公开(公告)号：US10544516B2

公开(公告)日：2020-01-28

申请号：US15762599

申请日：2016-09-23

Applicant: MacDermid Enthone Inc.

Inventor： Andreas Konigshofen ,  Maik Winkler

IPC: C25D21/06 ,  C25D3/06 ,  C25D3/10 ,  C25D21/12

Abstract: The invention relates to a method for the adjustment of the lightness L* of electrolytically deposited chromium-finishes on workpieces obtained by an electroplating bath comprising at least chromium(III)-ions and sulfur containing organic compounds, wherein the concentration of the sulfur containing organic compounds in the bath are adjusted by passing at least part of the bath composition through an activated carbon filter. Furthermore, the invention is directed to dark chrome coatings comprising a defined concentration gradient of deposited sulfur containing organic compounds.

公开(公告)号：US20180044813A1

公开(公告)日：2018-02-15

申请号：US15551052

申请日：2016-02-23

Applicant: MACDERMID ENTHONE, INC.

Inventor： Frank Noffke ,  Andreas Konigshofen ,  Axel Fuhrmann ,  Christoph Werner

IPC: C25D21/11 ,  C09K15/26 ,  C08J7/06 ,  C25D5/56 ,  C25D5/34 ,  C23C18/38 ,  C23C18/16 ,  C23C18/20 ,  C23C18/22 ,  C23C18/30 ,  C23C18/32 ,  C09K15/30 ,  C25D17/08

CPC classification number: C25D21/11 ,  C08J7/02 ,  C08J7/06 ,  C08J7/065 ,  C09K15/26 ,  C09K15/30 ,  C23C18/1625 ,  C23C18/1653 ,  C23C18/2086 ,  C23C18/22 ,  C23C18/30 ,  C23C18/32 ,  C23C18/38 ,  C25D5/34 ,  C25D5/56 ,  C25D17/08

Abstract: The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.

公开(公告)号：US20180266008A1

公开(公告)日：2018-09-20

申请号：US15762599

申请日：2016-09-23

Applicant: MacDermid Enthone Inc.

Inventor： Andreas Konigshofen ,  Maik Winkler

IPC: C25D21/06 ,  C25D3/06 ,  C25D21/12 ,  C25D3/10

Abstract: The invention relates to a method for the adjustment of the lightness L* of electrolytically deposited chromium-finishes on workpieces obtained by an electroplating bath comprising at least chromium(III)-ions and sulfur containing organic compounds, wherein the concentration of the sulfur containing organic compounds in the bath are adjusted by passing at least part of the bath composition through an activated carbon filter. Furthermore, the invention is directed to dark chrome coatings comprising a defined concentration gradient of deposited sulfur containing organic compounds.