公开(公告)号：US06409932B1

公开(公告)日：2002-06-25

申请号：US09749648

申请日：2000-12-27

申请人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

发明人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

IPC分类号： B01J1500

摘要： A method is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The method includes loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock. In the interim, the pump line is further pumped down to operating pressure (about 1 Torr) behind the isolation valve. The chamber pressure is then again reduced by opening the isolation valve, and the wafer is processed.

公开(公告)号：US06263830B1

公开(公告)日：2001-07-24

申请号：US09546750

申请日：2000-04-11

申请人： Mohammad Kamarehi ,  Gerald M. Cox

发明人： Mohammad Kamarehi ,  Gerald M. Cox

IPC分类号： C23C1600

CPC分类号： H01J37/32357 ,  H01J37/32192 ,  H01J37/32256 ,  H05H1/46 ,  H05H2001/4622

摘要： A remote plasma generator, coupling microwave frequency energy to a gas and delivering radicals to a downstream process chamber, includes several features which, in conjunction, enable highly efficient radical generation. In the illustrated embodiments, more efficient delivery of oxygen and fluorine radicals translates to more rapid photoresist etch or ash rates. A single-crystal, one-piece sapphire applicator and transport tube minimizes recombination of radicals in route to the process chamber and includes a bend to avoid direct line of sight from the glow discharge to the downstream process chamber. Microwave transparent cooling fluid within a cooling jacket around the applicator enables high power, high temperature plasma production. Additionally, dynamic impedance matching via a sliding short at the terminus of the microwave cavity reduces power loss through reflected energy. At the same time, a low profile microwave trap produces a more dense plasma to increase radical production. In one embodiment, fluorine and oxygen radicals are separately generated and mixed just upstream of the process chamber, enabling individually optimized radical generation of the two species.

摘要翻译： 远程等离子体发生器，将微波频率能量耦合到气体并将自由基递送到下游处理室，其包括若干特征，其结合使得能够实现高效率的自由基产生。 在所示实施例中，氧和氟自由基的更有效的递送转化为更快速的光致抗蚀剂蚀刻或灰分速率。 单晶，单件蓝宝石涂布器和输送管使路线中的自由基的复合最小化到处理室，并且包括弯曲以避免从辉光放电到下游处理室的直接视线。 涂布器周围的冷却套管内的微波透明冷却液可实现高功率，高温等离子体生产。 另外，通过在微波空腔末端的滑动短路的动态阻抗匹配通过反射能减少功率损耗。 同时，低调的微波阱产生更密集的等离子体以增加激进产生。 在一个实施方案中，分别产生氟和氧自由基，并刚刚混合在处理室的上游，从而能够单独优化两种物质的自由基产生。

公开(公告)号：US06228773B1

公开(公告)日：2001-05-08

申请号：US09060095

申请日：1998-04-14

申请人： Gerald M. Cox

发明人： Gerald M. Cox

IPC分类号： H01L21302

CPC分类号： H01L21/6719 ,  H01L21/67017 ,  H01L21/67196 ,  H01L21/67253 ,  H01L21/67745

摘要： Workpieces, such as, semiconductor wafers, are continuously manufactured by repetitively alternately switching a common radio frequency power source between a plurality of downstream or in-chamber processing reactors and actively processing one workpiece in a vacuum in an operating one of the processing chambers while simultaneously executing with a robot at atmospheric pressure the overhead tasks relative to next processing another workpiece in the other processing chamber. The active processing of the workpieces in alternate chambers does not overlap, and the robot starts and completes all of its preparatory tasks during the active processing step during the time when a chamber's door is closed thereby providing virtual zero overhead. System architecture allows eliminating all redundant components other than the dual chambers which operate in parallel. For a modest cost increase for the second chamber throughput is trebled and overall costs significantly reduced. Preferred modes include switching a common microwave power source between the pair of processing chambers, pumping down with a common vacuum pump, and stabilizing the chamber pressure with a common throttle valve.

摘要翻译： 通过在多个下游或室内处理反应器之间重复地交替地切换共同的射频电源并且在操作的一个处理室中的真空中主动地处理一个工件，同时连续地制造诸如半导体晶片的工件 在大气压力下执行机器人相对于下一次在另一个处理室中处理另一个工件的开销任务。 在交替室中的工件的主动处理不重叠，并且机器人在室的门关闭期间的主动处理步骤期间启动并完成其所有的准备任务，从而提供虚拟零开销。 系统架构允许除了并行运行的双室之外的所有冗余组件。 对于第二个房间的适量成本增加，吞吐量是三倍并且整体成本显着降低。 优选的模式包括在一对处理室之间切换公共微波功率源，用普通的真空泵泵送，并用公共的节流阀稳定室压力。

公开(公告)号：US09242219B2

公开(公告)日：2016-01-26

申请号：US13361582

申请日：2012-01-30

申请人： Douglas R. Bull ,  Ross M. Patten ,  Paul Cairney ,  Gerald M. Cox ,  William P. Jepson

发明人： Douglas R. Bull ,  Ross M. Patten ,  Paul Cairney ,  Gerald M. Cox ,  William P. Jepson

IPC分类号： B01J7/00 ,  B01J8/18 ,  C10J3/48 ,  C02F11/10 ,  C10K1/02 ,  C02F11/12

CPC分类号： C10J3/466 ,  B01J8/1809 ,  B01J8/1827 ,  B01J2208/00893 ,  B01J2208/00902 ,  C02F11/10 ,  C02F11/12 ,  C02F11/121 ,  C10J3/482 ,  C10J3/84 ,  C10J2300/0909 ,  C10J2300/0916 ,  C10J2300/0923 ,  C10J2300/0956 ,  C10J2300/1643 ,  C10J2300/1807 ,  C10K1/026 ,  Y02P20/129 ,  Y02W10/40 ,  Y10T29/49

摘要： A fluidized bed biogasifier is provided for gasifying biosolids. The biogasifier includes a reactor vessel and a feeder for feeding biosolids into the reactor vessel at a desired feed rate during steady-state operation of the biogasifier. A fluidized bed in the base of the reactor vessel has a cross-sectional area that is proportional to at least the fuel feed rate such that the superficial velocity of gas is in the range of 0.1 m/s (0.33 ft/s) to 3 m/s (9.84 ft/s). In a method for gasifying biosolids, biosolids are fed into a fluidized bed reactor. Oxidant gases are applied to the fluidized bed reactor to produce a superficial velocity of producer gas in the range of 0.1 m/s (0.33 ft/s) to 3 m/s (9.84 ft/s). The biosolids are heated inside the fluidized bed reactor to a temperature range between 900° F. (482.2° C.) and 1700° F. (926.7° C.) in an oxygen-starved environment having a sub-stoichiometric oxygen level, whereby the biosolids are gasified.

摘要翻译： 提供流化床生物气化器用于气化生物固体。 生物气化器包括反应器容器和用于在生物气化器的稳态操作期间以期望的进料速率将生物固体进料到反应器容器中的进料器。 在反应器容器底部的流化床具有与至少燃料供给速率成比例的横截面积，使得气体的表观速度在0.1m / s（0.33ft / s）至3的范围内 m / s（9.84ft / s）。 在气化生物固体的方法中，将生物固体进料到流化床反应器中。 将氧化剂气体施加到流化床反应器以产生0.1m / s（0.33ft / s）至3m / s（9.84ft / s）范围内的发生气体的表观速度。 在具有亚化学计量氧水平的氧缺乏环境中，将生物固体在流化床反应器内加热至900°F（482.2℃）至1700°F（926.7℃）之间的温度范围，由此 生物固体气化。

公开(公告)号：US06605226B2

公开(公告)日：2003-08-12

申请号：US10170621

申请日：2002-06-10

申请人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

发明人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

IPC分类号： H01L214757

CPC分类号： G03F7/427 ,  H01L21/31138

摘要： A method is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The method includes loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock. In the interim, the pump line is further pumped down to operating pressure (about 1 Torr) behind the isolation valve. The chamber pressure is then again reduced by opening the isolation valve, and the wafer is processed.

公开(公告)号：US06412438B2

公开(公告)日：2002-07-02

申请号：US09748060

申请日：2000-12-22

申请人： Mohammad Kamarehi ,  Gerald M. Cox

发明人： Mohammad Kamarehi ,  Gerald M. Cox

IPC分类号： C23C1600

CPC分类号： H01J37/32357 ,  H01J37/32192 ,  H01J37/32256 ,  H05H1/46 ,  H05H2001/4622

摘要： A remote plasma generator, coupling microwave frequency energy to a gas and delivering radicals to a downstream process chamber, includes several features which, in conjunction, enable highly efficient radical generation. In the illustrated embodiments, more efficient delivery of oxygen and fluorine radicals translates to more rapid photoresist etch or ash rates. A single-crystal, one-piece sapphire applicator and transport tube minimizes recombination of radicals in route to the process chamber and includes a bend to avoid direct line of sight from the glow discharge to the downstream process chamber. Microwave transparent cooling fluid within a cooling jacket around the applicator enables high power, high temperature plasma production. Additionally, dynamic impedance matching via a sliding short at the terminus of the microwave cavity reduces power loss through reflected energy. At the same time, a low profile microwave trap produces a more dense plasma to increase radical production. In one embodiment, fluorine and oxygen radicals are separately generated and mixed just upstream of the process chamber, enabling individually optimized radical generation of the two species.

摘要翻译： 远程等离子体发生器，将微波频率能量耦合到气体并将自由基递送到下游处理室，其包括若干特征，其结合使得能够实现高效率的自由基产生。 在所示实施例中，氧和氟自由基的更有效的递送转化为更快速的光致抗蚀剂蚀刻或灰分速率。 单晶，单件蓝宝石涂布器和输送管使路线中的自由基的复合最小化到处理室，并且包括弯曲以避免从辉光放电到下游处理室的直接视线。 涂布器周围的冷却套管内的微波透明冷却液可实现高功率，高温等离子体生产。 另外，通过在微波空腔末端的滑动短路的动态阻抗匹配通过反射能减少功率损耗。 同时，低调的微波阱产生更密集的等离子体以增加激进产生。 在一个实施方案中，分别产生氟和氧自由基，并刚刚混合在处理室的上游，从而能够单独优化两种物质的自由基产生。

公开(公告)号：US06439155B1

公开(公告)日：2002-08-27

申请号：US09747452

申请日：2000-12-22

申请人： Mohammad Kamarehi ,  Gerald M. Cox

发明人： Mohammad Kamarehi ,  Gerald M. Cox

IPC分类号： C23C1600

CPC分类号： H01J37/32357 ,  H01J37/32192 ,  H01J37/32256 ,  H05H1/46 ,  H05H2001/4622

摘要： A remote plasma generator, coupling microwave frequency energy to a gas and delivering radicals to a downstream process chamber, includes several features which, in conjunction, enable highly efficient radical generation. In the illustrated embodiments, more efficient delivery of oxygen and fluorine radicals translates to more rapid photoresist etch or ash rates. A single-crystal, one-piece sapphire applicator and transport tube minimizes recombination of radicals in route to the process chamber and includes a bend to avoid direct line of sight from the glow discharge to the downstream process chamber. Microwave transparent cooling fluid within a cooling jacket around the applicator enables high power, high temperature plasma production. Additionally, dynamic impedance matching via a sliding short at the terminus of the microwave cavity reduces power loss through reflected energy. At the same time, a low profile microwave trap produces a more dense plasma to increase radical production. In one embodiment, fluorine and oxygen radicals are separately generated and mixed just upstream of the process chamber, enabling individually optimized radical generation of the two species.

摘要翻译： 远程等离子体发生器，将微波频率能量耦合到气体并将自由基递送到下游处理室，其包括若干特征，其结合使得能够实现高效率的自由基产生。 在所示实施例中，氧和氟自由基的更有效的递送转化为更快速的光致抗蚀剂蚀刻或灰分速率。 单晶，单件蓝宝石涂布器和输送管使路线中的自由基的复合最小化到处理室，并且包括弯曲以避免从辉光放电到下游处理室的直接视线。 涂布器周围的冷却套管内的微波透明冷却液可实现高功率，高温等离子体生产。 另外，通过在微波空腔末端的滑动短路的动态阻抗匹配通过反射能减少功率损耗。 同时，低调的微波阱产生更密集的等离子体以增加激进产生。 在一个实施方案中，分别产生氟和氧自由基，并刚刚混合在处理室的上游，从而能够单独优化两种物质的自由基产生。

公开(公告)号：US06352050B2

公开(公告)日：2002-03-05

申请号：US09747822

申请日：2000-12-22

申请人： Mohammad Kamarehi ,  Gerald M. Cox

发明人： Mohammad Kamarehi ,  Gerald M. Cox

IPC分类号： C23C1600

CPC分类号： H01J37/32357 ,  H01J37/32192 ,  H01J37/32256 ,  H05H1/46 ,  H05H2001/4622

摘要： A remote plasma generator, coupling microwave frequency energy to a gas and delivering radicals to a downstream process chamber, includes several features which, in conjunction, enable highly efficient radical generation. In the illustrated embodiments, more efficient delivery of oxygen and fluorine radicals translates to more rapid photoresist etch or ash rates. A single-crystal, one-piece sapphire applicator and transport tube minimizes recombination of radicals in route to the process chamber and includes a bend to avoid direct line of sight from the glow discharge to the downstream process chamber. Microwave transparent cooling fluid within a cooling jacket around the applicator enables high power, high temperature plasma production. Additionally, dynamic impedance matching via a sliding short at the terminus of the microwave cavity reduces power loss through reflected energy. At the same time, a low profile microwave trap produces a more dense plasma to increase radical production. In one embodiment, fluorine and oxygen radicals are separately generated and mixed just upstream of the process chamber, enabling individually optimized radical generation of the two species.

摘要翻译： 远程等离子体发生器，将微波频率能量耦合到气体并将自由基递送到下游处理室，其包括若干特征，其结合使得能够实现高效率的自由基产生。 在所示实施例中，氧和氟自由基的更有效的递送转化为更快速的光致抗蚀剂蚀刻或灰分速率。 单晶，单件蓝宝石涂布器和输送管使路线中的自由基的复合最小化到处理室，并且包括弯曲以避免从辉光放电到下游处理室的直接视线。 涂布器周围的冷却套管内的微波透明冷却液可实现高功率，高温等离子体生产。 另外，通过在微波空腔末端的滑动短路的动态阻抗匹配通过反射能减少功率损耗。 同时，低调的微波阱产生更密集的等离子体以增加激进产生。 在一个实施方案中，分别产生氟和氧自由基，并刚刚混合在处理室的上游，从而能够单独优化两种物质的自由基产生。

公开(公告)号：US20130195727A1

公开(公告)日：2013-08-01

申请号：US13361582

申请日：2012-01-30

申请人： Douglas R. Bull ,  Ross M. Patten ,  Paul Cairney ,  Gerald M. Cox ,  William P. Jepson

发明人： Douglas R. Bull ,  Ross M. Patten ,  Paul Cairney ,  Gerald M. Cox ,  William P. Jepson

IPC分类号： B01J8/18 ,  B23P17/00 ,  C07C5/02

CPC分类号： C10J3/466 ,  B01J8/1809 ,  B01J8/1827 ,  B01J2208/00893 ,  B01J2208/00902 ,  C02F11/10 ,  C02F11/12 ,  C02F11/121 ,  C10J3/482 ,  C10J3/84 ,  C10J2300/0909 ,  C10J2300/0916 ,  C10J2300/0923 ,  C10J2300/0956 ,  C10J2300/1643 ,  C10J2300/1807 ,  C10K1/026 ,  Y02P20/129 ,  Y02W10/40 ,  Y10T29/49

摘要： A fluidized bed biogasifier is provided for gasifying biosolids. The biogasifier includes a reactor vessel and a feeder for feeding biosolids into the reactor vessel at a desired feed rate during steady-state operation of the biogasifier. A fluidized bed in the base of the reactor vessel has a cross-sectional area that is proportional to at least the fuel feed rate such that the superficial velocity of gas is in the range of 0.1 m/s (0.33 ft/s) to 3 m/s (9.84 ft/s). In a method for gasifying biosolids, biosolids are fed into a fluidized bed reactor. Oxidant gases are applied to the fluidized bed reactor to produce a superficial velocity of producer gas in the range of 0.1 m/s (0.33 ft/s) to 3 m/s (9.84 ft/s). The biosolids are heated inside the fluidized bed reactor to a temperature range between 900° F. (482.2° C.) and 1700° F. (926.7° C.) in an oxygen-starved environment having a sub-stoichiometric oxygen level, whereby the biosolids are gasified.

摘要翻译： 提供流化床生物气化器用于气化生物固体。 生物气化器包括反应器容器和用于在生物气化器的稳态操作期间以期望的进料速率将生物固体进料到反应器容器中的进料器。 在反应器容器底部的流化床具有与至少燃料供给速率成比例的横截面积，使得气体的表观速度在0.1m / s（0.33ft / s）至3的范围内 m / s（9.84ft / s）。 在气化生物固体的方法中，将生物固体进料到流化床反应器中。 将氧化剂气体施加到流化床反应器以产生0.1m / s（0.33ft / s）至3m / s（9.84ft / s）范围内的发生气体的表观速度。 在具有亚化学计量氧水平的氧缺乏环境中，将生物固体在流化床反应器内加热至900°F（482.2℃）至1700°F（926.7℃）之间的温度范围，由此 生物固体气化。

公开(公告)号：US06736927B2

公开(公告)日：2004-05-18

申请号：US10167937

申请日：2002-06-10

申请人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

发明人： Albert Wang ,  Scott Baron ,  Prasad Padmanabhan ,  Gerald M. Cox

IPC分类号： H01J113

CPC分类号： G03F7/427 ,  H01L21/31138

摘要： A system is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The system includes apparatus for loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock. In the interim, the pump line is further pumped down to operating pressure (about 1 Torr) behind the isolation valve. The chamber pressure is then again reduced by opening the isolation valve, and the wafer is processed.

摘要翻译： 公开了一种用于在低压，高温半导体处理反应器中加速工件加工的系统。 该系统包括用于在大气压力下将工件装载到室中的装置，使室降至中间压力，并在中间压力下加热晶片。 然后将腔室泵送到操作压力。 优选实施例涉及单晶片等离子体灰化器，其中将晶片加载到晶片卡盘上方位置的升降销上，通过快速打开和关闭隔离阀将压力快速泵送至约40托，同时降低晶片 到加热的卡盘。 或者，可以预先处理晶片以在第一温度下去除植入的光致抗蚀剂的外壳，然后将该腔重新填充至约40托，以进一步加热以接近卡盘温度。 在40乇时，从卡盘到晶片的热传递相对较快，但仍然足够慢以避免热冲击。 在此期间，泵管线进一步被泵送到隔离阀后面的工作压力（约1乇）。 然后通过打开隔离阀再次减小腔室压力，并且处理晶片。