-
公开(公告)号：US09551563B2
公开(公告)日：2017-01-24
申请号：US14431765
申请日：2013-09-26
Applicant: Mapper Lithography IP B.V.
IPC: G01B9/02 , G01B11/26 , G03F7/20 , G01B11/14 , H01J37/317
CPC classification number: G01B9/02015 , G01B9/02021 , G01B9/02027 , G01B9/02051 , G01B11/14 , G01B11/26 , G03F7/70775 , G03F7/70833 , G03F7/7085 , H01J37/3174 , Y10T156/10
Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.
Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。
-
公开(公告)号：US20170277043A1
公开(公告)日：2017-09-28
申请号：US15620699
申请日：2017-06-12
Applicant: Mapper Lithography IP B.V.
Inventor： Guido de Boer , Thomas Adriaan Ooms , Niels Vergeer , Godefridus Cornelius Antonius Couweleers
CPC classification number: G03F7/70775 , G01B9/02007 , G01B9/02015 , G03F7/70833 , G03F7/7085 , H01J2237/30438
Abstract: The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.
-
公开(公告)号：US20150241200A1
公开(公告)日：2015-08-27
申请号：US14431765
申请日：2013-09-26
Applicant: MAPPER LITHOGRAPHY IP B.V.
CPC classification number: G01B9/02015 , G01B9/02021 , G01B9/02027 , G01B9/02051 , G01B11/14 , G01B11/26 , G03F7/70775 , G03F7/70833 , G03F7/7085 , H01J37/3174 , Y10T156/10
Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.
Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。
-
-
Search Results
3
records
(took 0.016 seconds)
