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1.发明申请Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus 有权平版印刷设备和使用这种光刻投影设备的设备制造方法公开(公告)号：US20060114437A1
公开(公告)日：2006-06-01
申请号：US11000507
申请日：2004-12-01
申请人： M'hamed Akhssay , Johannes Baselmans , Franciscus Antonius Chrysogonus Commissaris , Simon De Groot , Andre Jeunink , Wim Tel , Alexander Hendrikus Van Der Hoff , Arnout Van De Stadt
发明人： M'hamed Akhssay , Johannes Baselmans , Franciscus Antonius Chrysogonus Commissaris , Simon De Groot , Andre Jeunink , Wim Tel , Alexander Hendrikus Van Der Hoff , Arnout Van De Stadt
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/705 , G03F7/706
摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.
摘要翻译： 光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号 属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。 提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和测量系统提供的测量投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新 预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。
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2.发明授权Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus 有权平版印刷设备和使用这种光刻投影设备的设备制造方法公开(公告)号：US07262831B2
公开(公告)日：2007-08-28
申请号：US11000507
申请日：2004-12-01
申请人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
发明人： M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Andre Bernardus Jeunink , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/705 , G03F7/706
摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.
摘要翻译： 光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号 属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。 提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和由测量系统提供的测量的投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新 预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。
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3.发明授权Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权光刻投影装置和使用这种光刻投影装置的装置制造方法公开(公告)号：US07626684B2
公开(公告)日：2009-12-01
申请号：US12213150
申请日：2008-06-16
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van der Hoff , Arnout Van de Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van der Hoff , Arnout Van de Stadt , Remco Marcel Van Dijk
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
摘要翻译： 公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响 用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像 响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。
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4.发明授权Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权光刻投影装置和使用这种光刻投影装置的装置制造方法公开(公告)号：US07403264B2
公开(公告)日：2008-07-22
申请号：US10886051
申请日：2004-07-08
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Arnout Van De Stadt , Remco Marcel Van Dijk
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image. Adjustments may therefore be determined optimally for a given application.
摘要翻译： 公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响 用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像 响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。 因此，对于给定的应用可以最佳地确定调整。
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5.发明申请Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权光刻投影装置和使用这种光刻投影装置的装置制造方法公开(公告)号：US20080252870A1
公开(公告)日：2008-10-16
申请号：US12213150
申请日：2008-06-16
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
摘要翻译： 公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响 用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像 响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。
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6.发明申请公开(公告)号：US20110013163A1
公开(公告)日：2011-01-20
申请号：US12892733
申请日：2010-09-28
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70558 , G03F7/70891
摘要： In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
摘要翻译： 在使用光刻设备的器件制造方法中，在场内和/或场之间施加对剂量的校正，以补偿由于光刻设备的投影系统的元件的加热引起的CD变化。
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公开(公告)号：US08810773B2
公开(公告)日：2014-08-19
申请号：US12947570
申请日：2010-11-16
申请人： M'hamed Akhssay
发明人： M'hamed Akhssay
CPC分类号： G03F7/70308 , G03F7/70266 , G03F7/705 , G03F7/70891
摘要： A lithographic method includes controlling a phase adjuster of a lithographic apparatus, the phase adjuster being constructed and arranged to adjust a phase of an electric field of a radiation beam traversing an optical element of the phase adjuster, and controlling a signal provided to the phase adjuster that results in an actual time-temperature characteristic of a portion of the optical element, the control being undertaken with reference to a desired time-temperature characteristic of a portion of the optical element, the control of the signal being such that a change in the actual time-temperature characteristic precedes a related change in the desired time-temperature characteristic.
摘要翻译： 光刻方法包括控制光刻设备的相位调节器，所述相位调节器被构造和布置成调节穿过相位调节器的光学元件的辐射束的电场的相位，并且控制提供给相位调节器的信号 这导致光学元件的一部分的实际时间 - 温度特性，参考光学元件的一部分的期望的时间 - 温度特性进行控制，信号的控制使得 实际时间温度特性在期望的时间 - 温度特性的相关变化之前。
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8.发明授权公开(公告)号：US07829249B2
公开(公告)日：2010-11-09
申请号：US11713787
申请日：2007-03-05
IPC分类号： G03F9/00
CPC分类号： G03B27/42 , G03F7/70558 , G03F7/70891
摘要： In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
摘要翻译： 在使用光刻设备的器件制造方法中，在场内和/或场之间施加对剂量的校正，以补偿由于光刻设备的投影系统的元件的加热引起的CD变化。
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