公开(公告)号：US20070020537A1

公开(公告)日：2007-01-25

申请号：US11486033

申请日：2006-07-14

申请人： Shoichi Harakawa ,  Makoto Ikeda ,  Takuya Kono

发明人： Shoichi Harakawa ,  Makoto Ikeda ,  Takuya Kono

IPC分类号： G03F7/00

CPC分类号： G03F7/70458

摘要： An exposure apparatus correction system comprising: a displacement calculator which calculates matching displacements between a first inspection pattern and a second inspection pattern, the first inspection pattern being transferred by an external first exposure apparatus, the second inspection pattern being positioned with respect to the first inspection pattern and transferred by a second exposure apparatus; an approximator which applies design coordinate systems and values of the calculated matching displacements to approximate expressions in which the matching displacements and a relationship between coordinate systems including the second inspection pattern is approximated by using a plurality of parameters, thereby allocating estimators to the plurality of respective parameters, the plurality of parameters having a mutually complementary relationship; a rounder which rounds estimators of the allocated estimators which are out of an effective range restricted by the second exposure apparatus to fall within the effective range; a back-calculator which defines the rounded estimators as new estimators and applies the new estimators and the design coordinate systems to the approximate expressions to calculate back calculation deviances which are expected to occur between the first inspection pattern and the second inspection pattern when the rounded values are used; a residual calculator which subtracts the calculation deviances from the matching displacements to obtain residuals; a corrected value calculator which utilizes the mutually complementary relationship between the plurality of parameters to calculate corrected values as values which reduce the residuals based on other parameters than the parameters whose estimators have been rounded in the plurality of parameters with respect to the other parameters; an adder which sequentially adds the new estimators and the corrected values and outputs results as a sum total of the estimators; an estimator memory which stores the sum total of the estimators; and a controller which allows the rounder, the back-calculator, the residual calculator, the corrected value calculator and the adder to cyclically perform repeated operations, and corrects the second exposure apparatus based on the sum total of the estimators stored in the estimator memory.

公开(公告)号：US20060265686A1

公开(公告)日：2006-11-23

申请号：US11389114

申请日：2006-03-27

申请人： Makoto Ikeda ,  Shoichi Harakawa ,  Takuya Kono

发明人： Makoto Ikeda ,  Shoichi Harakawa ,  Takuya Kono

IPC分类号： G03C5/00 ,  G06F17/50

CPC分类号： G03F7/70633 ,  G03F7/70525

摘要： A system for controlling an overlay includes a processing data receiving module receiving a processing data string describing a name of an exposure process for a target layer and an original control set value of overlays between the target layer and underlying layers below the target layer; an inspection data receiving module receiving inspection data strings describing names of inspection processes and inspection values determined by the inspection processes inspecting respective overlays between the target layer and the underlying layers; a data combining module combining the processing data string and each of the inspection data strings using a combining condition table so as to create a correction data table; and a control set value calculation module calculating a corrected control set value based on the inspection values of the correction data table.

公开(公告)号：US07556899B2

公开(公告)日：2009-07-07

申请号：US11389114

申请日：2006-03-27

申请人： Makoto Ikeda ,  Shoichi Harakawa ,  Takuya Kono

发明人： Makoto Ikeda ,  Shoichi Harakawa ,  Takuya Kono

IPC分类号： G03F9/00 ,  G06F19/00

CPC分类号： G03F7/70633 ,  G03F7/70525

摘要： A system for controlling an overlay includes a processing data receiving module receiving a processing data string describing a name of an exposure process for a target layer and an original control set value of overlays between the target layer and underlying layers below the target layer; an inspection data receiving module receiving inspection data strings describing names of inspection processes and inspection values determined by the inspection processes inspecting respective overlays between the target layer and the underlying layers; a data combining module combining the processing data string and each of the inspection data strings using a combining condition table so as to create a correction data table; and a control set value calculation module calculating a corrected control set value based on the inspection values of the correction data table.

摘要翻译： 用于控制覆盖的系统包括处理数据接收模块，其接收描述目标层的曝光处理的名称的处理数据串和目标层之下的目标层和下层之间的覆盖层的原始控制集值; 检查数据接收模块，接收描述由检查过程确定的检查过程名称和检查值的检查数据串，检查目标层和下层之间的各个覆盖层; 数据组合模块，其使用组合条件表来组合处理数据串和每个检查数据串，以便创建校正数据表; 以及控制设定值计算模块，基于校正数据表的检查值来计算校正后的控制设定值。

公开(公告)号：US20050170262A1

公开(公告)日：2005-08-04

申请号：US11024322

申请日：2004-12-29

申请人： Takuya Kono ,  Nobuhiro Komine ,  Tatsuhiko Higashiki ,  Shoichi Harakawa ,  Makoto Ikeda

发明人： Takuya Kono ,  Nobuhiro Komine ,  Tatsuhiko Higashiki ,  Shoichi Harakawa ,  Makoto Ikeda

IPC分类号： G03F7/30 ,  G03C1/492 ,  G03C1/494 ,  G03C1/76 ,  G03C5/00 ,  G03F7/20 ,  G03F9/00 ,  G03G15/08 ,  G21K5/00 ,  H01L21/00 ,  H01L21/027

CPC分类号： H01L21/67253

摘要： An exposure processing system comprises an exposure apparatus to expose a resist on a wafer, a heating apparatus comprising heating apparatus units, the heating apparatus heating the exposed resist by a heating apparatus unit in the heating apparatus units, a developing apparatus comprising developing apparatus units, the developing apparatus developing the exposed and heated resist by a developing apparatus unit in the developing apparatus units, and a control apparatus to control the exposure apparatus by using correction data so that a wafer on process object being exposed, the correction data being data for correcting a dimensional dispersion of a resist pattern caused by a pair of heating apparatus unit and developing apparatus unit used for the wafer on the process object, the pair of heating and developing apparatus unit comprising a heating and developing apparatus unit in the heating and developing apparatus used for the wafer on the process object.

摘要翻译： 曝光处理系统包括：曝光装置，用于在晶片上曝光抗蚀剂，加热装置包括加热装置单元，加热装置通过加热装置单元中的加热装置加热曝光的抗蚀剂;显影装置，包括显影装置单元， 显影装置通过显影装置单元中的显影装置单元显影曝光和加热的抗蚀剂;以及控制装置，通过使用校正数据来控制曝光装置，使得处理对象被曝光的晶片，校正数据是用于校正的数据 由一对加热装置单元和用于处理对象上的晶片的显影装置单元引起的抗蚀剂图案的尺寸分散，所述一对加热显影装置单元包括使用的加热和显影装置中的加热和显影装置单元 用于处理对象上的晶圆。

公开(公告)号：US06745094B1

公开(公告)日：2004-06-01

申请号：US09606173

申请日：2000-06-29

申请人： Shoichi Harakawa ,  Makoto Ikeda ,  Etsuo Fukuda

发明人： Shoichi Harakawa ,  Makoto Ikeda ,  Etsuo Fukuda

IPC分类号： G06F1900

CPC分类号： G05B19/41865 ,  G05B2219/32074 ,  G05B2219/32196 ,  G05B2219/32297 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/22

摘要： A semiconductor processing process control system includes a process controller main body (100) for controlling processes for semiconductor processing independently from semiconductor processing devices and contents of intended processing, and a control variable computation programs (210) for obtaining control conditions for semiconductor processing adaptive to semiconductor processing devices and contents of intended processing. The control variable computation programs (210) are used by plugging necessary one of them into the process controller main body (100). When there is any change in semiconductor processing device and content of processing, the system can cope with such changes by merely modifying the control variable computation programs (210). Therefore, the system flexibly, quickly copes with changes in process for processing, computing method of control variables and processing device.

公开(公告)号：US06853870B2

公开(公告)日：2005-02-08

申请号：US10815657

申请日：2004-04-02

申请人： Shoichi Harakawa ,  Makoto Ikeda ,  Etsuo Fukuda

发明人： Shoichi Harakawa ,  Makoto Ikeda ,  Etsuo Fukuda

IPC分类号： G05B15/02 ,  G05B19/418 ,  G06F17/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/32074 ,  G05B2219/32196 ,  G05B2219/32297 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/22

摘要： A semiconductor processing process control system comprising a skip judgment request receiving section for receiving a request for judgment as to whether a process can be skipped or not. A skip judgment yes/no section searches for a judgment plug-in corresponding to the process to be skipped and a judgment execute section activates the judgment plug-in to make a judgment as to whether the process can be skipped or not on the basis of skip judgment logic in the plug-in. A skip execute section effects skipping of the process if the judgment determines that the process can be skipped.

摘要翻译： 一种半导体处理过程控制系统，包括跳过判断请求接收部分，用于接收关于是否可以跳过处理的判断请求。 跳过判断是/否部分搜索与要跳过的过程相对应的判断插件，并且判断执行部分激活判断插件以基于是否可以跳过该过程来判断该过程是否可以被跳过 跳过插件中的判断逻辑。 如果判断确定可以跳过该过程，则跳过执行部分将跳过该过程。

公开(公告)号：US09049495B2

公开(公告)日：2015-06-02

申请号：US13647707

申请日：2012-10-09

申请人： Makoto Ikeda

发明人： Makoto Ikeda

IPC分类号： H04N21/80 ,  G01B11/25

CPC分类号： H04N21/80 ,  G01B11/25

摘要： An information processing system comprising a transmitting apparatus and a receiving apparatus, wherein the transmitting apparatus comprises: a data embedding unit configured to generate a video signal by embedding image data in an effective display portion of the video signal and embedding control data for controlling processing to be executed using the image data in a portion of the video signal in which the image data is not embedded, and wherein the receiving apparatus comprises: a dividing unit configured to receive the video signal from the transmitting apparatus and divide the video signal into the image data and the control data.

摘要翻译： 一种包括发送装置和接收装置的信息处理系统，其中，所述发送装置包括：数据嵌入单元，被配置为通过将图像数据嵌入到所述视频信号的有效显示部分中并且将用于控制处理的控制数据嵌入到 使用未嵌入图像数据的视频信号的一部分中的图像数据执行，并且其中接收装置包括：分割单元，被配置为从发送装置接收视频信号并将视频信号划分成图像 数据和控制数据。

公开(公告)号：US20130038757A1

公开(公告)日：2013-02-14

申请号：US13551368

申请日：2012-07-17

申请人： Kazuhiro Haneda ,  Makoto Ikeda ,  Yoshinao Shimada

发明人： Kazuhiro Haneda ,  Makoto Ikeda ,  Yoshinao Shimada

IPC分类号： H04N5/76

CPC分类号： H04N5/23212 ,  H04N5/3454

摘要： The invention provides an image pickup apparatus including: an image pickup device including a memory portion for analog storage and a pixel portion; a first read-out control and processing portions that, in a first frame-period, read out a first-image-signal from a first-pixel-region of the pixel portion, and in a second frame-period longer than the first frame-period, read out a second-image-signal from a second-pixel-region of the pixel portion including the first-pixel-region, and store the read-out signals in the memory portion; a second read-out control and processing portions that read out from a memory portion an AF image signal related to the first-image-signal and a display image signal related to the second-image-signal; a focal point detecting portion that carries out contrast focal point detection based on the AF image signal; and an image display portion that displays an image based on the display image signal.

摘要翻译： 本发明提供了一种图像拾取装置，包括：图像拾取装置，包括用于模拟存储的存储部分和像素部分; 第一读出控制和处理部分，其在第一帧周期中从像素部分的第一像素区域读出第一图像信号，并且在比第一帧长的第二帧周期中 从包含第一像素区域的像素部分的第二像素区域读出第二图像信号，并将读出的信号存储在存储器部分中; 第二读出控制和处理部分，从存储器部分读出与第一图像信号相关的AF图像信号和与第二图像信号有关的显示图像信号; 焦点检测部，其基于所述AF图像信号进行对比度焦点检测; 以及基于显示图像信号显示图像的图像显示部。

公开(公告)号：US20110242368A1

公开(公告)日：2011-10-06

申请号：US13070229

申请日：2011-03-23

申请人： Kazuhiro HANEDA ,  Makoto Ikeda

发明人： Kazuhiro HANEDA ,  Makoto Ikeda

IPC分类号： G03B7/00 ,  H04N5/262

CPC分类号： H04N5/35581 ,  H04N5/235 ,  H04N5/2355

摘要： This invention provides an image pickup apparatus that performs an image pickup operation that alternately repeats a long exposure LE and a short exposure SE. The image pickup apparatus drives an image pickup device in a first driving mode that makes a first time interval between an exposure end time of a pixel in an SE and an exposure start time of the pixel in an LE immediately thereafter and a second time interval between the exposure end time of the pixel in the LE and the exposure start time of the pixel in the SE immediately thereafter equal.

摘要翻译： 本发明提供了执行交替重复长曝光LE和短曝光SE的图像拾取操作的图像拾取装置。 图像拾取装置以第一驱动模式驱动图像拾取装置，该第一驱动模式使得SE中的像素的曝光结束时间和紧随其后的LE中的像素的曝光开始时间之间的第一时间间隔和第二时间间隔 LE中的像素的曝光结束时间和SE中的像素的曝光开始时间立即相等。

公开(公告)号：US08025438B2

公开(公告)日：2011-09-27

申请号：US12007552

申请日：2008-01-11

申请人： Kouji Nakamura ,  Makoto Ikeda

发明人： Kouji Nakamura ,  Makoto Ikeda

IPC分类号： G01K7/42 ,  G01K7/21

CPC分类号： G01K7/42 ,  G01K13/002

摘要： An electronic clinical thermometer having a low frequency of errors can be implemented. The electronic clinical thermometer for predicting an equilibrium temperature based on a temporal change in the actual measurement value of a temperature at a measurement target detected by a temperature detection element includes an abnormal change detection unit which detects an abnormal change of an actual measurement value from the temperature detection element, and a control unit which controls the start timing of a temporal change in actual measurement value used for derivation of a prediction value when the abnormal change detection unit detects an abnormality.

摘要翻译： 可以实现具有低频率误差的电子体温计。 基于由温度检测元件检测到的测量对象的温度的实际测量值的时间变化来预测平衡温度的电子体温计包括异常变化检测单元，其检测来自所述测量值的实际测量值的异常变化 温度检测元件和控制单元，其控制当异常变化检测单元检测到异常时用于推导预测值的实际测量值的时间变化的开始定时。