MEMORY DEVICE ASSEMBLY WITH A LEAKER DEVICE
    1.
    发明公开

    公开(公告)号:US20240155847A1

    公开(公告)日:2024-05-09

    申请号:US18484629

    申请日:2023-10-11

    CPC classification number: H10B53/30

    Abstract: Implementations described herein relate to various structures, integrated assemblies, and memory devices. In some implementations, an integrated assembly includes a conductive plate, a top electrode in contact with the conductive plate and shared by a plurality of bottom electrodes included in the integrated assembly, a bottom electrode having a top surface, a bottom surface, and an exterior circumferential surface, and a ferroelectric insulator that separates the top electrode from the bottom electrode. In some implementations, a support structure is not present between a top surface of the ferroelectric insulator and a bottom surface of the conductive plate. The integrated assembly may include a leaker device having a top surface, a bottom surface in contact with the top surface of the bottom electrode, and an exterior circumferential surface. The leaker device may be configured to discharge charge from the bottom electrode to the conductive plate.

    MEMORY DEVICE ASSEMBLY WITH REDISTRIBUTION LAYER BETWEEN TRANSISTORS AND CAPACITORS

    公开(公告)号:US20230397434A1

    公开(公告)日:2023-12-07

    申请号:US17812233

    申请日:2022-07-13

    CPC classification number: H01L27/11507

    Abstract: A memory device includes an array of memory cells. A memory cell includes a transistor with a pillar that includes an upper source/drain, a lower source/drain, and a channel between the upper source/drain and the lower source/drain. The transistor includes a gate that is part of a gate line and that is proximate to the channel. The memory cell includes a capacitor having a bottom electrode, an insulator, and a top electrode. The memory cell includes a conductive contact region that couples the transistor and the capacitor and that includes the upper source/drain, a first conductive region having a right surface that abuts the upper source/drain and having a left surface that contacts a first insulator line, and a second conductive region having a left surface that abuts the upper source/drain and having a right surface that contacts a second insulator line that is parallel to the first insulator line.

    APPARATUSES, SYSTEMS, AND METHODS FOR CONFIGURABLE MEMORY

    公开(公告)号:US20240428839A1

    公开(公告)日:2024-12-26

    申请号:US18826719

    申请日:2024-09-06

    Abstract: At least one portion of a memory array may be arranged to provide high density non-volatile random access memory (HIGH DENSITY NON-VOLATILE RAM) while at least one other portion of the memory array may be arranged to provide dynamic random access memory (DRAM)-like memory. In some examples, the memory array may be arranged by programming one or more configuration devices. In some examples, the configuration device may include one or more switches to couple one or more memory cells to a sense amplifier. In some examples, the configuration device may include fuses and/or antifuses to couple one or more memory cells to a sense amplifier. In some examples, the portions of the memory array may be reconfigurable from one arrangement to another arrangement.

    MEMORY DEVICE HAVING A DIAGONALLY OPPOSITE GATE PAIR PER MEMORY CELL

    公开(公告)号:US20240324175A1

    公开(公告)日:2024-09-26

    申请号:US18731738

    申请日:2024-06-03

    CPC classification number: H10B12/30 H01L25/0655 H10B12/033 H10B12/48

    Abstract: Implementations described herein relate to various structures, integrated assemblies, and memory devices. In some implementations, an integrated assembly includes a pillar having an upper source/drain, a middle source/drain, a lower source/drain, an upper channel between the upper source/drain and the middle source/drain, and a lower channel between the middle source/drain and the lower source/drain. The integrated assembly includes a gate pair that includes a first gate and a second gate. The first gate is positioned on a first side of the pillar at a first height, and the second gate is positioned on a second side of the pillar, that is opposite the first side, at a second height that is different from the first height. The integrated assembly includes a capacitor that is electrically coupled with the upper source/drain. Some implementations include methods of forming the various structures, integrated assemblies, and memory devices.

    APPARATUSES, SYSTEMS, AND METHODS FOR CONFIGURABLE MEMORY

    公开(公告)号:US20230352073A1

    公开(公告)日:2023-11-02

    申请号:US17732885

    申请日:2022-04-29

    CPC classification number: G11C11/2255 G11C11/221 G11C11/2273

    Abstract: At least one portion of a memory array may be arranged to provide high density non-volatile random access memory (HIGH DENSITY NON-VOLATILE RAM) while at least one other portion of the memory array may be arranged to provide dynamic random access memory (DRAM)-like memory. In some examples, the memory array may be arranged by programming one or more configuration devices. In some examples, the configuration device may include one or more switches to couple one or more memory cells to a sense amplifier. In some examples, the configuration device may include fuses and/or antifuses to couple one or more memory cells to a sense amplifier. In some examples, the portions of the memory array may be reconfigurable from one arrangement to another arrangement.

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