公开(公告)号：US5754918A

公开(公告)日：1998-05-19

申请号：US759196

申请日：1996-12-04

申请人： Lingappa K. Mestha ,  Prasad Padmanabhan

发明人： Lingappa K. Mestha ,  Prasad Padmanabhan

IPC分类号： G03G15/00 ,  G03G15/02 ,  G03G21/00

CPC分类号： G03G15/5037 ,  G03G15/0266

摘要： An electrostatographic printing machine having an imaging member with a surface voltage potential and a control system including first and second reference values. A sensor measures first and second surface voltage potentials that are compared to the first and second reference values to provide first and second error signals to control first and second process stations in the printing machine. A first compensator responds to the first error signal to provide a first weighted adjustment to the first process station and a second weighted adjustment to the second process station. A second compensator responds to the second error signal to provide a first weighted adjustment to the second process station and a second weighted adjustment to the first process station in order to compensate for coupling effects between adjustments to either the first or second processing stations.

摘要翻译： 一种具有具有表面电压电位的成像构件和包括第一和第二参考值的控制系统的静电印刷机。 传感器测量与第一和第二参考值相比较的第一和第二表面电压电位，以提供第一和第二误差信号来控制印刷机中的第一和第二处理站。 第一补偿器响应第一误差信号以向第一处理站提供第一加权调整，并对第二处理站进行第二加权调整。 第二补偿器响应于第二误差信号以向第二处理站提供第一加权调整，并对第一处理站进行第二加权调整，以补偿对第一或第二处理站之间的调整之间的耦合效应。

公开(公告)号：US06409932B1

公开(公告)日：2002-06-25

申请号：US09749648

申请日：2000-12-27

申请人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

发明人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

IPC分类号： B01J1500

摘要： A method is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The method includes loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock. In the interim, the pump line is further pumped down to operating pressure (about 1 Torr) behind the isolation valve. The chamber pressure is then again reduced by opening the isolation valve, and the wafer is processed.

公开(公告)号：US6167214A

公开(公告)日：2000-12-26

申请号：US428108

申请日：1999-10-27

申请人： Mark A. Scheuer ,  Prasad Padmanabhan ,  Joseph W. Ward

发明人： Mark A. Scheuer ,  Prasad Padmanabhan ,  Joseph W. Ward

IPC分类号： G03G15/01 ,  G03G15/08

CPC分类号： G03G15/0126

摘要： The present invention generally relates to an imaging system, and more specifically, a method and apparatus for accurately predicting toner usage and hence toner dispensing requirements in an imaging system. More specifically, the present invention relates to a feed forward toner concentration control system and method for replacing toner in each developer structure, which was used to develop a latent image on a photoreceptor belt, in order to maintain toner concentration in at least one developer structure. First and second pixel counts for first and second toner in each sector are received. The first toner mass is estimated based on first pixel counts. The second toner mass is estimated based on second pixel counts. Feed forward dispense commands are generated based on first toner mass estimate and second toner mass estimate to dispense each toner into each corresponding developer structure to replace toner used to develop the latent image on the photoreceptor in order to maintain toner concentration in each developer structure.

摘要翻译： 本发明一般涉及一种成像系统，更具体地说，涉及用于准确地预测成像系统中的调色剂使用情况以及因此调色剂分配需求的方法和装置。 更具体地说，本发明涉及用于在每个显影剂结构中替换调色剂的前馈调色剂浓度控制系统和方法，其用于在感光带上显影潜像，以便保持至少一种显影结构中的调色剂浓度 。 接收每个扇区中第一和第二调色剂的第一和第二像素数。 基于第一像素数量来估计第一调色剂质量。 基于第二像素数量来估计第二调色剂质量。 基于第一调色剂质量估计和第二调色剂质量估计产生前馈分配命令，以将每个调色剂分配到每个对应的显影剂结构中，以代替用于显影感光体上的潜像的显影剂，以便保持每个显影剂结构中的调色剂浓度。

公开(公告)号：US07130716B2

公开(公告)日：2006-10-31

申请号：US10830974

申请日：2004-04-22

申请人： John Rogers ,  Prasad Padmanabhan ,  Paul Sagues

发明人： John Rogers ,  Prasad Padmanabhan ,  Paul Sagues

IPC分类号： G06F7/00

CPC分类号： G05B19/4103 ,  B25J9/1664 ,  G05B2219/34121 ,  G05B2219/34123 ,  G05B2219/34149 ,  G05B2219/34175 ,  G05B2219/40454 ,  G05B2219/40463 ,  G05B2219/40477 ,  G05B2219/45031

摘要： A system for wafer handling employing a complex numerical method for calculating a path of wafer travel that controls wafer acceleration and jerk, and results in maximum safe speed of wafer movement from a first point to a second point. Motion is begun along a straight line segment while accelerating to a first path velocity. During this acceleration, the system computer calculates a series of straight line segments and interconnecting sinusiodally shaped paths over which the wafer is to be guided to the second point. The straight line segments and sinusiodally shaped paths are calculated so as to minimize total path length and the time required to move the wafer from the first point to the second point. The system computes the point of entrance and exit to and from each straight and sinusoidal path.

摘要翻译： 一种用于晶片处理的系统，其采用复数数值方法来计算晶片加速度和加加速度的晶片行进路径，并且导致晶片从第一点到第二点的最大安全速度。 沿着直线段开始运动，同时加速到第一路径速度。 在该加速期间，系统计算机计算一系列直线段和互连正弦形路径，晶片将被引导到第二点。 计算直线段和正弦形路径，以使总路径长度和将晶片从第一点移动到第二点所需的时间最小化。 该系统计算出每个直线和正弦曲线路径的入口点和出口点。

公开(公告)号：US6160971A

公开(公告)日：2000-12-12

申请号：US428341

申请日：1999-10-27

申请人： Mark A. Scheuer ,  John Buranicz ,  Patricia J. Donaldson ,  Paul A. Garsin ,  Eric M. Gross ,  Eric S. Hamby ,  Daniel W. MacDonald ,  Prasad Padmanabhan ,  Edward W. Smith, Jr. ,  Joseph W. Ward

发明人： Mark A. Scheuer ,  John Buranicz ,  Patricia J. Donaldson ,  Paul A. Garsin ,  Eric M. Gross ,  Eric S. Hamby ,  Daniel W. MacDonald ,  Prasad Padmanabhan ,  Edward W. Smith, Jr. ,  Joseph W. Ward

IPC分类号： G03G15/08

CPC分类号： G03G15/0849 ,  G03G15/0853

摘要： The present invention generally relates to an imaging system, and more specifically, a method and apparatus for accurately predicting toner usage and hence toner dispensing requirements in an imaging system. More specifically, the present invention relates to a toner concentration control system for maintaining toner concentration in a developer structure, which is connected to a dispenser containing toner. The toner concentration control system includes a toner mass estimator providing a toner mass estimate of the toner mass in the developer structure to be applied to the photoreceptor; a feed forward dispense unit receiving the toner mass estimate and transmitting a feed forward dispense command based on the toner mass estimate; a toner concentration target adjusted for toner break-in in the developer structure; a feed back dispense unit receiving the adjusted toner concentration target and transmitting a feedback dispense command; and a total dispense unit receiving the feed forward dispense command and the feedback dispense command, and outputting total dispense command to the dispenser, which dispenses the toner to the developer structure in accordance with the total dispense command.

摘要翻译： 本发明一般涉及一种成像系统，更具体地说，涉及用于准确地预测成像系统中的调色剂使用情况以及因此调色剂分配需求的方法和装置。 更具体地说，本发明涉及一种用于维持显影结构中的调色剂浓度的调色剂浓度控制系统，该调色剂浓度控制系统连接到包含调色剂的分配器。 调色剂浓度控制系统包括调色剂质量估计器，其提供将要施加到感光体的显影剂结构中的调色剂质量的调色剂质量估计; 接收调色剂质量估计的前馈分配单元和基于调色剂质量估计传送前馈分配命令; 调节用于显影剂结构中的调色剂破碎的调色剂浓度目标; 接收经调节的调色剂浓度目标并发送反馈分配命令的反馈分配单元; 以及总分配单元，其接收前馈分配指令和反馈分配命令，并且将总分配命令输出到分配器，分配器根据总分配命令将调色剂分配给显影剂结构。

公开(公告)号：US06605226B2

公开(公告)日：2003-08-12

申请号：US10170621

申请日：2002-06-10

申请人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

发明人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

IPC分类号： H01L214757

CPC分类号： G03F7/427 ,  H01L21/31138

摘要： A method is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The method includes loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock. In the interim, the pump line is further pumped down to operating pressure (about 1 Torr) behind the isolation valve. The chamber pressure is then again reduced by opening the isolation valve, and the wafer is processed.

公开(公告)号：US06736927B2

公开(公告)日：2004-05-18

申请号：US10167937

申请日：2002-06-10

申请人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

发明人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

IPC分类号： H01J113

CPC分类号： G03F7/427 ,  H01L21/31138

摘要： A system is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The system includes apparatus for loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock. In the interim, the pump line is further pumped down to operating pressure (about 1 Torr) behind the isolation valve. The chamber pressure is then again reduced by opening the isolation valve, and the wafer is processed.

摘要翻译： 公开了一种用于在低压，高温半导体处理反应器中加速工件加工的系统。 该系统包括用于在大气压力下将工件装载到室中的装置，使室降至中间压力，并在中间压力下加热晶片。 然后将腔室泵送到操作压力。 优选实施例涉及单晶片等离子体灰化器，其中将晶片加载到晶片卡盘上方位置的升降销上，通过快速打开和关闭隔离阀将压力快速泵送至约40托，同时降低晶片 到加热的卡盘。 或者，可以预先处理晶片以在第一温度下去除植入的光致抗蚀剂的外壳，然后将该腔重新填充至约40托，以进一步加热以接近卡盘温度。 在40乇时，从卡盘到晶片的热传递相对较快，但仍然足够慢以避免热冲击。 在此期间，泵管线进一步被泵送到隔离阀后面的工作压力（约1乇）。 然后通过打开隔离阀再次减小腔室压力，并且处理晶片。

公开(公告)号：US06175698B1

公开(公告)日：2001-01-16

申请号：US09428615

申请日：1999-10-27

申请人： Mark A. Scheuer ,  John Buranicz ,  Patricia J. Donaldson ,  Paul A. Garsin ,  Eric M. Gross ,  Eric S. Hamby ,  Daniel W. MacDonald ,  Prasad Padmanabhan ,  Edward W. Smith, Jr. ,  Joseph W. Ward

发明人： Mark A. Scheuer ,  John Buranicz ,  Patricia J. Donaldson ,  Paul A. Garsin ,  Eric M. Gross ,  Eric S. Hamby ,  Daniel W. MacDonald ,  Prasad Padmanabhan ,  Edward W. Smith, Jr. ,  Joseph W. Ward

IPC分类号： G03G1508

CPC分类号： G03G15/0849 ,  G03G15/0853 ,  G03G2215/017

摘要： The present invention generally relates to an imaging system, and more specifically, a method and apparatus for accurately predicting toner usage and hence toner dispensing requirements in an imaging system. The toner concentration control system maintains toner concentration in a developer structure, which is connected to a dispenser containing toner. The toner concentration control system includes a toner mass estimator providing a toner mass estimate of the toner mass in the developer structure to be applied to the photoreceptor; a feed forward dispense unit receiving the toner mass estimate and transmitting a feed forward dispense command based on the toner mass estimate; a toner concentration target adjusted by toner age, toner break-in and temperature in the developer structure; a feed back dispense unit receiving the adjusted toner concentration target and transmitting a feedback dispense command; and a total dispense unit receiving the feed forward dispense command and the feedback dispense command, and outputting total dispense command to the dispenser, which dispenses the toner to the developer structure in accordance with the total dispense command.

摘要翻译： 本发明一般涉及一种成像系统，更具体地说，涉及用于准确地预测成像系统中的调色剂使用情况以及因此调色剂分配需求的方法和装置。 调色剂浓度控制系统保持显影剂结构中的调色剂浓度，其连接到包含调色剂的分配器。 调色剂浓度控制系统包括调色剂质量估计器，其提供将要施加到感光体的显影剂结构中的调色剂质量的调色剂质量估计; 接收调色剂质量估计的前馈分配单元和基于调色剂质量估计传送前馈分配命令; 通过调色剂老化，调色剂破碎和显影剂结构中的温度调节的调色剂浓度目标; 接收经调节的调色剂浓度目标并发送反馈分配命令的反馈分配单元; 以及总分配单元，其接收前馈分配指令和反馈分配命令，并且将总分配命令输出到分配器，分配器根据总分配命令将调色剂分配给显影剂结构。