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    RF Pulse Edge Shaping
    2.
    发明申请
    RF Pulse Edge Shaping 有权
    射频脉冲边缘整形

    公开(公告)号：US20140118031A1

    公开(公告)日：2014-05-01

    申请号：US13663574

    申请日：2012-10-30

    Applicant: MKS INSTRUMENTS, INC.

    Inventor： Amish RUGHOONUNDON ,  Larry J. FISK, II ,  Aaron T. RADOMSKI

    IPC: H03K5/01

    CPC classification number: H03K4/026 ,  H03K5/00006

    Abstract: A radio frequency (RF) generation module includes a power control module that receives first and second desired amplitudes of an output of the RF generation module in first and second respective states, and that outputs, based on the first and second desired amplitudes, input power setpoints corresponding to a transition from the first state to the second state. A frequency control module receives the input power setpoints and outputs frequency setpoints corresponding to the input power setpoints. A pulse shaping module receives the input power setpoints, the frequency setpoints, and an indication of when to transition from the first state to the second state, and transitions the output of the RF generation module from the first state to the second state based on the input power setpoints, the frequency setpoints, and the indication.

    Abstract translation: 射频（RF）生成模块包括功率控制模块，其在第一和第二相应状态下接收RF产生模块的输出的第一和第二期望幅度，并且基于第一和第二期望幅度输出输入功率 设定值对应于从第一状态到第二状态的转变。 频率控制模块接收输入功率设定点并输出与输入功率设定值对应的频率设定值。 脉冲整形模块接收输入功率设定点，频率设定点以及何时从第一状态转换到第二状态的指示，并且基于该第一状态将RF产生模块的输出从第一状态转换到第二状态 输入功率设定值，频率设定值和指示。

    PIECEWISE RF POWER SYSTEMS AND METHODS FOR SUPPLYING PRE-DISTORTED RF BIAS VOLTAGE SIGNALS TO AN ELECTRODE IN A PROCESSING CHAMBER
    5.
    发明申请
    PIECEWISE RF POWER SYSTEMS AND METHODS FOR SUPPLYING PRE-DISTORTED RF BIAS VOLTAGE SIGNALS TO AN ELECTRODE IN A PROCESSING CHAMBER 审中-公开

    公开(公告)号：US20190334385A1

    公开(公告)日：2019-10-31

    申请号：US16506555

    申请日：2019-07-09

    Applicant: MKS Instruments, Inc.

    Inventor： Ky LUU ,  Aaron T. RADOMSKI

    IPC: H02J50/20 ,  H02J50/80 ,  H04B5/00

    Abstract: A radio frequency power system is provided that includes bias modules, a switch, a matching network, and a control module. The bias modules are configured to generate respectively DC bias voltages. The switch is configured to (i) receive current from the bias modules, and (ii) control flow of the current from the bias modules to generate a radio frequency bias voltage signal. The matching network is configured to (i) receive the radio frequency bias voltage signal, and (ii) based on the radio frequency bias voltage signal, supply at least a portion of a radio frequency output voltage signal to an electrode of a substrate support in a processing chamber. The control module is connected to the switch and configured to control a state of the switch based on the radio frequency output voltage signal to shape a waveform of the radio frequency bias voltage signal.

    Virtual RF Sensor
    6.
    发明申请
    Virtual RF Sensor 有权
    虚拟射频传感器

    公开(公告)号：US20140266492A1

    公开(公告)日：2014-09-18

    申请号：US13832901

    申请日：2013-03-15

    Applicant: MKS INSTRUMENTS, INC.

    Inventor： Aaron T. RADOMSKI ,  Dennis M. BROWN ,  Nicholas NELSON

    IPC: H03H7/40

    CPC classification number: H03H7/40

    Abstract: A radio frequency (RF) generation system includes an impedance determination module that receives an RF voltage and an RF current. The impedance determination module further determines an RF generator impedance based on the RF voltage and the RF current. The RF generation system also includes a control module that determines a plurality of electrical values based on the RF generator impedance. The matching module further matches an impedance of a load based on the RF generator impedance and the plurality of electrical components. The matching module also determines a 2 port transfer function based on the plurality of electrical values. The RF generation system also includes a virtual sensor module that estimates a load voltage, a load current, and a load impedance based on the RF voltage, the RF generator, the RF generator impedance, and the 2 port transfer function.

    Abstract translation: 射频（RF）生成系统包括接收RF电压和RF电流的阻抗确定模块。 阻抗确定模块还基于RF电压和RF电流来确定RF发生器阻抗。 RF发生系统还包括控制模块，该控制模块基于RF发生器阻抗来确定多个电气值。 匹配模块还基于RF发生器阻抗和多个电气部件来匹配负载的阻抗。 匹配模块还基于多个电气值确定2端口传送功能。 RF发生系统还包括虚拟传感器模块，其基于RF电压，RF发生器，RF发生器阻抗和2端口传递函数来估计负载电压，负载电流和负载阻抗。

    Adaptive Pulse Shaping With Post Match Sensor
    7.
    发明申请
    Adaptive Pulse Shaping With Post Match Sensor 有权

    公开(公告)号：US20230041177A1

    公开(公告)日：2023-02-09

    申请号：US17396901

    申请日：2021-08-09

    Applicant: MKS Instruments, Inc.

    Inventor： Jonathan W. SMYKA ,  Aaron T. RADOMSKI ,  Peter PAUL ,  Aaron M. BURRY

    IPC: H01J37/32

    Abstract: A RF generator includes a RF power source and a RF control module coupled to the RF power source. The RF control module is configured to generate at least one control signal to vary a respective at least one of an RF output signal from the RF power source or an impedance between the RF power source and a load. The RF output signal includes a RF signal modulated by a pulse signal, and the RF control module is further configured to adjust the at least one control signal to vary at least one of an amplitude or a frequency of the RF output signal or the impedance between the RF power source and the load to control a shape of the pulse signal. The at least one of the amplitude, the frequency, or the impedance is adjusted in accordance with respective feedforward adjustments that vary in accordance with a respective sensed pulse parameter detected between a matching network and the load.

    Intermodulation Distortion Mitigation Using Electronic Variable Capacitor
    8.
    发明申请
    Intermodulation Distortion Mitigation Using Electronic Variable Capacitor 有权

    公开(公告)号：US20210118649A1

    公开(公告)日：2021-04-22

    申请号：US17073709

    申请日：2020-10-19

    Applicant: MKS Instruments, Inc.

    Inventor： Jin HUH ,  Aaron T. RADOMSKI ,  Duy NGUYEN ,  Soohan KIM

    IPC: H01J37/32 ,  H05H1/46

    Abstract: A matching network for a system having a non-linear load and powered by a first RF power supply operating at a first frequency and a second RF power supply operating at a second frequency. The matching network includes a first matching network section for providing an impedance match between the first power supply and the load. The matching network also includes a second matching network section for providing an impedance match between the second power supply and the load. A the first matching network section includes a first variable reactance, and the variable reactance is controlled in accordance with IMD sensed in the signal applied to the load by the first RF power supply. The variable reactance is adjusted in accordance with the IMD to reduce the detected IMD.

    Adaptive Periodic Waveform Controller
    9.
    发明申请
    Adaptive Periodic Waveform Controller 有权

    公开(公告)号：US20210013007A1

    公开(公告)日：2021-01-14

    申请号：US16905377

    申请日：2020-06-18

    Applicant: MKS Instruments, Inc.

    Inventor： Larry J. FISK, II ,  Aaron T. RADOMSKI ,  Jonathan W. SMYKA

    IPC: H01J37/32

    Abstract: A repeating setpoint generator module selectively varies a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals. A closed-loop module, during a first one of the time intervals, generates N closed-loop values based on N differences between (i) N values of the setpoint at N times during the first one of the time intervals and (ii) N measurements of the output parameter at the N times during the first one of the time intervals, respectively. An adjusting module, during the first one of the time intervals, generates N adjustment values based on N differences between (i) N values of the setpoint at the N times during a second one of the time intervals and (ii) N measurements of the output parameter at the N times during the second one of the time intervals, respectively.

    Adaptive Periodic Waveform Controller
    10.
    发明申请
    Adaptive Periodic Waveform Controller 审中-公开

    公开(公告)号：US20190214231A1

    公开(公告)日：2019-07-11

    申请号：US16273595

    申请日：2019-02-12

    Applicant: MKS Instruments, Inc.

    Inventor： Larry J. FISK, II ,  Aaron T. RADOMSKI ,  Jonathan W. SMYKA

    IPC: H01J37/32

    Abstract: A repeating setpoint generator module selectively varies a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals. A closed-loop module, during a first one of the time intervals, generates N closed-loop values based on N differences between (i) N values of the setpoint at N times during the first one of the time intervals and (ii) N measurements of the output parameter at the N times during the first one of the time intervals, respectively. An adjusting module, during the first one of the time intervals, generates N adjustment values based on N differences between (i) N values of the setpoint at the N times during a second one of the time intervals and (ii) N measurements of the output parameter at the N times during the second one of the time intervals, respectively.

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