公开(公告)号：US10087019B2

公开(公告)日：2018-10-02

申请号：US14939910

申请日：2015-11-12

Applicant: Mapper Lithography IP B.V.

Inventor： Michel Pieter Dansberg ,  Sjoerd Hesdahl ,  Jan Pieter Roelof Jongeneel

IPC: H01L21/677 ,  B25J9/04 ,  B65G47/90 ,  B25J9/00 ,  G03F7/20 ,  H01L21/67 ,  H01L21/687

Abstract: The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

公开(公告)号：US20160137427A1

公开(公告)日：2016-05-19

申请号：US14939910

申请日：2015-11-12

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Michel Pieter Dansberg ,  Sjoerd Hesdahl ,  Jan Pieter Roelof Jongeneel

IPC: B65G47/90

CPC classification number: B65G47/90 ,  B25J9/0087 ,  B25J9/043 ,  G03F7/7075 ,  H01L21/67201 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/68707

Abstract: The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

Abstract translation: 本发明涉及一种用于在光刻设备中将真空室转移到真空室中的装置和方法。 所述装载锁定系统包括：装载锁定室，其设置有用于允许衬底进入和离开所述装载锁定室的开口;以及传送装置，包括至少部分地布置在所述装载锁定室中的副框架，臂 其基端部连接到子框架，以及基板接收单元，其连接到臂的远端。 臂包括至少三个铰接臂部分，其中第一和第二臂部分与其近端铰接地连接到子框架。 第三臂部分铰接地连接到第一和第二臂部分的远端。 臂部件布置成形成四杆连杆。