公开(公告)号：US10418231B2

公开(公告)日：2019-09-17

申请号：US14622597

申请日：2015-02-13

Applicant: Leybold Optics GmbH

Inventor： Michael Scherer ,  Jurgen Pistner ,  Walter Lehnert ,  Harro Hagedorn ,  Gerd Deppisch ,  Mario Roder

IPC: H01J37/34 ,  C23C14/00 ,  C23C14/02 ,  C23C14/08 ,  C23C14/54

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

公开(公告)号：US20150162173A1

公开(公告)日：2015-06-11

申请号：US14622597

申请日：2015-02-13

Applicant: Leybold Optics GmbH

Inventor： Michael Scherer ,  Jurgen Pistner ,  Walter Lehnert ,  Harro Hagedorn ,  Gerd Deppisch ,  Mario Roder

IPC: H01J37/34

CPC classification number: H01J37/3473 ,  C23C14/0078 ,  C23C14/0094 ,  C23C14/024 ,  C23C14/08 ,  C23C14/547 ,  H01J37/34 ,  H01J37/3405 ,  H01J37/3476 ,  H01J2237/3321

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract translation: 一种通过使用溅射装置借助于残余气体在真空室中在可位移的基板上产生涂层来将多层涂层的光学损耗降低到预定值的方法。 通过在溅射装置的区域中添加具有预定化学计量不足的反应性组分将反应性沉积在衬底上。 将具有沉积的涂层的基板置于等离子体源附近，该等离子体源位于距离溅射装置预定距离的真空室中。 等离子体源的等离子体作用改变了涂层的结构和/或化学计量，优选地通过加入预定量的反应组分来减少涂层的光学损耗。