申请号：US13028795

申请日：2011-02-16

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.

摘要翻译： 一种光刻设备，包括被配置为支撑图案形成装置的支撑件; 被配置为保持基板的基板台; 投影系统，被配置为将通过图案形成装置赋予辐射束的图案投影到基板的目标部分上; 以及第一多层反射镜和第二多层反射镜，所述第一多层反射镜和所述第二多层次要沿着所述辐射束的路径布置，所述第一多层次要层和所述第二多层反射镜 每个反射镜在极紫外波长范围内具有至少约50％的反射率，并且第一多层反射镜被配置为减少具有第一波长范围波长的辐射，而第二多层次镜被配置为减少具有波长的辐射 与第一波长范围不同的第二波长范围，其中第一波长范围和第二波长范围在极紫外波长范围之外。

公开(公告)号：US07692169B2

公开(公告)日：2010-04-06

申请号：US11493848

申请日：2006-07-27

申请人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： H05G2/00

CPC分类号： G03F7/70916 ,  H05G2/001

摘要： A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

摘要翻译： 提供了从辐射源传播的辐射束中过滤颗粒的方法。 该方法包括将辐射束通过过滤器，该过滤器具有辐射束内的第一部分和位于辐射束之外的第二部分，用第一部分捕获辐射束中的至少一些颗粒，并移动 所述过滤器在横向于所述辐射束的方向上，使得所述第一部分移动到所述辐射束的外部，并且所述第二部分被移动到所述辐射束中。

公开(公告)号：US20100320397A1

公开(公告)日：2010-12-23

申请号：US12864910

申请日：2009-01-26

申请人： Marius Iosif Boamfa ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

发明人： Marius Iosif Boamfa ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

IPC分类号： G01N21/64 ,  G01N21/55

CPC分类号： G01N21/648

摘要： An illumination detection system comprises an excitation radiation source and associated radiation processing arrangement, and a focusing arrangement for focusing the excitation radiation from the radiation processing arrangement onto an analysis region of a sample. A radiation collection arrangement collects radiation from the analysis region of the sample resulting from the excitation, and a detector detects the collected radiation. The focused excitation radiation comprises an excitation line which is evanescent in the sample. This combines the advantages of line scanning (reduced analysis time) and evanescent excitation (reduced background signal) and therewith enables increased measurement speed and precision for point of care application.

摘要翻译： 照明检测系统包括激发辐射源和相关联的辐射处理装置，以及用于将来自辐射处理装置的激发辐射聚焦到样品的分析区域上的聚焦装置。 辐射收集装置从由激发产生的样品的分析区域收集辐射，并且检测器检测收集的辐射。 聚焦的激发辐射包括在样品中消逝的激发线。 这结合了线扫描的优点（减少的分析时间）和ev逝激发（降低的背景信号），并且因此可以提高点护理应用的测量速度和精度。