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公开(公告)号：US20170192349A1
公开(公告)日：2017-07-06
申请号：US15304996
申请日：2015-04-27
发明人： Kazuo KOHMURA , Yosuke ONO , Daiki TANEICHI , Yasuyuki SATO , Toshiaki HIROTA
IPC分类号： G03F1/64 , G03F7/20 , H01L21/673 , G03F1/22
CPC分类号： G03F1/64 , G03F1/22 , G03F1/62 , G03F7/2004 , H01L21/67359
摘要： A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.
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公开(公告)号：US20170184956A1
公开(公告)日：2017-06-29
申请号：US15454555
申请日：2017-03-09
发明人： Kazuo KOHMURA , Daiki TANEICHI , Yosuke ONO , Hisako ISHIKAWA , Tsuneaki BIYAJIMA , Atsushi OKUBO , Yasuyuki SATO , Toshiaki HIROTA
CPC分类号： G03F1/64 , G03F1/62 , G03F1/68 , G03F7/2008 , H01L21/027
摘要： Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.
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公开(公告)号：US20180046071A1
公开(公告)日：2018-02-15
申请号：US15794420
申请日：2017-10-26
发明人： Kazuo KOHMURA , Daiki TANEICHI , Yosuke ONO , Hisako ISHIKAWA , Tsuneaki BIYAJIMA , Yasuyuki SATO , Toshiaki HIROTA
CPC分类号： G03F1/24 , B23K26/0006 , B23K26/53 , B23K2101/40 , B23K2103/52 , B23K2103/56 , C09J7/38 , G03F1/54 , G03F1/60 , G03F1/62 , G03F1/64 , G03F1/76 , G03F1/80 , G03F1/82
摘要： A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
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公开(公告)号：US20170184957A1
公开(公告)日：2017-06-29
申请号：US15454631
申请日：2017-03-09
发明人： Kazuo KOHMURA , Daiki TANEICHI , Takashi KOZEKI , Yosuke ONO , Hisako ISHIKAWA , Tsuneaki BIYAJIMA , Atsushi OKUBO , Yasuyuki SATO , Toshiaki HIROTA
摘要： Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.
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