公开(公告)号：US20140329095A1

公开(公告)日：2014-11-06

申请号：US14348417

申请日：2012-09-28

Applicant: Domenic V. Planta ,  Leybold Optics GmbH

Inventor： Harro Hagedorn ,  Jurgen Pistner ,  Michael Klosch-Trageser ,  Michael Scherer

IPC: H01J37/32 ,  C23C14/02 ,  C23C14/34 ,  H01J37/34 ,  C23C14/58

CPC classification number: H01J37/32082 ,  C23C14/0036 ,  C23C14/021 ,  C23C14/022 ,  C23C14/024 ,  C23C14/34 ,  C23C14/505 ,  C23C14/52 ,  C23C14/568 ,  C23C14/5826 ,  H01J37/32733 ,  H01J37/32779 ,  H01J37/32889 ,  H01J37/34 ,  H01J37/3408 ,  Y10T428/31504

Abstract: The invention relates to an apparatus (1) for producing a reflection-reducing layer on a surface (21) of a plastics substrate (20). The apparatus comprises a first sputtering device (3) for applying a base layer (22) to the surface (21) of the plastics substrate (20), a plasma source (4) for plasma-etching the coated substrate surface (21), and a second sputtering device (5) for applying a protective layer (24) to the substrate surface (21). These processing devices (3, 4, 5) are arranged jointly in a vacuum chamber (2), which has inlets (8) for processing gases. In order to move the substrate (20) between the processing devices (3, 4, 5) in the interior of the vacuum chamber (2), a conveying apparatus (10) is provided which is preferably in the form of a rotary table (11).—Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface (21) of the plastics substrate (20).

Abstract translation: 本发明涉及一种用于在塑料基板（20）的表面（21）上制造反射层的装置（1）。 该设备包括用于将基底层（22）施加到塑料基底（20）的表面（21）的第一溅射装置（3），用于等离子体蚀刻涂覆的基底表面（21）的等离子体源（4） 以及用于将保护层（24）施加到所述基板表面（21）的第二溅射装置（5）。 这些处理装置（3,4,5）共同设置在具有用于处理气体的入口（8）的真空室（2）中。 为了将基板（20）移动到真空室（2）的内部的处理装置（3,4,5）之间，提供了输送装置（10），其优选地为旋转台 此外，本发明涉及在塑料基板（20）的表面（21）上制造这种反射减少层的方法。

公开(公告)号：US09983333B2

公开(公告)日：2018-05-29

申请号：US14744138

申请日：2015-06-19

Applicant: LEYBOLD OPTICS GMBH

Inventor： Michael Scherer

IPC: C09D1/00 ,  G02B1/115 ,  C04B35/48 ,  C04B35/622 ,  C23C14/08 ,  C23C14/35

CPC classification number: G02B1/115 ,  C04B35/481 ,  C04B35/62222 ,  C09D1/00 ,  C23C14/08 ,  C23C14/083 ,  C23C14/354

Abstract: The invention concerns an optical coating (3, 3′), having a high refractive index and good optical properties (i.e., low absorption and scatter) and limited internal stresses in a spectral range extending from the visible to the near UV range (i.e., up to a wavelength of 220 nm). The coating (3, 3′) according to the invention consists of a hafnium- or zirconium-containing oxide HfxSiyOz or ZrxSiyOz containing an silicon fraction (y) between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %.

公开(公告)号：US20150285957A1

公开(公告)日：2015-10-08

申请号：US14744138

申请日：2015-06-19

Applicant: LEYBOLD OPTICS GMBH

Inventor： Michael Scherer

IPC: G02B1/115 ,  C23C14/35 ,  C09D1/00 ,  C23C14/08

CPC classification number: G02B1/115 ,  C04B35/481 ,  C04B35/62222 ,  C09D1/00 ,  C23C14/08 ,  C23C14/083 ,  C23C14/354

Abstract: The invention concerns an optical coating (3, 3′), having a high refractive index and good optical properties (i.e., low absorption and scatter) and limited internal stresses in a spectral range extending from the visible to the near UV range (i.e., up to a wavelength of 220 nm). The coating (3, 3′) according to the invention consists of a hafnium- or zirconium-containing oxide HfxSiyOz or ZrxSiyOz containing an silicon fraction (y) between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %.

Abstract translation: 本发明涉及一种具有高折射率和良好的光学性质（即低吸收和散射）以及从可见光范围延伸到近紫外范围的光谱范围内的有限内应力的光学涂层（3,3'）（即， 直到波长为220nm）。 根据本发明的涂层（3,3'）由含有铪或锆的氧化物Hf x Sb y O z或Zr x S y O z z组成，其中硅含量（y）为1at。 ％和10在。 ％，特别是1.5 at。 ％和3在。 ％。

公开(公告)号：US10418231B2

公开(公告)日：2019-09-17

申请号：US14622597

申请日：2015-02-13

Applicant: Leybold Optics GmbH

Inventor： Michael Scherer ,  Jurgen Pistner ,  Walter Lehnert ,  Harro Hagedorn ,  Gerd Deppisch ,  Mario Roder

IPC: H01J37/34 ,  C23C14/00 ,  C23C14/02 ,  C23C14/08 ,  C23C14/54

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

公开(公告)号：US09589768B2

公开(公告)日：2017-03-07

申请号：US14348417

申请日：2012-09-28

Applicant: Leybold Optics GmbH

Inventor： Michael Scherer ,  Jurgen Pistner ,  Harro Hagedorn ,  Michael Klosch-Trageser

IPC: C23F1/00 ,  H01J37/32 ,  C23C14/00 ,  C23C14/02 ,  C23C14/50 ,  C23C14/52 ,  C23C14/56 ,  H01J37/34 ,  C23C14/34 ,  C23C14/58

CPC classification number: H01J37/32082 ,  C23C14/0036 ,  C23C14/021 ,  C23C14/022 ,  C23C14/024 ,  C23C14/34 ,  C23C14/505 ,  C23C14/52 ,  C23C14/568 ,  C23C14/5826 ,  H01J37/32733 ,  H01J37/32779 ,  H01J37/32889 ,  H01J37/34 ,  H01J37/3408 ,  Y10T428/31504

Abstract: The invention relates to an apparatus (1) for producing a reflection-reducing layer on a surface (21) of a plastics substrate (20). The apparatus comprises a first sputtering device (3) for applying a base layer (22) to the surface (21) of the plastics substrate (20), a plasma source (4) for plasma-etching the coated substrate surface (21), and a second sputtering device (5) for applying a protective layer (24) to the substrate surface (21). These processing devices (3, 4, 5) are arranged jointly in a vacuum chamber (2), which has inlets (8) for processing gases. In order to move the substrate (20) between the processing devices (3, 4, 5) in the interior of the vacuum chamber (2), a conveying apparatus (10) is provided which is preferably in the form of a rotary table (11). Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface (21) of the plastics substrate (20).

Abstract translation: 本发明涉及一种用于在塑料基板（20）的表面（21）上制造反射层的装置（1）。 该设备包括用于将基底层（22）施加到塑料基底（20）的表面（21）的第一溅射装置（3），用于等离子体蚀刻涂覆的基底表面（21）的等离子体源（4） 以及用于将保护层（24）施加到所述基板表面（21）的第二溅射装置（5）。 这些处理装置（3,4,5）共同设置在具有用于处理气体的入口（8）的真空室（2）中。 为了将基板（20）移动到真空室（2）的内部的处理装置（3,4,5）之间，提供了输送装置（10），其优选地为旋转台 11）。 此外，本发明涉及一种在塑料基板（20）的表面（21）上制造这种减反射层的方法。

公开(公告)号：US20150162173A1

公开(公告)日：2015-06-11

申请号：US14622597

申请日：2015-02-13

Applicant: Leybold Optics GmbH

Inventor： Michael Scherer ,  Jurgen Pistner ,  Walter Lehnert ,  Harro Hagedorn ,  Gerd Deppisch ,  Mario Roder

IPC: H01J37/34

CPC classification number: H01J37/3473 ,  C23C14/0078 ,  C23C14/0094 ,  C23C14/024 ,  C23C14/08 ,  C23C14/547 ,  H01J37/34 ,  H01J37/3405 ,  H01J37/3476 ,  H01J2237/3321

Abstract: A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.

Abstract translation: 一种通过使用溅射装置借助于残余气体在真空室中在可位移的基板上产生涂层来将多层涂层的光学损耗降低到预定值的方法。 通过在溅射装置的区域中添加具有预定化学计量不足的反应性组分将反应性沉积在衬底上。 将具有沉积的涂层的基板置于等离子体源附近，该等离子体源位于距离溅射装置预定距离的真空室中。 等离子体源的等离子体作用改变了涂层的结构和/或化学计量，优选地通过加入预定量的反应组分来减少涂层的光学损耗。