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公开(公告)号：US20110157760A1
公开(公告)日：2011-06-30
申请号：US12884967
申请日：2010-09-17
IPC分类号： H01L21/687
CPC分类号： H01L21/6833 , Y10T279/23
摘要： Embodiments of electrostatic chucks are provided herein. In some embodiments, an electrostatic chuck may include a body having a notched upper peripheral edge, defined by a first surface perpendicular to a body sidewall and a stepped second surface disposed between the first surface and a body upper surface, and a plurality of holes disposed through the body along the first surface; a plurality of fasteners disposed through the plurality of holes to couple the body to a base disposed beneath the body; a dielectric member disposed above the body upper surface to electrostatically retain a substrate; an insulator ring disposed about the body within the notched upper peripheral edge and having a stepped inner sidewall that mates with the stepped second surface to define a non-linear interface therebetween; and an edge ring disposed over the insulator ring, the non-linear interface limiting arcing between the edge ring and the fastener.
摘要翻译： 本文提供了静电卡盘的实施例。 在一些实施例中，静电吸盘可以包括具有切口的上周边边缘的主体，该顶部边缘由垂直于主体侧壁的第一表面和设置在第一表面和主体上表面之间的阶梯状第二表面限定， 沿着第一面穿过身体; 多个紧固件，其布置成穿过所述多个孔，以将所述主体连接到设置在所述主体下方的底座; 设置在所述主体上表面上方的电介质部件，以静电保持基板; 绝缘体环，其围绕所述主体设置在所述凹口的上周边边缘内并且具有与所述阶梯状的第二表面配合以形成其间的非线性界面的阶梯状内侧壁; 以及设置在所述绝缘体环上的边缘环，所述非线性界面限制所述边缘环和所述紧固件之间的电弧。
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公开(公告)号：US20110120651A1
公开(公告)日：2011-05-26
申请号：US12892036
申请日：2010-09-28
IPC分类号： B05B1/00 , C23F1/08 , C23C16/455
CPC分类号： C23C16/45565 , H01J37/3244 , H01J37/32495
摘要： Showerhead assemblies with improved impact protection are provided herein. In some embodiments, a showerhead assembly includes a body having a plenum disposed therein, the body having a plurality of first holes extending from the plenum to a substrate facing surface of the body; a plate disposed on the substrate facing surface of the body and having a plurality of second holes formed therethrough, each second hole corresponding with a respective first hole of the body; and a lip extending from the body and circumscribing the plate, the lip extending beyond a chamber facing surface of the plate. In some embodiments, the showerhead assembly is disposed in the inner volume of a process chamber.
摘要翻译： 本文提供了具有改进的冲击保护的喷头组件。 在一些实施例中，喷头组件包括具有设置在其中的增压室的主体，所述主体具有从所述增压室延伸到所述主体的面向基板的表面的多个第一孔; 设置在所述主体的与所述基板对向的表面上并具有穿过其形成的多个第二孔的板，每个第二孔对应于所述主体的相应的第一孔; 以及从所述主体延伸并围绕所述板的唇缘，所述唇缘延伸超过所述板的面向腔室的表面。 在一些实施例中，喷头组件设置在处理室的内部容积中。
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公开(公告)号：US20120024479A1
公开(公告)日：2012-02-02
申请号：US13015106
申请日：2011-01-27
IPC分类号： H01L21/00 , C23C16/458 , C23F1/08 , C23C16/455
CPC分类号： H01L21/68735 , C23C16/4412 , C23C16/45591 , C23C16/4585 , H01J37/3244 , H01J37/32633 , H01J37/32642 , Y10T137/85938
摘要： Apparatus for controlling the flow of a gas in a process chamber is provided herein. In some embodiments, an apparatus for controlling the flow of a gas in a process chamber having a processing volume within the process chamber disposed above a substrate support and a pumping volume within the process chamber disposed below the substrate support may include an annular plate surrounding the substrate support proximate a level of a substrate support surface of the substrate support, wherein the annular plate extends radially outward toward an inner peripheral surface of the process chamber to define a uniform gap between an outer edge of the annular plate and the inner peripheral surface, wherein the uniform gap provides a uniform flow path from the processing volume to the pumping volume.
摘要翻译： 本文提供了用于控制处理室中气体流动的装置。 在一些实施例中，用于控制处理室中的气体流动的装置，其具有设置在基板支撑件上方的处理室内的处理容积，以及设置在基板支撑件下方的处理室内的泵送体积可包括环形板 衬底支撑件，靠近衬底支撑件的衬底支撑表面的水平面，其中环形板朝向处理室的内周表面径向向外延伸，以在环形板的外边缘和内周表面之间限定均匀的间隙， 其中均匀间隙提供从处理体积到泵送体积的均匀流动路径。
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公开(公告)号：US20110162803A1
公开(公告)日：2011-07-07
申请号：US12884978
申请日：2010-09-17
CPC分类号： H01J37/32449 , H01J37/32091 , H01J37/32816 , H01J37/32844
摘要： Embodiments of the present invention provide a recursive liner system that facilitates providing more uniform flow of gases proximate the surface of a substrate disposed within an apparatus for processing a substrate (e.g., a process chamber). In some embodiments, a recursive liner system may include an outer liner having an outer portion configured to line the walls of a process chamber, a bottom portion extending inward from the outer portion, and a lip extending up from the bottom portion to define a well; and an inner liner having a lower portion configured to be at least partially disposed in the well to define, together with the outer liner, a recursive flow path therebetween.
摘要翻译： 本发明的实施例提供了一种循环衬垫系统，其有助于提供更接近于布置在用于处理衬底（例如，处理室）的设备内的衬底的表面的气体的均匀流动。 在一些实施例中，递归衬垫系统可以包括具有外部部分的外部衬套，所述外部部分被配置为对准处理室的壁，从外部向内延伸的底部，以及从底部向上延伸以限定孔 ; 以及内衬，其具有被配置为至少部分地设置在所述孔中的下部，以与所述外衬垫一起限定其间的递归流动路径。
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公开(公告)号：US20120097908A1
公开(公告)日：2012-04-26
申请号：US12910542
申请日：2010-10-22
IPC分类号： B66F3/24
CPC分类号： H01L21/68742
摘要： Apparatus for lifting substrates from substrate supports are provided herein. In some embodiments, a substrate lift may include: a substrate support having a plurality of lift pins movably disposed through the substrate support to selectively raise and lower a substrate; an actuator coupled to the plurality of lift pins to control the position of the plurality of lift pins, wherein the actuator has a first port for receiving air at a first pressure to cause the actuator to extend the plurality of lift pins and a second port for receiving air at a second pressure to cause the actuator to retract the plurality of lift pins; and a pressure regulator coupled to the actuator to reduce the first pressure to a magnitude that is less than that of the second pressure.
摘要翻译： 本文提供了用于从衬底支撑件提升衬底的设备。 在一些实施例中，基板提升可以包括：基板支撑件，其具有可移动地设置穿过基板支撑件以选择性地升高和降低基板的多个提升销; 联接到所述多个提升销的致动器以控制所述多个提升销的位置，其中所述致动器具有用于在第一压力下接收空气的第一端口，以使所述致动器延伸所述多个提升销和用于 在第二压力下接收空气以使致动器缩回多个提升销; 以及联接到所述致动器的压力调节器，以将所述第一压力减小到小于所述第二压力的量值。
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