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    Reactor system coupled to an energy emitter control circuit
    1.
    发明授权
    Reactor system coupled to an energy emitter control circuit 有权

    公开(公告)号：US11107662B2

    公开(公告)日：2021-08-31

    申请号：US17039736

    申请日：2020-09-30

    Applicant: Lyten, Inc.

    Inventor： Michael W. Stowell ,  Tung Van Pham ,  Bryce H. Anzelmo ,  Thomas Riso

    IPC: H01J37/32 ,  C01B32/205 ,  C01B32/184 ,  B01J19/12

    Abstract: A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a control signal that adjusts a pulse frequency of the microwave energy. A voltage generator applies a non-zero voltage to the microwave energy source during the off-state. A frequency and a duty cycle of the non-zero voltage is based on a frequency and a duty cycle of the control signal. A waveguide is coupled to the microwave energy source. The waveguide has a supply gas inlet that receives a supply gas, a reaction zone that generates a plasma, a process inlet that injects a raw material into the reaction zone, and an outlet that outputs a powder based on a mixture of the supply gas and the raw material within the plasma.

    REACTOR SYSTEM COUPLED TO AN ENERGY EMITTER CONTROL CIRCUIT
    4.
    发明申请
    REACTOR SYSTEM COUPLED TO AN ENERGY EMITTER CONTROL CIRCUIT 有权

    公开(公告)号：US20210057191A1

    公开(公告)日：2021-02-25

    申请号：US17039736

    申请日：2020-09-30

    Applicant: Lyten, Inc.

    Inventor： Michael W. Stowell ,  Tung Van Pham ,  Bryce H. Anzelmo ,  Thomas Riso

    IPC: H01J37/32 ,  B01J19/12 ,  C01B32/205 ,  C01B32/184

    Abstract: A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a control signal that adjusts a pulse frequency of the microwave energy. A voltage generator applies a non-zero voltage to the microwave energy source during the off-state. A frequency and a duty cycle of the non-zero voltage is based on a frequency and a duty cycle of the control signal. A waveguide is coupled to the microwave energy source. The waveguide has a supply gas inlet that receives a supply gas, a reaction zone that generates a plasma, a process inlet that injects a raw material into the reaction zone, and an outlet that outputs a powder based on a mixture of the supply gas and the raw material within the plasma.

    PLASMA SPRAY SYSTEMS AND METHODS
    5.
    发明申请
    PLASMA SPRAY SYSTEMS AND METHODS 审中-公开

    公开(公告)号：US20200040444A1

    公开(公告)日：2020-02-06

    申请号：US16460177

    申请日：2019-07-02

    Applicant: Lyten, Inc.

    Inventor： Michael W. Stowell ,  Daniel Cook ,  Joe Griffith Cruz ,  Thomas Riso

    IPC: C23C14/35 ,  H05H1/30 ,  H05H1/40

    Abstract: Plasma spray systems comprise multiple zones wherein the energy required for different processes within the systems can be controlled independently. In some embodiments, a plasma spray system comprises a first zone wherein ionic species are generated from the target material using a first energy input, and the ionic species either combine to form a plurality of particles in the first zone, or form coatings on a plurality of input particles input into the first zone. The plasma spray system can further comprise a second zone, comprising a chamber coupled to a microwave energy source, which ionizes the plurality of particles to form a plurality of ionized particles and form a plasma jet. The plasma spray system can further comprise a third zone, comprising an electric field to accelerate the plurality of ionized particles and form a plasma spray.

    Cracking of a process gas
    6.
    发明授权
    Cracking of a process gas 有权

    公开(公告)号：US10465128B2

    公开(公告)日：2019-11-05

    申请号：US15710679

    申请日：2017-09-20

    Applicant: Lyten, Inc.

    Inventor： Joe Griffith Cruz ,  Ryan Balmores ,  Thomas Riso ,  Philip David Fulmer ,  Hossein-Ali Ghezelbash ,  Ranjeeth Kalluri ,  Michael W. Stowell ,  Bryce H. Anzelmo

    IPC: C01B3/24 ,  C01B32/154 ,  C10G47/22 ,  G06F1/20

    Abstract: A thermal cracking apparatus and method includes a body having an inner volume with a longitudinal axis, where a reaction zone surrounds the longitudinal axis. A feedstock process gas is flowed into the inner volume and longitudinally through the reaction zone during thermal cracking operations. A power control system controls electrical power to an elongated heating element, which is disposed within the inner volume. During thermal cracking operations, the elongated heating element is heated to a molecular cracking temperature to generate the reaction zone, the feedstock process gas is heated from the elongated heating element, the power control system uses a feedback parameter for adjusting the electrical power to maintain the molecular cracking temperature at a substantially constant value, and the heat thermally cracks molecules of the feedstock process gas that are within the reaction zone into constituent components of the molecules.

    Microwave chemical processing reactor
    7.
    发明授权
    Microwave chemical processing reactor 有权

    公开(公告)号：US09767992B1

    公开(公告)日：2017-09-19

    申请号：US15428474

    申请日：2017-02-09

    Applicant: Lyten, Inc.

    Inventor： Michael W. Stowell ,  Bryce H. Anzelmo ,  Thomas Riso

    IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32

    CPC classification number: H01J37/32192 ,  H01J37/32229 ,  H01J37/3244 ,  H01J37/32532 ,  H01J2237/334

    Abstract: A processing reactor includes a microwave energy source and a field-enhancing waveguide. The field-enhancing waveguide has a field-enhancing zone between a first cross-sectional area and a second cross-sectional area of the waveguide, and also has a plasma zone and a reaction zone. The second cross-sectional area is smaller than the first cross-sectional area, is farther away from the microwave energy source than the first cross-sectional area, and extends along a reaction length of the field-enhancing waveguide. The supply gas inlet is upstream of the reaction zone. In the reaction zone, a majority of the supply gas flow is parallel to the direction of the microwave energy propagation. A supply gas is used to generate a plasma in the plasma zone to convert a process input material into separated components in the reaction zone at a pressure of at least 0.1 atmosphere.

    Temperature-controlled chemical processing reactor
    8.
    发明授权
    Temperature-controlled chemical processing reactor 有权

    公开(公告)号：US11923176B2

    公开(公告)日：2024-03-05

    申请号：US17008188

    申请日：2020-08-31

    Applicant: Lyten, Inc.

    Inventor： Michael W. Stowell ,  Bryce H. Anzelmo ,  Thomas Riso

    IPC: H01J37/32

    CPC classification number: H01J37/32192 ,  H01J37/32229 ,  H01J37/3244 ,  H01J37/32532 ,  H01J2237/334

    Abstract: This disclosure provides a reactor system that includes a microwave source configured to generate a microwave energy, one or more energy sources configured to generate a thermal energy and a field-enhancing waveguide (FEWG) coupled to the microwave source. The FEWG includes a field-enhancing zone having a cross-sectional area that decreases along a length of the FEWG. The field-enhancing zone includes a supply gas inlet configured to receive a supply gas, a reaction zone configured to generate a plasma in response to excitation of the supply gas by the microwave energy, a process inlet configured to inject a raw material into the reaction zone, and an afterglow region configured to combine the plasma and the raw material in response to the thermal energy. An outlet outputs a plurality of carbon-inclusive particles resulting from the combination of the plasma and the raw material. Electrodes can be positioned proximate to the reaction zone.

    Microwave chemical processing reactor
    9.
    发明授权
    Microwave chemical processing reactor 有权

    公开(公告)号：US10937632B2

    公开(公告)日：2021-03-02

    申请号：US15676649

    申请日：2017-08-14

    Applicant: Lyten, Inc.

    Inventor： Michael W. Stowell ,  Bryce H. Anzelmo ,  Thomas Riso

    IPC: H01J37/32

    Abstract: A processing reactor includes a microwave energy source and a field-enhancing waveguide. The field-enhancing waveguide has a field-enhancing zone between a first cross-sectional area and a second cross-sectional area of the waveguide, and also has a plasma zone and a reaction zone. The second cross-sectional area is smaller than the first cross-sectional area, is farther away from the microwave energy source than the first cross-sectional area, and extends along a reaction length of the field-enhancing waveguide. The supply gas inlet is upstream of the reaction zone. In the reaction zone, a majority of the supply gas flow is parallel to the direction of the microwave energy propagation. A supply gas is used to generate a plasma in the plasma zone to convert a process input material into separated components in the reaction zone at a pressure of at least 0.1 atmosphere.

    Microwave Chemical Processing Reactor
    10.
    发明申请
    Microwave Chemical Processing Reactor 审中-公开

    公开(公告)号：US20180226229A1

    公开(公告)日：2018-08-09

    申请号：US15676649

    申请日：2017-08-14

    Applicant: Lyten, Inc.

    Inventor： Michael W. Stowell ,  Bryce H. Anzelmo ,  Thomas Riso

    IPC: H01J37/32

    CPC classification number: H01J37/32192 ,  H01J37/32229 ,  H01J37/3244 ,  H01J37/32532 ,  H01J2237/334

    Abstract: A processing reactor includes a microwave energy source and a field-enhancing waveguide. The field-enhancing waveguide has a field-enhancing zone between a first cross-sectional area and a second cross-sectional area of the waveguide, and also has a plasma zone and a reaction zone. The second cross-sectional area is smaller than the first cross-sectional area, is farther away from the microwave energy source than the first cross-sectional area, and extends along a reaction length of the field-enhancing waveguide. The supply gas inlet is upstream of the reaction zone. In the reaction zone, a majority of the supply gas flow is parallel to the direction of the microwave energy propagation. A supply gas is used to generate a plasma in the plasma zone to convert a process input material into separated components in the reaction zone at a pressure of at least 0.1 atmosphere.

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