公开(公告)号：US09665013B2

公开(公告)日：2017-05-30

申请号：US14135372

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido De Boer ,  Michel Pieter Dansberg ,  Pieter Kruit

IPC: G03B27/60 ,  G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

公开(公告)号：US20150321356A1

公开(公告)日：2015-11-12

申请号：US14705928

申请日：2015-05-06

Applicant: Mapper Lithography IP B.V.

Inventor： Joep Gerard Vijverberg ,  Laurens Vincent Plandsoen ,  Bas van Gelder ,  Guido de Boer ,  Michel Pieter Dansberg

IPC: B25J11/00 ,  G03F9/00

CPC classification number: B25J11/00 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F9/7096 ,  H01J37/16 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/166 ,  H01L21/6719 ,  H01L21/67225 ,  H01L21/67775

Abstract: The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.

Abstract translation: 本发明涉及用于封闭目标加工机器的组件。 组件包括外壳和转移单元。 外壳包括用于在其上布置所述目标加工机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。 此外，外壳包括在外壳的侧壁中的进入开口。 转印单元包括用于相对于基板移动转印单元的一个或多个转印元件。 传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动 在朝向和/或远离外壳的方向上。

公开(公告)号：US20160137427A1

公开(公告)日：2016-05-19

申请号：US14939910

申请日：2015-11-12

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Michel Pieter Dansberg ,  Sjoerd Hesdahl ,  Jan Pieter Roelof Jongeneel

IPC: B65G47/90

CPC classification number: B65G47/90 ,  B25J9/0087 ,  B25J9/043 ,  G03F7/7075 ,  H01L21/67201 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/68707

Abstract: The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

Abstract translation: 本发明涉及一种用于在光刻设备中将真空室转移到真空室中的装置和方法。 所述装载锁定系统包括：装载锁定室，其设置有用于允许衬底进入和离开所述装载锁定室的开口;以及传送装置，包括至少部分地布置在所述装载锁定室中的副框架，臂 其基端部连接到子框架，以及基板接收单元，其连接到臂的远端。 臂包括至少三个铰接臂部分，其中第一和第二臂部分与其近端铰接地连接到子框架。 第三臂部分铰接地连接到第一和第二臂部分的远端。 臂部件布置成形成四杆连杆。

公开(公告)号：US10144134B2

公开(公告)日：2018-12-04

申请号：US14705928

申请日：2015-05-06

Applicant: Mapper Lithography IP B.V.

Inventor： Joep Gerard Vijverberg ,  Laurens Vincent Plandsoen ,  Bas van Gelder ,  Guido de Boer ,  Michel Pieter Dansberg

IPC: B25J11/00 ,  G03F9/00 ,  G03F7/20 ,  H01L21/67 ,  H01L21/677 ,  H01J37/16 ,  H01J37/317

Abstract: The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.

公开(公告)号：US10087019B2

公开(公告)日：2018-10-02

申请号：US14939910

申请日：2015-11-12

Applicant: Mapper Lithography IP B.V.

Inventor： Michel Pieter Dansberg ,  Sjoerd Hesdahl ,  Jan Pieter Roelof Jongeneel

IPC: H01L21/677 ,  B25J9/04 ,  B65G47/90 ,  B25J9/00 ,  G03F7/20 ,  H01L21/67 ,  H01L21/687

Abstract: The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

公开(公告)号：US09645511B2

公开(公告)日：2017-05-09

申请号：US14135378

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido De Boer ,  Michel Pieter Dansberg ,  Pieter Kruit

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer or stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.