公开(公告)号：US20060114437A1

公开(公告)日：2006-06-01

申请号：US11000507

申请日：2004-12-01

申请人： M'hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Chrysogonus Commissaris ,  Simon De Groot ,  Andre Jeunink ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt

发明人： M'hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Chrysogonus Commissaris ,  Simon De Groot ,  Andre Jeunink ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt

IPC分类号： G03B27/52

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/706

摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.

摘要翻译： 光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号 属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。 提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和测量系统提供的测量投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新 预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。

公开(公告)号：US20060008716A1

公开(公告)日：2006-01-12

申请号：US10886051

申请日：2004-07-08

申请人： Andre Jeunink ,  M'Hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Commissaris ,  Simon De Groot ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt ,  Remco Van Dijk

发明人： Andre Jeunink ,  M'Hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Commissaris ,  Simon De Groot ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt ,  Remco Van Dijk

IPC分类号： G03C5/00 ,  G03B27/00 ,  G06F17/50 ,  G03F9/00

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70491 ,  G03F7/705 ,  G03F7/706 ,  G03F9/7046

摘要： A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion. In order to compensate for the aberrations in a manner that gives precedence to those aberrations of particular significance to the required application, the method incorporates the steps of predicting projection system aberration changes with time, determining the application-specific effect on certain parameters of the image of such predicted projection system aberration changes with respect to certain measured aberration values, generating a control signal specific to the required patterned beam according to such predicted projection system aberration changes in the projection system aberrations with time and their application-specific effect on certain parameters of the image; and carrying out imaging adjustments in dependence on the control signal to compensate for the application-specific effect of the predicted changes in the aberrations on the image. The adjustments are therefore determined optimally for the given application.

摘要翻译： 在光刻投影设备中使用制造方法，以便能够补偿所有像差，但是对于特定应用（特定图案，照明模式等）具有最重要意义的那些像差优先于像差， 与该特定应用相关的意义较小。 该方法使用具有用于接收图像的目标部分的基板，用于根据所需图案化应用来施加图案的掩模以及投影系统，以将所选择的辐射束投影到掩模上，以产生特定的所需图案束提供 目标部分上的图案的图像。 为了以对所需应用具有特别意义的那些像差优先的方式补偿像差，该方法包括随时间预测投影系统像差变化的步骤，确定对图像的某些参数的应用特定影响 这种预测的投影系统像差相对于某些测量的像差值发生变化，根据投影系统像差随时间的这种预测的投影系统像差变化产生对所需图案化光束特有的控制信号及其对某些参数的应用特定影响 图片; 并且根据控制信号执行成像调整，以补偿预测图像上像差变化的应用特定效果。 因此，对于给定的应用，最佳地确定调整。